| EP0379377 - Process for preparing photosensitive heat-resistant polymer [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 22.03.1996 Database last updated on 30.03.2026 | Most recent event Tooltip | 22.03.1996 | No opposition filed within time limit | published on 08.05.1996 [1996/19] | Applicant(s) | For all designated states Chisso Corporation 6-32, Nakanoshima 3-chome Kita-ku Osaka-shi Osaka 530-0055 / JP | [N/P] |
| Former [1990/30] | For all designated states Chisso Corporation 6-32, Nakanoshima 3-chome Kita-ku Osaka-shi Osaka-fu / JP | Inventor(s) | 01 /
Maeda, Hirotoshi 10-2, Otsutomo-cho, Kanazawa-ku Yokohama-shi, Kanagawa-ken / JP | 02 /
Kunimune, Kouichi 12-2, Ichihara Ichihara-shi, Chiba-ken / JP | [1990/30] | Representative(s) | Lamb, John Baxter, et al Marks & Clerk 90 Long Acre London WC2E 9RA / GB | [N/P] |
| Former [1990/30] | Lamb, John Baxter, et al MARKS & CLERK, 57-60 Lincoln's Inn Fields London WC2A 3LS / GB | Application number, filing date | 90300546.0 | 18.01.1990 | [1990/30] | Priority number, date | JP19890008931 | 18.01.1989 Original published format: JP 893189 | JP19890098124 | 18.04.1989 Original published format: JP 9812489 | [1990/30] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0379377 | Date: | 25.07.1990 | Language: | EN | [1990/30] | Type: | A3 Search report | No.: | EP0379377 | Date: | 26.02.1992 | Language: | EN | [1992/09] | Type: | B1 Patent specification | No.: | EP0379377 | Date: | 17.05.1995 | Language: | EN | [1995/20] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 08.01.1992 | Classification | IPC: | C08G73/10, G03F7/037 | [1992/09] | CPC: |
G03F7/0387 (EP,US);
C08G73/1003 (EP,US);
C08G73/1089 (EP,US)
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| Former IPC [1990/30] | C08G73/10, G03F7/039 | Designated contracting states | DE, FR, GB [1990/30] | Title | German: | Verfahren zur Herstellung eines photoempfindlichen wärmebeständigen Polymers | [1990/30] | English: | Process for preparing photosensitive heat-resistant polymer | [1990/30] | French: | Procédé de préparation de polymère photosensible résistant à la chaleur | [1990/30] | Examination procedure | 21.08.1992 | Examination requested [1992/43] | 24.01.1994 | Despatch of a communication from the examining division (Time limit: M04) | 02.05.1994 | Reply to a communication from the examining division | 22.06.1994 | Despatch of communication of intention to grant (Approval: No) | 13.10.1994 | Despatch of communication of intention to grant (Approval: later approval) | 19.10.1994 | Communication of intention to grant the patent | 30.01.1995 | Fee for grant paid | 30.01.1995 | Fee for publishing/printing paid | Opposition(s) | 20.02.1996 | No opposition filed within time limit [1996/19] | Fees paid | Renewal fee | 10.01.1992 | Renewal fee patent year 03 | 15.01.1993 | Renewal fee patent year 04 | 11.01.1994 | Renewal fee patent year 05 | 10.01.1995 | Renewal fee patent year 06 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A] JP62265326 | [A] PATENT ABSTRACTS OF JAPAN, vol. 12, no. 148 (C-493), 7th May 1988; & JP-A-62 265 326 (CHISSO) 18-11-1987 [A] |