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Extract from the Register of European Patents

EP About this file: EP0220120

EP0220120 - Method for producing a charge transport device, and charge transport device manufactured thereby [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  16.05.1991
Database last updated on 16.09.2024
Most recent event   Tooltip16.05.1991No opposition filed within time limitpublished on 03.07.1991 [1991/27]
Applicant(s)For all designated states
THOMSON-CSF
173, Boulevard Haussmann
F-75008 Paris / FR
[1987/18]
Inventor(s)01 / Blanchard, Pierre
THOMSON-CSF SCPI 19, avenue de Messine
F-75008 Paris / FR
02 / Carquet, Michel
THOMSON-CSF SCPI 19, avenue de Messine
F-75008 Paris / FR
03 / Warenbourg, Philippe
THOMSON-CSF SCPI 19, avenue de Messine
F-75008 Paris / FR
[1987/18]
Representative(s)Mayeux, Michèle, et al
THOMSON-CSF SCPI
92045 Paris la Défense Cedex 67 / FR
[N/P]
Former [1987/18]Mayeux, Michèle, et al
THOMSON-CSF SCPI
F-92045 PARIS LA DEFENSE CEDEX 67 / FR
Application number, filing date86402263.710.10.1986
[1987/18]
Priority number, dateFR1985001550318.10.1985         Original published format: FR 8515503
[1987/18]
Filing languageFR
Procedural languageFR
PublicationType: A1 Application with search report 
No.:EP0220120
Date:29.04.1987
Language:FR
[1987/18]
Type: B1 Patent specification 
No.:EP0220120
Date:11.07.1990
Language:FR
[1990/28]
Search report(s)(Supplementary) European search report - dispatched on:EP18.02.1987
ClassificationIPC:H01L21/82, H01L21/28, H01L29/60
[1987/18]
CPC:
H01L29/66954 (EP,US); H01L29/42396 (EP,US)
Designated contracting statesDE,   GB,   NL [1987/18]
TitleGerman:Verfahren zum Herstellen einer Ladungstransportanordnung und danach hergestellte Ladungstransportanordnung[1987/18]
English:Method for producing a charge transport device, and charge transport device manufactured thereby[1987/18]
French:Procédé de réalisation d'un dispositif à transfert de charge, et dispositif à transfert de charge mettant en oeuvre ce procédé[1987/18]
File destroyed:12.06.1999
Examination procedure13.08.1987Examination requested  [1987/41]
06.03.1989Despatch of a communication from the examining division (Time limit: M06)
02.09.1989Reply to a communication from the examining division
13.10.1989Despatch of communication of intention to grant (Approval: Yes)
11.01.1990Communication of intention to grant the patent
04.04.1990Fee for grant paid
04.04.1990Fee for publishing/printing paid
Opposition(s)12.04.1991No opposition filed within time limit [1991/27]
Fees paidRenewal fee
22.09.1988Renewal fee patent year 03
18.09.1989Renewal fee patent year 04
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Documents cited:Search[A]US3795847  (ENGELER W, et al);
 [A]US3943543  (CAYWOOD JOHN MILLARD);
 [A]US4001861  (CARNES JAMES E);
 [A]US4347656  (SMITH GEORGE E, et al)
 [A]  - SIEMENS FORSCHUNGS- UND ENTWICKLUNGSBERICHTE, vol. 4, no. 4, 1975, pages 226-230, Springer-Verlag, Berlin, DE; U. ABLASSMEIER et al.: "CCD-Schaltungen hoher Speicherdichte in Al-Si-Gate-Technologie"
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.