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Extract from the Register of European Patents

EP About this file: EP0465515

EP0465515 - PROCESS AND DEVICE FOR MONITORING ION ASSISTED MACHINING PROCESSES ON WAFERS [Right-click to bookmark this link]
Former [1992/03]PROCESS AND DEVICE FOR MONITORING ASSISTED ION MACHINING PROCESSES ON WAFERS
[1996/33]
StatusNo opposition filed within time limit
Status updated on  20.06.1997
Database last updated on 29.10.2024
Most recent event   Tooltip20.06.1997No opposition filed within time limitpublished on 06.08.1997 [1997/32]
Applicant(s)For all designated states
Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
Leonrodstrasse 54
80636 München / DE
[N/P]
Former [1992/03]For all designated states
FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
Leonrodstrasse 54
D-80636 München / DE
Inventor(s)01 / HEINRICH, Friedhelm
Rheingaustr. 25
D-1000 Berlin 41 / DE
[1992/03]
Representative(s)Münich, Wilhelm, et al
Dr. Münich & Kollegen Anwaltskanzlei Wilhelm-Mayr-Strasse 11
80689 München / DE
[N/P]
Former [1994/08]Münich, Wilhelm, Dr., et al
Kanzlei Münich, Steinmann, Schiller Wilhelm-Mayr-Str. 11
D-80689 München / DE
Former [1992/03]Münich, Wilhelm, Dr.
Kanzlei Münich, Steinmann, Schiller Wilhelm-Mayr-Str. 11
D-80689 München / DE
Application number, filing date90905183.131.03.1990
[1992/03]
WO1990DE00255
Priority number, dateDE1989391049131.03.1989         Original published format: DE 3910491
[1992/03]
Filing languageDE
Procedural languageDE
PublicationType: A1 Application with search report
No.:WO9012415
Date:18.10.1990
Language:DE
[1990/24]
Type: A1 Application with search report 
No.:EP0465515
Date:15.01.1992
Language:DE
The application published by WIPO in one of the EPO official languages on 18.10.1990 takes the place of the publication of the European patent application.
[1992/03]
Type: B1 Patent specification 
No.:EP0465515
Date:14.08.1996
Language:DE
[1996/33]
Search report(s)International search report - published on:EP18.10.1990
ClassificationIPC:H01J37/32, H01J37/304, G01N21/62, H01J37/305
[1992/03]
CPC:
H01J37/32935 (EP,US)
Designated contracting statesAT,   BE,   CH,   DE,   FR,   GB,   IT,   LI,   LU,   NL,   SE [1992/09]
Former [1992/03]AT,  BE,  CH,  DE,  DK,  ES,  FR,  GB,  IT,  LI,  LU,  NL,  SE 
TitleGerman:VERFAHREN ZUR ÜBERWACHUNG VON IONEN-UNTERSTÜTZTEN BEARBEITUNGSVORGÄNGEN AN WAFERN UND VORRICHTUNG ZUR DURCHFÜHRUNG DES VERFAHRENS[1992/03]
English:PROCESS AND DEVICE FOR MONITORING ION ASSISTED MACHINING PROCESSES ON WAFERS[1996/33]
French:PROCEDE ET DISPOSITIF POUR CONTROLER DES PROCESSUS D'USINAGE ASSISTES PAR VOIE IONIQUE SUR DES TRANCHES[1992/03]
Former [1992/03]PROCESS AND DEVICE FOR MONITORING ASSISTED ION MACHINING PROCESSES ON WAFERS
Entry into regional phase11.09.1991National basic fee paid 
11.09.1991Designation fee(s) paid 
11.09.1991Examination fee paid 
Examination procedure01.06.1990Loss of particular rights, legal effect: designated state(s)
03.08.1990Request for preliminary examination filed
International Preliminary Examining Authority: DE
11.09.1991Examination requested  [1992/03]
01.04.1992Despatch of communication of loss of particular rights: designated state(s) DK
01.04.1992Despatch of communication of loss of particular rights: designated state(s) ES
01.06.1992Loss of particular rights, legal effect: designated state(s)
29.12.1993Despatch of a communication from the examining division (Time limit: M04)
03.05.1994Reply to a communication from the examining division
14.06.1994Despatch of a communication from the examining division (Time limit: M06)
30.01.1995Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
08.03.1995Reply to a communication from the examining division
25.04.1995Despatch of a communication from the examining division (Time limit: M02)
20.05.1995Reply to a communication from the examining division
29.06.1995Despatch of communication of intention to grant (Approval: Yes)
13.10.1995Communication of intention to grant the patent
27.11.1995Fee for grant paid
27.11.1995Fee for publishing/printing paid
Opposition(s)15.05.1997No opposition filed within time limit [1997/32]
Request for further processing for:08.03.1995Request for further processing filed
08.03.1995Full payment received (date of receipt of payment)
Request granted
28.03.1995Decision despatched
Fees paidRenewal fee
31.03.1992Renewal fee patent year 03
31.03.1993Renewal fee patent year 04
31.03.1994Renewal fee patent year 05
31.03.1995Renewal fee patent year 06
26.03.1996Renewal fee patent year 07
Penalty fee
Penalty fee Rule 85a EPC 1973
10.01.1992DK   M01   Not yet paid
10.01.1992ES   M01   Not yet paid
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Lapses during opposition  TooltipSE14.11.1996
[1997/18]
Cited inInternational search[XP]  - APPLIED PHYSICS LETTERS. vol. 55, no. 14, 02 Oktober 1989, NEW YORK US Seiten 1474 - 1476; Heinrich et al.: "New and simple optical method for in-situ etch rate determination and endpoint detection" siehe das ganze Dokument
 [Y]  - REVIEW OF SCIENTIFIC INSTRUMENTS. vol. 51, no. 11, November 1980, NEW YORK US Seiten 1451 - 1462; Burrell et al.: "Doppler shift spectroscopy of powerful neutral beams" siehe Zusammenfassung siehe Seite 1453, linke Spalte, Absatz 2-Ende rechter Spalte
 [Y]  - JOURNAL OF APPLIED PHYSICS. vol. 53, no. 6, Juni 1982, NEW YORK US Seiten 4389 - 4394; Dzioba et al.: "Optical spectroscopy during reactive ion beam etching of Si and Al targets" siehe Seiten 4389 - 4390
 [A]  - JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B. vol. 3, no. 5, September 1985, NEW YORK US Seiten 1543 - 1545; Husinsky et al.: "Doppler shift laser fluorescence spectroscopy of sputtered and evaporatedatoms under Ar+ bombardment" siehe das ganze Dokument
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.