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Extract from the Register of European Patents

EP About this file: EP0403766

EP0403766 - Scanning tunnelling microscope displacement detector [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  19.01.1996
Database last updated on 30.10.2024
Most recent event   Tooltip30.11.2007Lapse of the patent in a contracting statepublished on 02.01.2008  [2008/01]
Applicant(s)For all designated states
CANON KABUSHIKI KAISHA
30-2, 3-chome, Shimomaruko, Ohta-ku
Tokyo / JP
[N/P]
Former [1990/52]For all designated states
CANON KABUSHIKI KAISHA
30-2, 3-chome, Shimomaruko, Ohta-ku
Tokyo / JP
Inventor(s)01 / Nose, Yiroyasu
c/o Canon Kabushiki K., 30-2 3-chome, Shimomaruko
Ohta-ku, Tokyo / JP
02 / Kawase, Toshimitsu
c/o Canon Kabushiki K., 30-2 3-chome, Shimomaruko
Ohta-ku, Tokyo / JP
03 / Miyazaki, Toshihiko
c/o Canon Kabushiki K., 30-2 3-chome, Shimomaruko
Ohta-ku, Tokyo / JP
04 / Oguchi, Takahiro
c/o Canon Kabushiki K., 30-2 3-chome, Shimomaruko
Ohta-ku, Tokyo / JP
05 / Yamano, Akihiko
c/o Canon Kabushiki K., 30-2 3-chome, Shimomaruko
Ohta-ku, Tokyo / JP
[1990/52]
Representative(s)Weser, Wolfgang
Weser & Kollegen
Patentanwälte
Radeckestrasse 43
81245 München / DE
[N/P]
Former [1995/16]Weser, Wolfgang
Dres. Weser & Martin, Patentanwälte, Radeckestrasse 43
D-81245 München / DE
Former [1990/52]Blumbach Weser Bergen Kramer Zwirner Hoffmann Patentanwälte
Radeckestrasse 43
D-81245 München / DE
Application number, filing date90107928.526.04.1990
[1990/52]
Priority number, dateJP1989010588927.04.1989         Original published format: JP 10588989
[1990/52]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0403766
Date:27.12.1990
Language:EN
[1990/52]
Type: A3 Search report 
No.:EP0403766
Date:13.01.1993
Language:EN
[1993/02]
Type: B1 Patent specification 
No.:EP0403766
Date:15.03.1995
Language:EN
[1995/11]
Search report(s)(Supplementary) European search report - dispatched on:EP23.11.1992
ClassificationIPC:G01B7/28, G01B15/04, G01N27/00, G11B9/00
[1993/02]
CPC:
G01Q10/06 (EP,US); B82Y35/00 (US); G01B7/28 (EP,US);
G01Q60/16 (EP,US); Y10S977/851 (EP,US); Y10S977/872 (EP,US)
Former IPC [1990/52]G01B7/28, G01B15/04
Designated contracting statesBE,   CH,   DE,   FR,   GB,   IT,   LI,   NL,   SE [1990/52]
TitleGerman:Verschiebungsdetektor unter Verwendung eines Tunnel-Abtast-Mikroskops[1990/52]
English:Scanning tunnelling microscope displacement detector[1990/52]
French:Détecteur de déplacement utilisant un microscope à balayage tunnel[1990/52]
Examination procedure02.01.1991Examination requested  [1991/10]
14.09.1993Despatch of a communication from the examining division (Time limit: M06)
24.01.1994Reply to a communication from the examining division
15.02.1994Despatch of a communication from the examining division (Time limit: M04)
31.05.1994Reply to a communication from the examining division
18.07.1994Despatch of communication of intention to grant (Approval: Yes)
19.09.1994Communication of intention to grant the patent
15.12.1994Fee for grant paid
15.12.1994Fee for publishing/printing paid
Opposition(s)16.12.1995No opposition filed within time limit [1996/10]
Fees paidRenewal fee
25.04.1992Renewal fee patent year 03
27.04.1993Renewal fee patent year 04
29.04.1994Renewal fee patent year 05
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipBE15.03.1995
CH15.03.1995
IT15.03.1995
LI15.03.1995
NL15.03.1995
SE15.06.1995
[2008/01]
Former [2003/11]BE15.03.1995
CH15.03.1995
IT15.03.1995
LI15.03.1995
NL15.03.1995
SE15.06.1995
Former [2000/27]BE15.03.1995
CH15.03.1995
IT15.03.1995
LI15.03.1995
NL30.04.1995
SE15.06.1995
Former [1999/42]BE15.03.1995
CH15.03.1995
IT15.03.1995
LI15.03.1995
SE15.06.1995
Former [1996/04]BE15.03.1995
CH15.03.1995
LI15.03.1995
SE15.06.1995
Former [1995/36]CH15.03.1995
LI15.03.1995
Documents cited:Search[Y]JP59094734  ;
 [Y]JP61228988  ;
 [Y]JP61197676  ;
 [X]JP62209302  ;
 [X]EP0304893  (CANON KK [JP]);
 [X]EP0309236  (CANON KK [JP])
 [Y]  - DATABASE WPIL Week 8428, Derwent Publications Ltd., London, GB; AN 84-173489 & JP-A-59 094 734 (OKI ELECTRIC IND KK) 13 May 1984, & JP59094734 A 19840513
 [Y]  - DATABASE WPIL Week 8647, Derwent Publications Ltd., London, GB; AN 86-309231 & JP-A-61 228 988 (CANON KK) 13 October 1986, & JP61228988 A 19861013
 [Y]  - DATABASE WPIL Week 8641, Derwent Publications Ltd., London, GB; AN 86-269623 & JP-A-61 197 676 (CANON KK) 1 September 1986, & JP61197676 A 19860901
 [X]  - PATENT ABSTRACTS OF JAPAN vol. 012, no. 068 (P-672) & JP-A-62 209 302 ( SHIMADZU CORP ) 14 September 1987, & JP62209302 A 19870914
 [XP]  - PROCEEDINGS IEEE MICRO ELECTRO MECHANICAL SYSTEMS 11 February 1990, CALIFORNIA pages 197 - 202 H.KAWAKATSU ET AL 'POSITIONING AND MEASUREMENT USING A CRYSTALLINE LATTICE REFERENCE SCALE - A FEASIBILITY STUDY OF STM APPLICATION TO MEMS'
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.