Extract from the Register of European Patents

EP About this file: EP0436174

EP0436174 - Radiation sensitive mixture and process for the production of relief structures [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  31.01.1997
Database last updated on 20.03.2026
Most recent event   Tooltip30.11.2007Lapse of the patent in a contracting state
Updated state(s): FR
published on 02.01.2008  [2008/01]
Applicant(s)For all designated states
BASF Aktiengesellschaft
Carl-Bosch-Strasse 38
67063 Ludwigshafen / DE
[N/P]
Former [1991/28]For all designated states
BASF Aktiengesellschaft
Carl-Bosch-Strasse 38
D-67063 Ludwigshafen / DE
Inventor(s)01 / Son, Nguyen Kim, Dr.
Zedernweg 9
D-6944 Hemsbach / DE
[1991/28]
Application number, filing date90124480.618.12.1990
[1991/28]
Priority number, dateDE1989394341330.12.1989         Original published format: DE 3943413
[1991/28]
Filing languageDE
Procedural languageDE
PublicationType: A2 Application without search report 
No.:EP0436174
Date:10.07.1991
Language:DE
[1991/28]
Type: A3 Search report 
No.:EP0436174
Date:16.10.1991
Language:DE
[1991/42]
Type: B1 Patent specification 
No.:EP0436174
Date:27.03.1996
Language:DE
[1996/13]
Search report(s)(Supplementary) European search report - dispatched on:EP26.08.1991
ClassificationIPC:G03F7/038
[1996/13]
CPC:
G03F7/039 (EP,US); G03F7/0045 (EP,US)
Former IPC [1991/28]G03F7/039
Designated contracting statesBE,   DE,   FR,   GB,   IT,   NL [1991/28]
TitleGerman:Strahlungsempfindliches Gemisch und Verfahren zur Herstellung von Reliefstrukturen[1991/28]
English:Radiation sensitive mixture and process for the production of relief structures[1991/28]
French:Mélange sensible à l'irradiation et procédé de production de structures en relief[1991/28]
Examination procedure18.12.1990Examination requested  [1991/28]
12.10.1994Despatch of a communication from the examining division (Time limit: M04)
15.02.1995Reply to a communication from the examining division
09.06.1995Despatch of communication of intention to grant (Approval: Yes)
30.06.1995Communication of intention to grant the patent
03.08.1995Fee for grant paid
03.08.1995Fee for publishing/printing paid
Opposition(s)28.12.1996No opposition filed within time limit [1997/12]
Fees paidRenewal fee
10.12.1992Renewal fee patent year 03
24.12.1993Renewal fee patent year 04
24.12.1994Renewal fee patent year 05
18.12.1995Renewal fee patent year 06
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Lapses during opposition  TooltipBE27.03.1996
FR27.03.1996
GB27.03.1996
IT27.03.1996
NL27.03.1996
[2006/14]
Former [2003/07]BE27.03.1996
GB27.03.1996
IT27.03.1996
NL27.03.1996
FR23.08.1996
Former [1999/42]BE27.03.1996
GB27.03.1996
IT27.03.1996
FR23.08.1996
Former [1997/14]BE27.03.1996
GB27.03.1996
FR23.08.1996
Former [1997/12]BE27.03.1996
FR23.08.1996
Former [1996/52]BE27.03.1996
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