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EP0489540
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Extract from the Register of European Patents
EP About this file: EP0489540
| EP0489540 - Phase-shifting lithographic masks with improved resolution [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 19.10.1994 Database last updated on 03.09.2024 | Most recent event Tooltip | 19.10.1994 | Application deemed to be withdrawn | published on 07.12.1994 [1994/49] | Applicant(s) | For all designated states AT&T Corp. 32 Avenue of the Americas New York, NY 10013-2412 / US | [1992/24] | Inventor(s) | 01 /
Garofalo, Joseph G. 50 Eder Terrace South Orange, New Jersey 07079 / US | 02 /
Kostelak, Robert Louis, Jr. 34 Malapardis Road Morris Plains, New Jersey 07950 / US | 03 /
Vaidya, Sheila 170 Washington Drive Watchung, New Jersey 07060 / US | [1992/24] | Representative(s) | Johnston, Kenneth Graham, et al Lucent Technologies EUR-IP UK Ltd Unit 18, Core 3 Workzone Innova Business Park Electric Avenue Enfield, EN3 7XB / GB | [N/P] |
| Former [1992/24] | Johnston, Kenneth Graham, et al AT&T (UK) LTD. AT&T Intellectual Property Division 5 Mornington Road Woodford Green Essex, IG8 OTU / GB | Application number, filing date | 91311013.6 | 28.11.1991 | [1992/24] | Priority number, date | US19900622680 | 05.12.1990 Original published format: US 622680 | [1992/24] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0489540 | Date: | 10.06.1992 | Language: | EN | [1992/24] | Type: | A3 Search report | No.: | EP0489540 | Date: | 16.09.1992 | Language: | EN | [1992/38] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 28.07.1992 | Classification | IPC: | G03F1/14 | [1992/24] | CPC: |
G03F1/29 (EP,US);
G03F7/2002 (EP,US);
G03F7/70283 (EP,US)
| Designated contracting states | DE, FR, GB, IT [1992/24] | Title | German: | Lithographische Phasenverschiebungsmasken mit erhöhter Auflösung | [1992/24] | English: | Phase-shifting lithographic masks with improved resolution | [1992/24] | French: | Masques lithographiques à décalage de phase dont la résolution est améliorée | [1992/24] | File destroyed: | 15.01.2000 | Examination procedure | 04.03.1993 | Examination requested [1993/18] | 16.11.1993 | Despatch of a communication from the examining division (Time limit: M06) | 27.05.1994 | Application deemed to be withdrawn, date of legal effect [1994/49] | 13.07.1994 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [1994/49] | Fees paid | Renewal fee | 09.11.1993 | Renewal fee patent year 03 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]EP0395425 (FUJITSU LTD [JP]); | [AP]EP0401795 (OKI ELECTRIC IND CO LTD [JP]); | [AP]DE4113968 (HITACHI LTD [JP]); | [E]EP0475694 (FUJITSU LTD [JP]) |