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Extract from the Register of European Patents

EP About this file: EP0370511

EP0370511 - Method of fabricating a photoplate [Right-click to bookmark this link]
Former [1990/22]Method of fabricating a photoplate and a photoplate fabricated by the same
[1997/11]
StatusNo opposition filed within time limit
Status updated on  16.01.1998
Database last updated on 02.11.2024
Most recent event   Tooltip16.01.1998No opposition filed within time limitpublished on 04.03.1998 [1998/10]
Applicant(s)For all designated states
Kabushiki Kaisha Toshiba
72, Horikawa-cho, Saiwai-ku Kawasaki-shi
Kanagawa-ken 210-8572 / JP
[N/P]
Former [1990/22]For all designated states
KABUSHIKI KAISHA TOSHIBA
72, Horikawa-cho, Saiwai-ku
Kawasaki-shi, Kanagawa-ken 210, Tokyo / JP
Inventor(s)01 / Yamamoto, Noboru
102 Dai-2 Green Haim 2-182 Tasukagoshi Saiwai-ku
Kawasaki-shi kanagawa-ken / JP
02 / Matsuoka, Yasuo
102 Toshiba Kosugi Ryo 1-526 Kosugi-cho
Nakahara-ku Kawasaki-shi Kanagawa-ken / JP
[1990/22]
Representative(s)Lehn, Werner, et al
Hoffmann Eitle, Patent- und Rechtsanwälte, Postfach 81 04 20
81904 München / DE
[N/P]
Former [1990/22]Lehn, Werner, Dipl.-Ing., et al
Hoffmann, Eitle & Partner, Patentanwälte, Postfach 81 04 20
D-81904 München / DE
Application number, filing date89121678.023.11.1989
[1990/22]
Priority number, dateJP1988029695624.11.1988         Original published format: JP 29695688
[1990/22]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0370511
Date:30.05.1990
Language:EN
[1990/22]
Type: A3 Search report 
No.:EP0370511
Date:30.10.1991
Language:EN
[1991/44]
Type: B1 Patent specification 
No.:EP0370511
Date:12.03.1997
Language:EN
[1997/11]
Search report(s)(Supplementary) European search report - dispatched on:EP12.09.1991
ClassificationIPC:G03F1/16, G03F1/14
[1990/22]
CPC:
G03F7/16 (EP); H01L21/31 (KR); G03F1/50 (EP);
H01L21/00 (KR)
Designated contracting statesDE,   FR,   GB [1990/22]
TitleGerman:Photomasken-Herstellungsverfahren[1997/11]
English:Method of fabricating a photoplate[1997/11]
French:Procédé de fabrication d'un photomasque[1997/11]
Former [1990/22]Photomasken-Herstellungsverfahren und Photomaske
Former [1990/22]Method of fabricating a photoplate and a photoplate fabricated by the same
Former [1990/22]Procédé de fabrication d'un photomasque et photomasque fabriqué par ce procédé
Examination procedure23.11.1989Examination requested  [1990/22]
18.08.1994Despatch of a communication from the examining division (Time limit: M06)
27.02.1995Reply to a communication from the examining division
20.04.1995Despatch of a communication from the examining division (Time limit: M02)
30.06.1995Reply to a communication from the examining division
28.07.1995Despatch of a communication from the examining division (Time limit: M05)
05.01.1996Reply to a communication from the examining division
14.06.1996Despatch of communication of intention to grant (Approval: Yes)
17.09.1996Communication of intention to grant the patent
12.12.1996Fee for grant paid
12.12.1996Fee for publishing/printing paid
Opposition(s)13.12.1997No opposition filed within time limit [1998/10]
Fees paidRenewal fee
11.11.1991Renewal fee patent year 03
09.10.1992Renewal fee patent year 04
08.11.1993Renewal fee patent year 05
15.11.1994Renewal fee patent year 06
09.11.1995Renewal fee patent year 07
11.11.1996Renewal fee patent year 08
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[X]JP5850739  ;
 [Y]JP57128032
 [X]  - PATENT ABSTRACTS OF JAPAN vol. 7, no. 136 (E-181)(1281) 14 June 1983, & JP-A-58 50739 (MITSUBISHI DENKI K.K.) 25 March 1983,, & JP5850739 A 19830325
 [Y]  - PATENT ABSTRACTS OF JAPAN vol. 6, no. 226 (E-141)(1104) 11 November 1982, & JP-A-57 128032 (TOSHIBA KIKAI K.K.) 09 August 1982,, & JP57128032 A 19820809
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.