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Extract from the Register of European Patents

EP About this file: EP0444628

EP0444628 - Method of automatic control of growing neck portion of a single crystal by the CZ method [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  12.08.1995
Database last updated on 03.10.2024
Most recent event   Tooltip12.08.1995No opposition filed within time limitpublished on 04.10.1995 [1995/40]
Applicant(s)For all designated states
SHIN-ETSU HANDOTAI COMPANY LIMITED
4-2, Marunouchi 1-Chome Chiyoda-ku
Tokyo / JP
[N/P]
Former [1991/36]For all designated states
SHIN-ETSU HANDOTAI COMPANY LIMITED
4-2, Marunouchi 1-Chome
Chiyoda-ku Tokyo / JP
Inventor(s)01 / Baba, Masahiko
A-5-3, Kohu Apartment Bldg
791-4, Yanase, Annaka-shi, Gunma 379-01 / JP
02 / Ohtsuna, Hiroshi
1-8-19, Kamiuzue-cho, Sabae-shi
Hukui 916 / JP
[1991/36]
Representative(s)Rau, Manfred, et al
Rau, Schneck & Hübner
Patentanwälte Rechtsanwälte PartGmbB
Königstrasse 2
90402 Nürnberg / DE
[N/P]
Former [1991/36]Rau, Manfred, Dr. Dipl.-Ing., et al
Rau, Schneck & Hübner Patentanwälte Königstrasse 2
D-90402 Nürnberg / DE
Application number, filing date91102879.327.02.1991
[1991/36]
Priority number, dateJP1990004893428.02.1990         Original published format: JP 4893490
[1991/36]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0444628
Date:04.09.1991
Language:EN
[1991/36]
Type: B1 Patent specification 
No.:EP0444628
Date:12.10.1994
Language:EN
[1994/41]
Search report(s)(Supplementary) European search report - dispatched on:EP08.07.1991
ClassificationIPC:C30B15/22
[1991/36]
CPC:
C30B15/22 (EP,US); Y10T117/1008 (EP,US)
Designated contracting statesDE,   FR,   GB [1991/36]
TitleGerman:Verfahren zur automatischen Steuerung der Züchtung des Halsteiles eines Einkristalles nach dem Czochralski-Verfahren[1991/36]
English:Method of automatic control of growing neck portion of a single crystal by the CZ method[1991/36]
French:Procédé de croissance automatique de la partie col d'un lingot monocristallin par la méthode Czochralski[1991/36]
Examination procedure19.08.1991Examination requested  [1991/42]
12.03.1993Despatch of a communication from the examining division (Time limit: M06)
20.09.1993Reply to a communication from the examining division
06.10.1993Despatch of a communication from the examining division (Time limit: M04)
20.10.1993Reply to a communication from the examining division
27.01.1994Despatch of communication of intention to grant (Approval: Yes)
08.04.1994Communication of intention to grant the patent
19.04.1994Fee for grant paid
19.04.1994Fee for publishing/printing paid
Opposition(s)13.07.1995No opposition filed within time limit [1995/40]
Fees paidRenewal fee
11.02.1993Renewal fee patent year 03
10.02.1994Renewal fee patent year 04
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Documents cited:Search[X]JP60176989  ;
 [X]US3958129  (CLEMENT DONALD R, et al);
 [X]FR2071788  (IBM);
 [A]DE1519850  (PHILIPS NV)
 [X]  - PATENT ABSTRACTS OF JAPAN, vol. 10, no. 23 (C-325)[2080], 29th January 1986; & JP-A-60 176 989 (TOSHIBA K.K.) 11-09-1985, & JP60176989 A 00000000
 [A]  - SOLID-STATE TECHNOLOGY, vol. 25, no. 5, May 1982, pages 89-90, Port Washington, New York, US; "Silicon crystal growth furnace"
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.