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EP0388343
European procedure
Extract from the Register of European Patents
EP About this file: EP0388343
| EP0388343 - Chemically amplified photoresist [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 23.05.1997 Database last updated on 22.08.2024 | Most recent event Tooltip | 23.05.1997 | No opposition filed within time limit | published on 09.07.1997 [1997/28] | Applicant(s) | For all designated states International Business Machines Corporation New Orchard Road Armonk, NY 10504 / US | [N/P] |
| Former [1990/38] | For all designated states International Business Machines Corporation Old Orchard Road Armonk, N.Y. 10504 / US | Inventor(s) | 01 /
Brunsvold, William Ross 22 Clover Hill Road Poughkeepsie, N.Y. 12603 / US | 02 /
Knors, Christopher John 17E Alpine Drive Wappingers Falls, N.Y. 12590 / US | 03 /
Kwong, Ranee Wai-Ling 31 Mina Drive Wappingers Falls, N.Y. 12590 / US | 04 /
Miura, Steve Seiichi 97 Alda Drive Poughkeepsie, N.Y. 12601 / US | 05 /
Montgomery, Melvin Warren 23 Manuche Drive New Windsor, N.Y. 12550 / US | 06 /
Moreau, Wayne Martin Lydia Drive Wappingers Falls, N.Y. 12590 / US | 07 /
Sachdev, Harbans Singh 14 Tanglewood Drive Wappingers Falls, N.Y. 12590 / US | [1990/38] | Representative(s) | Klein, Daniel Jacques Henri Compagnie IBM France Département de Propriété Intellectuelle 06610 La Gaude / FR | [N/P] |
| Former [1990/38] | Klein, Daniel Jacques Henri Compagnie IBM France Département de Propriété Intellectuelle F-06610 La Gaude / FR | Application number, filing date | 90480016.6 | 02.02.1990 | [1990/38] | Priority number, date | US19890322848 | 14.03.1989 Original published format: US 322848 | [1990/38] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0388343 | Date: | 19.09.1990 | Language: | EN | [1990/38] | Type: | A3 Search report | No.: | EP0388343 | Date: | 21.08.1991 | Language: | EN | [1991/34] | Type: | B1 Patent specification | No.: | EP0388343 | Date: | 17.07.1996 | Language: | EN | [1996/29] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 03.07.1991 | Classification | IPC: | G03F7/039 | [1990/38] | CPC: |
G03F7/039 (EP,US);
Y10S430/111 (EP,US);
Y10S430/121 (EP,US);
Y10S430/122 (EP,US);
Y10S430/126 (EP,US);
Y10S430/127 (EP,US)
| Designated contracting states | DE, FR, GB [1990/38] | Title | German: | Chemisch amplifizierter Photolack | [1990/38] | English: | Chemically amplified photoresist | [1990/38] | French: | Photoréserve avec amplification chimique | [1990/38] | Examination procedure | 13.12.1990 | Examination requested [1991/06] | 21.12.1992 | Despatch of a communication from the examining division (Time limit: M06) | 29.06.1993 | Reply to a communication from the examining division | 21.11.1994 | Despatch of a communication from the examining division (Time limit: M06) | 10.05.1995 | Reply to a communication from the examining division | 17.08.1995 | Despatch of communication of intention to grant (Approval: Yes) | 10.01.1996 | Communication of intention to grant the patent | 21.02.1996 | Fee for grant paid | 21.02.1996 | Fee for publishing/printing paid | Opposition(s) | 18.04.1997 | No opposition filed within time limit [1997/28] | Fees paid | Renewal fee | 24.02.1992 | Renewal fee patent year 03 | 18.02.1993 | Renewal fee patent year 04 | 26.02.1994 | Renewal fee patent year 05 | 27.02.1995 | Renewal fee patent year 06 | 13.02.1996 | Renewal fee patent year 07 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [YD]US4371605 (RENNER CARL A); | [Y]EP0102450 ; | [A]US3782939 (BONHAM J, et al) | [Y] - IBM TECHNICAL DISCLOSURE BULLETIN. vol. 18, no. 6, 06 November 1975, NEW YORK US & KRISTOFF J.S: "PHOTORESIST ADDITIVE SENSITIZER" |