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EP0385480
European procedure
Extract from the Register of European Patents
EP About this file: EP0385480
| EP0385480 - Aperture pattern printing plate for shadow mask and method of manufacturing the same [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 11.05.1995 Database last updated on 31.08.2024 | Most recent event Tooltip | 11.05.1995 | No opposition filed within time limit | published on 28.06.1995 [1995/26] | Applicant(s) | For all designated states Kabushiki Kaisha Toshiba 72, Horikawa-cho, Saiwai-ku Kawasaki-shi Kanagawa-ken 210-8572 / JP | [N/P] |
| Former [1995/01] | For all designated states KABUSHIKI KAISHA TOSHIBA 72, Horikawa-cho, Saiwai-ku Kawasaki-shi, Kanagawa-ken 210, Tokyo / JP | ||
| Former [1990/36] | For all designated states Kabushiki Kaisha Toshiba 72, Horikawa-cho Saiwai-ku Kawasaki-shi / JP | Inventor(s) | 01 /
Ohtake, Yasuhisa, c/o Intellectual Property Div. KABUSHIKI KAISHA TOSHIBA, 1-1 Shibaura 1-chome Minato-ku, Tokyo 105 / JP | 02 /
Magaki, Yasushi c/o Intellectual Property Div. KABUSHIKI KAISHA TOSHIBA, 1-1 Shibaura 1-chome Minato-ku, Tokyo 105 / JP | 03 /
Yamazaki, Mitsuaki, c/o Intellectual Property Div. KABUSHIKI KAISHA TOSHIBA, 1-1 Shibaura 1-chome Minato-ku, Tokyo 105 / JP | 04 /
Sagou, Seiji, c/o Intellectual Property Div. KABUSHIKI KAISHA TOSHIBA, 1-1 Shibaura 1-chome Minato-ku, Tokyo 105 / JP | 05 /
Tanaka, Hiroshi, c/o Intellectual Property Div. KABUSHIKI KAISHA TOSHIBA, 1-1 Shibaura 1-chome Minato-ku, Tokyo 105 / JP | [1990/36] | Representative(s) | Henkel & Partner mbB Patentanwaltskanzlei, Rechtsanwaltskanzlei Maximiliansplatz 21 80333 München / DE | [N/P] |
| Former [1990/36] | Henkel, Feiler, Hänzel & Partner Möhlstrasse 37 D-81675 München / DE | Application number, filing date | 90104033.7 | 01.03.1990 | [1990/36] | Priority number, date | JP19890048513 | 02.03.1989 Original published format: JP 4851389 | [1990/36] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0385480 | Date: | 05.09.1990 | Language: | EN | [1990/36] | Type: | A3 Search report | No.: | EP0385480 | Date: | 07.08.1991 | Language: | EN | [1991/32] | Type: | B1 Patent specification | No.: | EP0385480 | Date: | 06.07.1994 | Language: | EN | [1994/27] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 17.06.1991 | Classification | IPC: | H01J9/14, G03B27/20 | [1991/32] | CPC: |
H01J9/142 (EP,US);
H01J29/07 (KR)
|
| Former IPC [1990/36] | H01J9/14 | Designated contracting states | DE, FR, GB [1990/36] | Title | German: | Aperturmusterdruckplatte für eine Schattenmaske und Herstellungsverfahren dafür | [1990/36] | English: | Aperture pattern printing plate for shadow mask and method of manufacturing the same | [1990/36] | French: | Plaque d'impression à réseau d'ouvertures pour un masque d'ombre et méthode de fabrication de celui-ci | [1990/36] | Examination procedure | 29.03.1990 | Examination requested [1990/36] | 27.07.1993 | Despatch of communication of intention to grant (Approval: No) | 20.10.1993 | Despatch of communication of intention to grant (Approval: later approval) | 27.10.1993 | Communication of intention to grant the patent | 31.01.1994 | Fee for grant paid | 31.01.1994 | Fee for publishing/printing paid | Opposition(s) | 07.04.1995 | No opposition filed within time limit [1995/26] | Fees paid | Renewal fee | 13.03.1992 | Renewal fee patent year 03 | 09.03.1993 | Renewal fee patent year 04 | 09.03.1994 | Renewal fee patent year 05 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]US4020493 (PALAC KAZIMIR, et al); | [A]US4656107 (MOSCONY JOHN J [US], et al); | [A]US4664996 (MOSCONY JOHN J [US], et al); | [X]US4669871 (WETZEL CHARLES M [US], et al) |