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Extract from the Register of European Patents

EP About this file: EP0403308

EP0403308 - Method for reducing facet reflectivities of semiconductor light sources and device thereof [Right-click to bookmark this link]
StatusThe application has been refused
Status updated on  26.04.1996
Database last updated on 14.09.2024
Most recent event   Tooltip26.04.1996Refusal of applicationpublished on 12.06.1996 [1996/24]
Applicant(s)For all designated states
GTE Laboratories Incorporated
1209 Orange Street Wilmington
Delaware 01901 / US
[N/P]
Former [1990/51]For all designated states
GTE LABORATORIES INCORPORATED
1209 Orange Street
Wilmington Delaware 01901 / US
Inventor(s)01 / Rideout, William C.
88 South Harbor Road
Townsend, MA 01469 / US
02 / Eichen, Elliot
41 Mary Street
Arlington, MA 02174 / US
[1990/51]
Representative(s)Bubb, Antony John Allen, et al
Wilson Gunn Chancery House, Chancery Lane
London WC2A 1QU / GB
[N/P]
Former [1990/51]Bubb, Antony John Allen, et al
GEE & CO. Chancery House Chancery Lane
London WC2A 1QU / GB
Application number, filing date90306575.315.06.1990
[1990/51]
Priority number, dateUS1989036739916.06.1989         Original published format: US 367399
[1990/51]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0403308
Date:19.12.1990
Language:EN
[1990/51]
Type: A3 Search report 
No.:EP0403308
Date:04.11.1992
Language:EN
[1992/45]
Search report(s)(Supplementary) European search report - dispatched on:EP15.09.1992
ClassificationIPC:H01L33/00, H01S3/025
[1990/51]
CPC:
H01S5/50 (EP,US); H01S5/0281 (EP,US); H01S5/164 (EP,US);
H01S5/5009 (EP,US)
Designated contracting statesDE,   FR,   GB,   NL [1990/51]
TitleGerman:Verfahren und Vorrichtung zur Verminderung der Oberflächenreflektivität von Halbleiterlichtquellen[1990/51]
English:Method for reducing facet reflectivities of semiconductor light sources and device thereof[1990/51]
French:Méthode et dispositif pour réduire la réflexion aux surfaces des sources de lumière à semi-conducteur[1990/51]
File destroyed:20.04.2002
Examination procedure15.04.1993Examination requested  [1993/24]
30.05.1994Despatch of a communication from the examining division (Time limit: M06)
08.12.1994Reply to a communication from the examining division
12.07.1995Despatch of communication of intention to grant (Approval: )
19.01.1996Despatch of communication that the application is refused, reason: formalities examination [1996/24]
29.01.1996Application refused, date of legal effect [1996/24]
Fees paidRenewal fee
29.06.1992Renewal fee patent year 03
26.06.1993Renewal fee patent year 04
28.06.1994Renewal fee patent year 05
Penalty fee
Additional fee for renewal fee
30.06.199506   M06   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[Y]  - ELECTRONICS LETTERS. vol. 24, no. 6, 17 March 1988, ENAGE GB pages 335 - 336; N.K. DUTTA ET AL: 'Monolithically integrated laser/photodetector'
 [YD]  - ELECTRONICS LETTERS. vol. 24, no. 20, 29 September 1988, ENAGE GB pages 1275 - 1276; C.E. ZAH ET AL: '1.3 um GaInAsP near-travelling-wave laser amplifiers made by combination of angled facets and antireflection coatings.'
 [A]  - AT & T TECHNICAL JOURNAL. vol. 68, no. 1, January 1989, NEW YORK US pages 5 - 18; N.K. DUTTA: 'III-V device technologies for lightwave applications.'
 [A]  - APPLIED PHYSICS LETTERS. vol. 51, no. 23, 7 December 1987, NEW YORK US pages 1879 - 1881; N.S.K. KWONG ET AL: 'High power, high efficiency window buried heterostructure GaAlAs superluminescent diode with an integrated absorber.'
 [A]  - IEEE JOURNAL OF QUANTUM ELECTRONICS. vol. QE-23, no. 6, June 1987, NEW YORK US pages 1021 - 1026; M.G. \BERG ET AL: 'InGaAsP-InP laser amplifier with integrated passive waveguides'
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.