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Extract from the Register of European Patents

EP About this file: EP0231542

EP0231542 - Particle detector for wafer processing equipment and method of detecting a particle [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  27.07.1991
Database last updated on 24.08.2024
Most recent event   Tooltip23.11.2007Lapse of the patent in a contracting state
Updated state(s): FR
published on 26.12.2007  [2007/52]
Applicant(s)For all designated states
High Yield Technology
2400 Bayshore Frontage Road
Mountain View, CA 94043 / US
[1987/33]
Inventor(s)01 / Borden, Peter
354 Tennessee Lane
Palo Alto, CA 94306 / US
[1987/33]
Representative(s)Noz, Franciscus Xaverius, et al
Algemeen Octrooibureau P.O. Box 645
5600 AP Eindhoven / NL
[N/P]
Former [1987/33]Noz, Franciscus Xaverius, Ir., et al
Algemeen Octrooibureau P.O. Box 645
NL-5600 AP Eindhoven / NL
Application number, filing date86202212.608.12.1986
[1987/33]
Priority number, dateUS1985080739510.12.1985         Original published format: US 807395
US1985080790111.12.1985         Original published format: US 807901
US1986090777616.09.1986         Original published format: US 907776
[1987/33]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0231542
Date:12.08.1987
Language:EN
[1987/33]
Type: A3 Search report 
No.:EP0231542
Date:13.07.1988
Language:EN
[1988/28]
Type: B1 Patent specification 
No.:EP0231542
Date:26.09.1990
Language:EN
[1990/39]
Search report(s)(Supplementary) European search report - dispatched on:EP25.05.1988
ClassificationIPC:G01N15/02, G01N15/10, G01N21/47, G01N21/53
[1987/33]
CPC:
G01N21/53 (EP); G01N2015/0238 (EP); G01N2021/516 (EP)
Designated contracting statesBE,   DE,   FR,   GB,   IT [1987/33]
TitleGerman:Teilchenerfasser für Waferbearbeitungsgerät und Verfahren zur Erfassung eines Teilchens[1987/33]
English:Particle detector for wafer processing equipment and method of detecting a particle[1987/33]
French:Détecteur de particules pour des appareils de traitement de wafers et procédé pour la détection d'un particule[1987/33]
File destroyed:15.01.2000
Examination procedure10.01.1989Examination requested  [1989/10]
01.06.1989Despatch of a communication from the examining division (Time limit: M06)
13.10.1989Reply to a communication from the examining division
19.01.1990Despatch of communication of intention to grant (Approval: Yes)
28.03.1990Communication of intention to grant the patent
25.06.1990Fee for grant paid
25.06.1990Fee for publishing/printing paid
Opposition(s)27.06.1991No opposition filed within time limit [1991/38]
Fees paidRenewal fee
11.11.1988Renewal fee patent year 03
31.05.1990Renewal fee patent year 04
Penalty fee
Additional fee for renewal fee
02.01.199004   M06   Fee paid on   31.05.1990
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipBE26.09.1990
FR26.09.1990
IT26.09.1990
[2006/14]
Former [1999/42]BE26.09.1990
IT26.09.1990
FR15.02.1991
Former [1991/50]BE26.09.1990
FR15.02.1991
Former [1991/35]BE26.09.1990
Documents cited:Search[X]JP5539047  ;
 [X]JP57042842  ;
 [AP]EP0203600  ;
 [A]US3578867  ;
 [A]US3708675
 [X]  - PATENT ABSTRACTS OF JAPAN, vol. 4, no. 74 (P-13)[556], 30th May 1980; & JP - A - 55 39047 (RICOH K.K.) 18-03-1980, & JP5539047 A 00000000
 [X]  - PATENT ABSTRACTS OF JAPAN, vol. 6, no. 112 (P-124)[990], 23th June 1982; & JP - A - 57 042 842 (NITSUTAD K.K.) 10-03-1982, & JP57042842 A 00000000
 [A]  - APPLIED OPTICS, vol. 18, no. 7, 1st April 1979, pages 1009-1014, Optical Society of America, US; H.E. GERBER: "Portable cell for simultaneously measuring the coefficients of light scattering and extinction for ambient aerosols"
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.