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Extract from the Register of European Patents

EP About this file: EP0419160

EP0419160 - Amorphous silicon semiconductor devices [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  11.10.1996
Database last updated on 02.11.2024
Most recent event   Tooltip11.10.1996No opposition filed within time limitpublished on 27.11.1996 [1996/48]
Applicant(s)For all designated states
GENERAL ELECTRIC COMPANY
1 River Road
Schenectady, NY 12345 / US
[N/P]
Former [1991/13]For all designated states
GENERAL ELECTRIC COMPANY
1 River Road
Schenectady, NY 12345 / US
Inventor(s)01 / Possin, George Edward
2361 Algonquin Road
Schenectady, New York 12309 / US
02 / Garverick, Linda Mason
1311 Ruffner Road
Niskayuna, New York 12309 / US
[1991/13]
Representative(s)Szary, Anne Catherine, et al
GPO Europe
GE International Inc. The Ark
201 Talgarth Road
Hammersmith
London W6 8BJ / GB
[N/P]
Former [1996/12]Szary, Anne Catherine, et al
London Patent Operation, GE Technical Services Co. Inc., Essex House, 12-13 Essex Street
London WC2R 3AA / GB
Former [1995/27]Greenwood, John David, et al
London Patent Operation, General Electric Technical Services Company, Inc., Essex House, 12/13 Essex Street
London WC2R 3AA / GB
Former [1991/13]Pratt, Richard Wilson
London Patent Operation G.E. Technical Services Co. Inc. Essex House 12/13 Essex Street
London WC2R 3AA / GB
Application number, filing date90310114.517.09.1990
[1991/13]
Priority number, dateUS1989040897918.09.1989         Original published format: US 408979
US1990055297716.07.1990         Original published format: US 552977
[1991/13]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0419160
Date:27.03.1991
Language:EN
[1991/13]
Type: B1 Patent specification 
No.:EP0419160
Date:06.12.1995
Language:EN
[1995/49]
Search report(s)(Supplementary) European search report - dispatched on:EP04.01.1991
ClassificationIPC:H01L29/786
[1995/49]
CPC:
H01L29/4908 (EP,US); H01L29/786 (KR); G02F1/133 (KR);
G02F1/1368 (EP,US); H01L29/66765 (EP,US); G02F2202/103 (EP,US)
Former IPC [1991/13]H01L29/784
Designated contracting statesDE,   FR,   GB,   NL [1991/13]
TitleGerman:Halbleiteranordnung aus amorphem Silizium[1991/13]
English:Amorphous silicon semiconductor devices[1991/13]
French:Dispositifs semi-conducteur en silicium amorphe[1991/13]
Examination procedure05.09.1991Examination requested  [1991/45]
22.06.1993Despatch of a communication from the examining division (Time limit: M04)
21.10.1993Reply to a communication from the examining division
24.02.1995Despatch of communication of intention to grant (Approval: Yes)
23.05.1995Communication of intention to grant the patent
04.09.1995Fee for grant paid
04.09.1995Fee for publishing/printing paid
Opposition(s)07.09.1996No opposition filed within time limit [1996/48]
Fees paidRenewal fee
17.09.1992Renewal fee patent year 03
16.09.1993Renewal fee patent year 04
30.09.1994Renewal fee patent year 05
02.10.1995Renewal fee patent year 06
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Documents cited:Search[A]JP6086863  ;
 [Y]EP0145403  (ENERGY CONVERSION DEVICES INC [US]);
 [Y]US4816885  (YOSHIDA MAMORU [JP], et al)
 [X]  - APPLIED PHYSICS LETTERS. vol. 54, no. 21, 22 May 1989, NEW YORK US pages 2079 - 2081; JIN JANG et al: "Amorphous silicon thin-film transistors with two-layer gate insulator"
 [A]  - EXTENDED ABSTRACTS. no. 2, October 1985, PRINCETON, NEW JERSE page 305 R. Hezel and W. Bauch: "CHARGE STORAGE PROPERTIES OF PLASMA-DEPOSITED SILICON NITRIDE FILMS AND THE EFFECT OF INTERFACE STATES"
 [A]  - PATENT ABSTRACTS OF JAPAN vol. 9, no. 230 (E-343)(1953) 17 September 1985, & JP-A-60 86863 (FUJITSU K.K.) 16 May 1985,, & JP6086863 A 19850516
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.