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EP0465515

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EP About this file: EP0465515

EP0465515 - PROCESS AND DEVICE FOR MONITORING ION ASSISTED MACHINING PROCESSES ON WAFERS [Right-click to bookmark this link]
Former [1992/03]	PROCESS AND DEVICE FOR MONITORING ASSISTED ION MACHINING PROCESSES ON WAFERS
	[1996/33]
Status	No opposition filed within time limit Status updated on 20.06.1997 Database last updated on 29.10.2024
Most recent event Tooltip	20.06.1997	No opposition filed within time limit	published on 06.08.1997 [1997/32]
Applicant(s)	For all designated states Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Leonrodstrasse 54 80636 München / DE
	[N/P]
Former [1992/03]	For all designated states FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. Leonrodstrasse 54 D-80636 München / DE
Inventor(s)	01 / HEINRICH, Friedhelm Rheingaustr. 25 D-1000 Berlin 41 / DE
	[1992/03]
Representative(s)	Münich, Wilhelm, et al Dr. Münich & Kollegen Anwaltskanzlei Wilhelm-Mayr-Strasse 11 80689 München / DE
	[N/P]
Former [1994/08]	Münich, Wilhelm, Dr., et al Kanzlei Münich, Steinmann, Schiller Wilhelm-Mayr-Str. 11 D-80689 München / DE
Former [1992/03]	Münich, Wilhelm, Dr. Kanzlei Münich, Steinmann, Schiller Wilhelm-Mayr-Str. 11 D-80689 München / DE
Application number, filing date	90905183.1	31.03.1990
	[1992/03]
	WO1990DE00255
Priority number, date	DE19893910491	31.03.1989 Original published format: DE 3910491
	[1992/03]
Filing language	DE
Procedural language	DE
Publication	Type:	A1 Application with search report
	No.:	WO9012415
	Date:	18.10.1990
	Language:	DE
	[1990/24]
	Type:	A1 Application with search report
	No.:	EP0465515
	Date:	15.01.1992
	Language:	DE
	The application published by WIPO in one of the EPO official languages on 18.10.1990 takes the place of the publication of the European patent application.
	[1992/03]
	Type:	B1 Patent specification
	No.:	EP0465515
	Date:	14.08.1996
	Language:	DE
	[1996/33]
Search report(s)	International search report - published on:	EP	18.10.1990
Classification	IPC:	H01J37/32, H01J37/304, G01N21/62, H01J37/305	[1992/03]
	CPC:	H01J37/32935 (EP,US)
Designated contracting states	AT, BE, CH, DE, FR, GB, IT, LI, LU, NL, SE [1992/09]
Former [1992/03]	AT, BE, CH, DE, DK, ES, FR, GB, IT, LI, LU, NL, SE
Title	German:	VERFAHREN ZUR ÜBERWACHUNG VON IONEN-UNTERSTÜTZTEN BEARBEITUNGSVORGÄNGEN AN WAFERN UND VORRICHTUNG ZUR DURCHFÜHRUNG DES VERFAHRENS	[1992/03]
	English:	PROCESS AND DEVICE FOR MONITORING ION ASSISTED MACHINING PROCESSES ON WAFERS	[1996/33]
	French:	PROCEDE ET DISPOSITIF POUR CONTROLER DES PROCESSUS D'USINAGE ASSISTES PAR VOIE IONIQUE SUR DES TRANCHES	[1992/03]
	Former [1992/03]	PROCESS AND DEVICE FOR MONITORING ASSISTED ION MACHINING PROCESSES ON WAFERS
Entry into regional phase	11.09.1991	National basic fee paid
	11.09.1991	Designation fee(s) paid
	11.09.1991	Examination fee paid
Examination procedure	01.06.1990	Loss of particular rights, legal effect: designated state(s)
	03.08.1990	Request for preliminary examination filed International Preliminary Examining Authority: DE
	11.09.1991	Examination requested [1992/03]
	01.04.1992	Despatch of communication of loss of particular rights: designated state(s) DK
	01.04.1992	Despatch of communication of loss of particular rights: designated state(s) ES
	01.06.1992	Loss of particular rights, legal effect: designated state(s)
	29.12.1993	Despatch of a communication from the examining division (Time limit: M04)
	03.05.1994	Reply to a communication from the examining division
	14.06.1994	Despatch of a communication from the examining division (Time limit: M06)
	30.01.1995	Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
	08.03.1995	Reply to a communication from the examining division
	25.04.1995	Despatch of a communication from the examining division (Time limit: M02)
	20.05.1995	Reply to a communication from the examining division
	29.06.1995	Despatch of communication of intention to grant (Approval: Yes)
	13.10.1995	Communication of intention to grant the patent
	27.11.1995	Fee for grant paid
	27.11.1995	Fee for publishing/printing paid
Opposition(s)	15.05.1997	No opposition filed within time limit [1997/32]
Request for further processing for:	08.03.1995	Request for further processing filed
	08.03.1995	Full payment received (date of receipt of payment) Request granted
	28.03.1995	Decision despatched
Fees paid	Renewal fee
	31.03.1992	Renewal fee patent year 03
	31.03.1993	Renewal fee patent year 04
	31.03.1994	Renewal fee patent year 05
	31.03.1995	Renewal fee patent year 06
	26.03.1996	Renewal fee patent year 07
	Penalty fee
	Penalty fee Rule 85a EPC 1973
	10.01.1992	DK M01 Not yet paid
	10.01.1992	ES M01 Not yet paid
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition Tooltip	SE	14.11.1996
	[1997/18]
Cited in	International search	[XP] - APPLIED PHYSICS LETTERS. vol. 55, no. 14, 02 Oktober 1989, NEW YORK US Seiten 1474 - 1476; Heinrich et al.: "New and simple optical method for in-situ etch rate determination and endpoint detection" siehe das ganze Dokument
		[Y] - REVIEW OF SCIENTIFIC INSTRUMENTS. vol. 51, no. 11, November 1980, NEW YORK US Seiten 1451 - 1462; Burrell et al.: "Doppler shift spectroscopy of powerful neutral beams" siehe Zusammenfassung siehe Seite 1453, linke Spalte, Absatz 2-Ende rechter Spalte
		[Y] - JOURNAL OF APPLIED PHYSICS. vol. 53, no. 6, Juni 1982, NEW YORK US Seiten 4389 - 4394; Dzioba et al.: "Optical spectroscopy during reactive ion beam etching of Si and Al targets" siehe Seiten 4389 - 4390
		[A] - JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B. vol. 3, no. 5, September 1985, NEW YORK US Seiten 1543 - 1545; Husinsky et al.: "Doppler shift laser fluorescence spectroscopy of sputtered and evaporatedatoms under Ar+ bombardment" siehe das ganze Dokument

The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.

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