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Extract from the Register of European Patents

EP About this file: EP0284441

EP0284441 - II-VI Group compound crystal article and process for producing the same [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  04.09.1998
Database last updated on 25.09.2024
Most recent event   Tooltip04.09.1998Application deemed to be withdrawnpublished on 21.10.1998 [1998/43]
Applicant(s)For all designated states
CANON KABUSHIKI KAISHA
30-2, 3-chome, Shimomaruko, Ohta-ku
Tokyo / JP
[N/P]
Former [1988/39]For all designated states
CANON KABUSHIKI KAISHA
30-2, 3-chome, Shimomaruko, Ohta-ku
Tokyo / JP
Inventor(s)01 / Tokunaga, Hiroyuki
10-6-402, Nanpeidai Miyamae-ku
Kawasaki-shi Kanagawa-ken / JP
02 / Yonehara, Takao
1309, Onna
Atsugi-shi Kanagawa-ken / JP
[1988/39]
Representative(s)Beresford, Keith Denis Lewis, et al
Beresford Crump LLP
16 High Holborn
London WC1V 6BX / GB
[N/P]
Former [1988/39]Beresford, Keith Denis Lewis, et al
BERESFORD & Co. 2-5 Warwick Court High Holborn
London WC1R 5DJ / GB
Application number, filing date88302747.628.03.1988
[1988/39]
Priority number, dateJP1987007199026.03.1987         Original published format: JP 7199087
[1988/39]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0284441
Date:28.09.1988
Language:EN
[1988/39]
Type: A3 Search report 
No.:EP0284441
Date:04.10.1989
Language:EN
[1989/40]
Search report(s)(Supplementary) European search report - dispatched on:EP18.08.1989
ClassificationIPC:H01L21/365, C23C16/24, C30B25/18, C23C16/04, C23C16/22
[1989/43]
CPC:
C30B25/02 (EP,US); C30B25/18 (EP,US); C30B29/48 (EP,US);
H01L21/0242 (EP,US); H01L21/02422 (EP,US); H01L21/02551 (EP,US);
H01L21/02554 (EP,US); H01L21/02557 (EP,US); H01L21/0256 (EP,US);
H01L21/0262 (EP,US); H01L21/02639 (EP,US); H01L21/02647 (EP,US);
Y10S117/902 (EP,US); Y10S117/913 (EP,US); Y10S148/064 (EP,US) (-)
Former IPC [1988/39]H01L21/365, C23C16/04, C23C16/22
Designated contracting statesDE,   FR,   GB,   IT,   NL [1988/39]
TitleGerman:Kristallisches Verbundprodukt der II-VI-Gruppe und Verfahren zu seiner Herstellung[1988/39]
English:II-VI Group compound crystal article and process for producing the same[1988/39]
French:Produit cristallin composite du groupe II-VI et son procédé de fabrication[1988/39]
Examination procedure21.02.1990Examination requested  [1990/17]
03.09.1991Despatch of a communication from the examining division (Time limit: M06)
10.03.1992Reply to a communication from the examining division
29.04.1993Despatch of a communication from the examining division (Time limit: M06)
02.12.1993Reply to a communication from the examining division
02.04.1996Despatch of a communication from the examining division (Time limit: M07)
08.11.1996Reply to a communication from the examining division
14.10.1997Despatch of a communication from the examining division (Time limit: M06)
25.04.1998Application deemed to be withdrawn, date of legal effect  [1998/43]
25.05.1998Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [1998/43]
Request for further processing for:13.12.1993Request for further processing filed
13.12.1993Full payment received (date of receipt of payment)
Request granted
24.01.1994Decision despatched
Fees paidRenewal fee
28.02.1990Renewal fee patent year 03
31.12.1990Renewal fee patent year 04
23.03.1992Renewal fee patent year 05
30.03.1993Renewal fee patent year 06
28.03.1994Renewal fee patent year 07
24.03.1995Renewal fee patent year 08
21.03.1996Renewal fee patent year 09
19.03.1997Renewal fee patent year 10
Penalty fee
Additional fee for renewal fee
31.03.199811   M06   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[X]US4333792  (SMITH HENRY I);
 [X]EP0180751  (SIEMENS AG [DE]);
 [XP]EP0244081  (CANON KK [JP]);
 [Y]GB2132017  (SECR DEFENCE);
 [Y]US4443488  (LITTLE ROGER G [US], et al);
 [A]FR2413126  (IBM [US])
 [Y]  - L. JASTRZEBSKI et al."Growth process of silicon over SiO2 by CVD : Epitaxial lateral overgrowth technique" vol.130, no.7, July 1983 (1046), pages 1571-1580"
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.