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EP0470580
European procedure
Extract from the Register of European Patents
EP About this file: EP0470580
| EP0470580 - Plasma processing apparatus [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 28.04.2000 Database last updated on 24.08.2024 | Most recent event Tooltip | 28.04.2000 | No opposition filed within time limit | published on 14.06.2000 [2000/24] | Applicant(s) | For all designated states CANON KABUSHIKI KAISHA 30-2, 3-chome, Shimomaruko, Ohta-ku Tokyo / JP | For all designated states Ohmi, Tadahiro 1-17-301, Komegabukuro 2-chome Aoba-ku Sendai-shi Miyagi-ken 980 / JP | For all designated states APPLIED MATERIALS JAPAN, INC. 2-7-1 Nishi-Shinjuku Shinjuku-ku Tokyo / JP | [N/P] |
| Former [1992/07] | For all designated states CANON KABUSHIKI KAISHA 30-2, 3-chome, Shimomaruko, Ohta-ku Tokyo / JP | ||
| For all designated states OHMI, Tadahiro 1-17-301, Komegabukuro 2-chome Aoba-ku Sendai-shi Miyagi-ken 980 / JP | |||
| For all designated states APPLIED MATERIALS JAPAN, INC. 2-7-1 Nishi-Shinjuku Shinjuku-ku, Tokyo / JP | Inventor(s) | 01 /
Yamagami, Atsushi c/o Canon K.K., 30-2, 3-chome, Shimomaruko Ohta-ku, Tokyo / JP | 02 /
Okamura, Nobuyuki c/o Canon K.K., 30-2, 3-chome, Shimomaruko Ohta-ku, Tokyo / JP | 03 /
Ohmi, Tadahiro 1-17-301, Komegabukuro 2-chome Aoba-ku, Sendai-shi, Miyagi-ken / JP | 04 /
Goto, Haruhiro Harry Furiiden Kashiwagi 203, 8-8, Kashiwagi 3-chome Aoba-ku, Sendai-shi, Miyagi-ken / JP | 05 /
Shibata, Tadashi 5-2, Nihondaira, Taihaku-ku Sendai-shi, Miyagi-ken / JP | [1992/16] |
| Former [1992/07] | 01 /
Yamagami, Atsushi c/o Canon K.K., 30-2, 3-chome, Shimomaruko Ohta-ku, Tokyo / JP | ||
| 02 /
Okamura, Nobuyuki c/o Canon K.K., 30-2, 3-chome, Shimomaruko Ohta-ku, Tokyo / JP | |||
| 03 /
Ohmi, Tadahiro 1-17-301, Komegabukuro 2-chome Aoba-ku, Sendai-shi, Miyagi-ken / JP | |||
| 04 /
Goto, Haruhiro Harry Furiiden Kashiwagi 203, 8-8, Kashiwagi 3-chome Aoba-ku, Sendai-shi, Miyagi-ken / JP | |||
| 05 /
Shibata, Nao 5-2, Nihondaira, Taihaku-ku Sendai-shi, Miyagi-ken / JP | Representative(s) | Pellmann, Hans-Bernd, et al Patentanwaltsbüro Tiedtke-Bühling-Kinne & Partner Bavariaring 4-6 80336 München / DE | [N/P] |
| Former [1992/07] | Pellmann, Hans-Bernd, Dipl.-Ing., et al Patentanwaltsbüro Tiedtke-Bühling-Kinne & Partner Bavariaring 4 D-80336 München / DE | Application number, filing date | 91113216.5 | 06.08.1991 | [1992/07] | Priority number, date | JP19900207537 | 07.08.1990 Original published format: JP 20753790 | [1992/07] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0470580 | Date: | 12.02.1992 | Language: | EN | [1992/07] | Type: | A3 Search report | No.: | EP0470580 | Date: | 15.04.1992 | Language: | EN | [1992/16] | Type: | B1 Patent specification | No.: | EP0470580 | Date: | 30.06.1999 | Language: | EN | [1999/26] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 27.02.1992 | Classification | IPC: | H01J37/32, C23C14/34, C23C16/50, H01J37/34 | [1998/33] | CPC: |
C23C14/3435 (EP);
C23C14/345 (EP);
C23C14/35 (EP);
C23C16/509 (EP);
H01J37/32697 (EP);
H01J37/3405 (EP);
H01J2237/332 (EP)
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| Former IPC [1992/07] | H01J37/32 | Designated contracting states | DE, FR, GB, IT, NL [1992/07] | Title | German: | Plasmabearbeitungsgerät | [1992/07] | English: | Plasma processing apparatus | [1992/07] | French: | Appareil de traitement par plasma | [1992/07] | Examination procedure | 01.09.1992 | Examination requested [1992/44] | 27.12.1995 | Despatch of a communication from the examining division (Time limit: M04) | 26.04.1996 | Reply to a communication from the examining division | 29.04.1997 | Despatch of a communication from the examining division (Time limit: M06) | 29.10.1997 | Reply to a communication from the examining division | 28.08.1998 | Despatch of communication of intention to grant (Approval: No) | 29.12.1998 | Despatch of communication of intention to grant (Approval: later approval) | 14.01.1999 | Communication of intention to grant the patent | 14.04.1999 | Fee for grant paid | 14.04.1999 | Fee for publishing/printing paid | Opposition(s) | 31.03.2000 | No opposition filed within time limit [2000/24] | Fees paid | Renewal fee | 26.08.1993 | Renewal fee patent year 03 | 30.08.1994 | Renewal fee patent year 04 | 29.08.1995 | Renewal fee patent year 05 | 27.08.1996 | Renewal fee patent year 06 | 27.08.1997 | Renewal fee patent year 07 | 28.08.1998 | Renewal fee patent year 08 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [YD]JP61231172 ; | [Y]EP0261347 ; | [A]US4464223 ; | [A]EP0145015 ; | [AP]EP0435838 | [YD] - PATENT ABSTRACTS OF JAPAN vol. 11, no. 75 (C-408)6 March 1987 & JP-A-61 231 172 ( HITACHI LTD. ) 15 October 1986, & JP61231172 A 19861015 |