Extract from the Register of European Patents

EP About this file: EP0379377

EP0379377 - Process for preparing photosensitive heat-resistant polymer [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  22.03.1996
Database last updated on 30.03.2026
Most recent event   Tooltip22.03.1996No opposition filed within time limitpublished on 08.05.1996 [1996/19]
Applicant(s)For all designated states
Chisso Corporation
6-32, Nakanoshima 3-chome Kita-ku Osaka-shi
Osaka 530-0055 / JP
[N/P]
Former [1990/30]For all designated states
Chisso Corporation
6-32, Nakanoshima 3-chome Kita-ku
Osaka-shi Osaka-fu / JP
Inventor(s)01 / Maeda, Hirotoshi
10-2, Otsutomo-cho, Kanazawa-ku
Yokohama-shi, Kanagawa-ken / JP
02 / Kunimune, Kouichi
12-2, Ichihara
Ichihara-shi, Chiba-ken / JP
[1990/30]
Representative(s)Lamb, John Baxter, et al
Marks & Clerk 90 Long Acre
London WC2E 9RA / GB
[N/P]
Former [1990/30]Lamb, John Baxter, et al
MARKS & CLERK, 57-60 Lincoln's Inn Fields
London WC2A 3LS / GB
Application number, filing date90300546.018.01.1990
[1990/30]
Priority number, dateJP1989000893118.01.1989         Original published format: JP 893189
JP1989009812418.04.1989         Original published format: JP 9812489
[1990/30]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0379377
Date:25.07.1990
Language:EN
[1990/30]
Type: A3 Search report 
No.:EP0379377
Date:26.02.1992
Language:EN
[1992/09]
Type: B1 Patent specification 
No.:EP0379377
Date:17.05.1995
Language:EN
[1995/20]
Search report(s)(Supplementary) European search report - dispatched on:EP08.01.1992
ClassificationIPC:C08G73/10, G03F7/037
[1992/09]
CPC:
G03F7/0387 (EP,US); C08G73/1003 (EP,US); C08G73/1089 (EP,US)
Former IPC [1990/30]C08G73/10, G03F7/039
Designated contracting statesDE,   FR,   GB [1990/30]
TitleGerman:Verfahren zur Herstellung eines photoempfindlichen wärmebeständigen Polymers[1990/30]
English:Process for preparing photosensitive heat-resistant polymer[1990/30]
French:Procédé de préparation de polymère photosensible résistant à la chaleur[1990/30]
Examination procedure21.08.1992Examination requested  [1992/43]
24.01.1994Despatch of a communication from the examining division (Time limit: M04)
02.05.1994Reply to a communication from the examining division
22.06.1994Despatch of communication of intention to grant (Approval: No)
13.10.1994Despatch of communication of intention to grant (Approval: later approval)
19.10.1994Communication of intention to grant the patent
30.01.1995Fee for grant paid
30.01.1995Fee for publishing/printing paid
Opposition(s)20.02.1996No opposition filed within time limit [1996/19]
Fees paidRenewal fee
10.01.1992Renewal fee patent year 03
15.01.1993Renewal fee patent year 04
11.01.1994Renewal fee patent year 05
10.01.1995Renewal fee patent year 06
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Documents cited:Search[A] JP62265326  
 [A]   PATENT ABSTRACTS OF JAPAN, vol. 12, no. 148 (C-493), 7th May 1988; & JP-A-62 265 326 (CHISSO) 18-11-1987 [A]
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