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Extract from the Register of European Patents

EP About this file: EP0355658

EP0355658 - Semiconductor diffusion furnace inner tube [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  11.06.1994
Database last updated on 14.09.2024
Most recent event   Tooltip11.06.1994No opposition filed within time limitpublished on 03.08.1994 [1994/31]
Applicant(s)For all designated states
Shin-Etsu Chemical Co., Ltd.
6-1, Otemachi 2-chome Chiyoda-ku
Tokyo 100 / JP
[N/P]
Former [1990/09]For all designated states
Shin-Etsu Chemical Co., Ltd.
6-1, Otemachi 2-chome
Chiyoda-ku Tokyo 100 / JP
Inventor(s)01 / Matsumoto, Fukuji
No. 2-21, Kitago 3-chome
Takefu-shi Fukui-ken / JP
02 / Tawara, Yoshio
No. 1603, Nakano 1-chome
Fukui-shi Fukui-ken / JP
03 / Hayashi, Michio
Shin-Etsu Jutaku No. 16, Hachiman 1-chome
Takefu-shi Fukui-ken / JP
04 / Yamada, Osamu
No. 12-9, Hinode 5-chome
Fukui-shi Fukui-ken / JP
[1990/09]
Representative(s)Ter Meer Steinmeister & Partner
Patentanwälte mbB
Nymphenburger Strasse 4
80335 München / DE
[N/P]
Former [1990/09]TER MEER - MÜLLER - STEINMEISTER & PARTNER
Mauerkircherstrasse 45
D-81679 München / DE
Application number, filing date89115018.714.08.1989
[1990/09]
Priority number, dateJP1988020282815.08.1988         Original published format: JP 20282888
[1990/09]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0355658
Date:28.02.1990
Language:EN
[1990/09]
Type: A3 Search report 
No.:EP0355658
Date:22.11.1990
Language:EN
[1990/47]
Type: B1 Patent specification 
No.:EP0355658
Date:11.08.1993
Language:EN
[1993/32]
Search report(s)(Supplementary) European search report - dispatched on:EP02.10.1990
ClassificationIPC:C30B31/10, F27D1/00, F27B5/08
[1990/49]
CPC:
C23C4/10 (EP,US); H01L21/30 (KR); C23C4/11 (EP,US);
C30B31/10 (EP,US); Y10S261/75 (EP,US)
Former IPC [1990/09]C30B31/10
Designated contracting statesDE,   FR,   GB,   NL [1990/09]
TitleGerman:Innenrohr für einen Halbleiter-Diffusionsofen[1990/09]
English:Semiconductor diffusion furnace inner tube[1990/09]
French:Tube interne pour four à diffusion pour les semiconducteurs[1990/09]
Examination procedure04.12.1990Examination requested  [1991/06]
06.03.1992Despatch of a communication from the examining division (Time limit: M04)
07.07.1992Reply to a communication from the examining division
06.11.1992Despatch of communication of intention to grant (Approval: Yes)
01.02.1993Communication of intention to grant the patent
30.04.1993Fee for grant paid
30.04.1993Fee for publishing/printing paid
Opposition(s)12.05.1994No opposition filed within time limit [1994/31]
Fees paidRenewal fee
21.12.1990Renewal fee patent year 03
13.08.1992Renewal fee patent year 04
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Documents cited:Search[X]US3811829  (WESSON R, et al);
 [A]US4761134  (FOSTER BRYAN D [US]);
 [A]DE2624756  (SIEMENS AG);
 [A]US3868924  (REUSCHEL KONRAD, et al)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.