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Extract from the Register of European Patents

EP About this file: EP0366259

EP0366259 - A process for interconnecting thin-film electrical circuits [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  02.03.1995
Database last updated on 15.07.2024
Most recent event   Tooltip02.03.1995No opposition filed within time limitpublished on 19.04.1995 [1995/16]
Applicant(s)For all designated states
International Business Machines Corporation
New Orchard Road
Armonk, NY 10504 / US
[N/P]
Former [1990/18]For all designated states
International Business Machines Corporation
Old Orchard Road
Armonk, N.Y. 10504 / US
Inventor(s)01 / Baum, Thomas Hall
4346 Glenmont Drive
San Jose California 95136 / US
02 / Comita, Paul Brian
350 Hermosa Way
Menlo Park California 94025 / US
03 / Jackson, Robert Lloyd
981 Shadow Brook Drive
San Jose California 95120 / US
[1990/18]
Representative(s)Burt, Roger James, et al
IBM United Kingdom Limited Intellectual Property Department Hursley Park Winchester
Hampshire SO21 2JN / GB
[N/P]
Former [1993/12]Burt, Roger James, Dr., et al
IBM United Kingdom Limited Intellectual Property Department Hursley Park
Winchester Hampshire SO21 2JN / GB
Former [1990/21]Johansson, Lars E.
IBM Svenska AB Intellectual Property Department 4-01
S-163 92 Stockholm / SE
Former [1990/18]Johansson, Lars E.
Bergenstrahle & Lindvall, P.O. Box 17704
S-118 93 Stockholm / SE
Application number, filing date89309601.621.09.1989
[1990/18]
Priority number, dateUS1988026310326.10.1988         Original published format: US 263103
[1990/18]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0366259
Date:02.05.1990
Language:EN
[1990/18]
Type: A3 Search report 
No.:EP0366259
Date:22.11.1990
Language:EN
[1990/47]
Type: B1 Patent specification 
No.:EP0366259
Date:27.04.1994
Language:EN
[1994/17]
Search report(s)(Supplementary) European search report - dispatched on:EP01.10.1990
ClassificationIPC:H05K3/22, B23K26/00
[1990/18]
CPC:
H05K3/225 (EP,US); H01L21/707 (EP,US); H05K3/467 (EP,US);
H05K2201/0317 (EP,US); H05K2203/0361 (EP,US); H05K2203/107 (EP,US);
H05K2203/1338 (EP,US); H05K2203/173 (EP,US); H05K3/027 (EP,US) (-)
Designated contracting statesDE,   FR,   GB [1990/18]
TitleGerman:Verfahren zum Untereinanderverbinden von elektrischen Dünnschichtkreisen[1990/18]
English:A process for interconnecting thin-film electrical circuits[1990/18]
French:Procédé pour interconnecter des circuits électriques à film mince[1990/18]
Examination procedure20.08.1990Examination requested  [1990/41]
05.11.1992Despatch of a communication from the examining division (Time limit: M04)
26.02.1993Reply to a communication from the examining division
08.07.1993Despatch of communication of intention to grant (Approval: Yes)
14.10.1993Communication of intention to grant the patent
27.10.1993Fee for grant paid
27.10.1993Fee for publishing/printing paid
Opposition(s)28.01.1995No opposition filed within time limit [1995/16]
Fees paidRenewal fee
13.12.1990Renewal fee patent year 03
19.11.1992Renewal fee patent year 04
18.09.1993Renewal fee patent year 05
Penalty fee
Additional fee for renewal fee
30.09.199204   M06   Fee paid on   19.11.1992
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Documents cited:Search[A]EP0130398  (SIEMENS AG [DE]);
 [A]US2704728  (PETER PAWLYK);
 [A]US4044222  (KESTENBAUM AMI)
 [A]  - INTERNATIONAL ELECTRON DEVICES MEETING, Washington, Dec. 1-4, 1985, PROC. 1985, IEEE, Washington, US pages 594 - 597; CACOURIS ET. AL.: "Laser direct writing of metal interconnects"
 [A]  - APPLIED PHYSICS LETTERS. vol. 50, no. 15, 13 April 1987, NEW YORK US pages 1016 - 1018; BLACK ET. AL.: "Supplemental multilevel interconnects by laser direct writing: Applicationto GaAs digital integrated circuits"
 [A]  - RESEARCH DISCLOSURE. no. 292, August 1988, NEW YORK, NY, US, page 617 , No. 29267: "Laser ablation of thin chromium layer"
 [A]  - JOURNAL OF THE ELECTROCHEMICAL SOCIETY. vol. 134, no. 10, October 1987, MANCHESTER, NEW HAMP pages 2616 - 2619; BAUM: "Laser chemical vapor deposition of gold"
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.