EP0243964 - Photosensitive positive composition and photosensitive registration material prepared therefrom [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 05.11.1992 Database last updated on 08.10.2024 | Most recent event Tooltip | 11.07.2008 | Change - representative | published on 13.08.2008 [2008/33] | Applicant(s) | For all designated states HOECHST CELANESE CORPORATION Route 202-206 North Somerville, N.J. 08876 / US | [1987/45] | Inventor(s) | 01 /
Potvin, Robert E. 100 Pawtuxet Terrace Apt.6 West Warwick Rhode Island 02893 / US | 02 /
Alban, Jonas O. St. P.O. Box 43 Coventry Rhode Island 02816 / US | 03 /
Sobodacha, Chester J. R.R. 7, Box 2857 18 Daniel Drive Coventry Rhode Island 02816 / US | [1987/45] | Representative(s) | Meyer-Dulheuer, Karl-Hermann, et al Hoechst AG, Werk Kalle Albert Zentrale Patentabteilung KA 65174 Wiesbaden / DE | [N/P] |
Former [2008/33] | Meyer-Dulheuer, Karl-Hermann, et al Hoechst AG, Werk Kalle Albert Zentrale Patentabteilung KA 65174 Wiesbaden / DE | ||
Former [1991/24] | Meyer-Dulheuer, Karl-Hermann, Dr., et al Hoechst AG, Werk Kalle-Albert, Zentrale Patentabteilung KA D-65174 Wiesbaden / DE | ||
Former [1987/45] | Neubauer, Hans-Joachim, Dr. Hoechst AG, Werk Kalle-Albert, Zentrale Patentabteilung KA D-65174 Wiesbaden / DE | Application number, filing date | 87106282.4 | 30.04.1987 | [1987/45] | Priority number, date | US19860858631 | 02.05.1986 Original published format: US 858631 | [1987/45] | Filing language | DE | Procedural language | DE | Publication | Type: | A2 Application without search report | No.: | EP0243964 | Date: | 04.11.1987 | Language: | DE | [1987/45] | Type: | A3 Search report | No.: | EP0243964 | Date: | 14.09.1988 | Language: | DE | [1988/37] | Type: | B1 Patent specification | No.: | EP0243964 | Date: | 02.01.1992 | Language: | DE | [1992/01] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 26.07.1988 | Classification | IPC: | G03F7/023 | [1992/01] | CPC: |
G03F7/022 (EP,US);
G03F7/023 (KR)
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Former IPC [1987/45] | G03F7/08 | Designated contracting states | DE, FR, GB, IT, NL [1987/45] | Title | German: | Positiv-arbeitendes lichtempfindliches Gemisch und daraus hergestelltes lichtempfindliches Aufzeichnungsmaterial | [1987/45] | English: | Photosensitive positive composition and photosensitive registration material prepared therefrom | [1987/45] | French: | Composition photosensible positive et matériel photosensible pour l'enregistrement préparé sur base de cette composition | [1987/45] | Examination procedure | 25.01.1989 | Examination requested [1989/13] | 05.03.1991 | Despatch of communication of intention to grant (Approval: Yes) | 30.04.1991 | Communication of intention to grant the patent | 24.07.1991 | Fee for grant paid | 18.09.1991 | Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time | 14.10.1991 | Fee for publishing/printing paid | Opposition(s) | 03.10.1992 | No opposition filed within time limit [1992/52] | Request for further processing for: | 14.10.1991 | Request for further processing filed | 14.10.1991 | Full payment received (date of receipt of payment) Request granted | 04.11.1991 | Decision despatched | Fees paid | Renewal fee | 10.03.1989 | Renewal fee patent year 03 | 14.03.1990 | Renewal fee patent year 04 | 21.12.1990 | Renewal fee patent year 05 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]JP60133446 ; | [A]JP60138544 ; | [Y]FR2211677 (EASTMAN KODAK CO [US]); | [Y]EP0150315 (IBM [US]) | [A] - PATENT ABSTRACTS OF JAPAN, Band 9, Nr. 296 (P-407)[2019], 22. November 1985; & JP-A-60 133 446 (FUJI SHASHIN FILM K.K.) 16-07-1985, & JP60133446 A 00000000 | [A] - PATENT ABSTRACTS OF JAPAN, Band 9, Nr. 308 (P-410)[2031], 4. Dezember 1985; & JP-A-60 138 544 (FUJI SHASHIN FILM K.K.) 23-07-1985, & JP60138544 A 00000000 |