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EP0406434
European procedure
Extract from the Register of European Patents
EP Citations: EP0406434
| Cited in | Search | Type: | Patent literature | Publication No.: | EP0001538
[X] (IBM [US]); | Type: | Patent literature | Publication No.: | US4615764
[X] (BOBBIO STEPHEN M [US], et al); | Type: | Patent literature | Publication No.: | EP0174249
[X] (FUJITSU LTD [JP]); | Type: | Patent literature | Publication No.: | EP0106174
[X] (HITACHI LTD [JP]) | Type: | Non-patent literature | Publication information: | [X] - IBM TECHNICAL DISCLOSURE BULLETIN, vol. 20, no. 2, July 1977, page 757, New York, US; J.W. COBURN: "Increasing the selectivity of the plasma etch rate of SiO2 relative to Si" | Cited in | International search | Type: | Patent literature | Publication No.: | JPH05675573
[X] ; | Type: | Patent literature | Publication No.: | JPH05621330
[Y] ; | Type: | Patent literature | Publication No.: | JPS61123142
[Y] (MATSUSHITA ELECTRIC IND CO LTD); | Type: | Patent literature | Publication No.: | JPS57139927
[Y] (NIPPON ELECTRIC CO); | Type: | Patent literature | Publication No.: | JPS61266584
[Y] (TOKUDA SEISAKUSHO); | Type: | Patent literature | Publication No.: | JPS58150429
[Y] (HITACHI LTD) |