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EP0483319
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Extract from the Register of European Patents
EP About this file: EP0483319
| EP0483319 - ETCHING INDIUM TIN OXIDE [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 24.06.1994 Database last updated on 28.03.2026 | Most recent event Tooltip | 24.06.1994 | Application deemed to be withdrawn | published on 17.08.1994 [1994/33] | Applicant(s) | For all designated states Eastman Kodak Company 343 State Street Rochester, NY 14650-2201 / US | [N/P] |
| Former [1992/19] | For all designated states EASTMAN KODAK COMPANY 343 State Street Rochester, New York 14650-2201 / US | Inventor(s) | 01 /
ROSELLE, Paul, L. 343 State Street Rochester, NY 14650-2201 / US | 02 /
PAZ-PUJALT, Gustavo, Roberto 20 North Goodman, No.3 Rochester, NY 14607 / US | 03 /
WEXLER, Ronald, Myron 407 Eastbrooke Lane Rochester, NY 14618 / US | [1992/33] |
| Former [1992/19] | 01 /
ROSELLE, Paul, L. 710 Ridge Road East Rochester, NY 14621 / US | ||
| 02 /
PAZ-PUJALT, Gustavo, Roberto 20 North Goodman, No.3 Rochester, NY 14607 / US | |||
| 03 /
WEXLER, Ronald, Myron 407 Eastbrooke Lane Rochester, NY 14618 / US | Representative(s) | Buff, Michel, et al KODAK INDUSTRIE Département Brevets - CRT Zone Industrielle - B.P. 21 71102 Chalon sur Saône Cédex / FR | [N/P] |
| Former [1992/19] | Buff, Michel, et al Kodak-Pathé Département des Brevets et Licences CRT Centre de Recherches et de Technologie Zone Industrielle F-71102 Chalon sur Saône Cédex / FR | Application number, filing date | 91909117.3 | 03.05.1991 | [1992/19] | WO1991US03065 | Priority number, date | US19900520486 | 07.05.1990 Original published format: US 520486 | [1992/19] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO9117574 | Date: | 14.11.1991 | Language: | EN | [1991/26] | Type: | A1 Application with search report | No.: | EP0483319 | Date: | 06.05.1992 | Language: | EN | The application published by WIPO in one of the EPO official languages on 14.11.1991 takes the place of the publication of the European patent application. | [1992/19] | Search report(s) | International search report - published on: | EP | 14.11.1991 | Classification | IPC: | H01L31/18, G02F1/133 | [1992/19] | CPC: |
C04B41/009 (EP,US);
C04B41/5346 (EP,US);
C04B41/91 (EP,US);
H10F71/138 (EP,US);
C04B2111/00844 (EP,US);
Y02E10/50 (US)
| C-Set: |
C04B41/009, C04B35/453 (EP,US)
| Designated contracting states | DE, FR, GB, NL [1992/19] | Title | German: | ÄTZEN VON INDIUM-ZINN-OXID | [1992/19] | English: | ETCHING INDIUM TIN OXIDE | [1992/19] | French: | ATTAQUE DE L'OXYDE D'INDIUM ETAIN | [1992/19] | File destroyed: | 15.01.2000 | Entry into regional phase | 28.01.1992 | National basic fee paid | 28.01.1992 | Designation fee(s) paid | 25.04.1992 | Examination fee paid | Examination procedure | 25.04.1992 | Examination requested [1992/26] | 03.08.1993 | Despatch of a communication from the examining division (Time limit: M06) | 15.02.1994 | Application deemed to be withdrawn, date of legal effect [1994/33] | 17.03.1994 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [1994/33] | Fees paid | Renewal fee | 19.05.1993 | Renewal fee patent year 03 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [X] Japanese Journal of Applied Physics, vol. 27, no. 9, September 1988, T. Minami et al.: "Reactive ion etching of transparent conducting tin oxide films using electron cyclotron resonance hydrogen plasma", pages L1753-L1756 [X] | [A] Thin Solid Films, vol. 73, no. 2, February 1980, (Lausanne, CH), E.S. Braga et al.: "Plasma etching of snO2 films on silicon substrates", pages L5-L6 [A] | [XP] Japanese Journal od Applied Physics, vol. 29, no. 10, October 1990, M. Mohri et al.: "Plasma etching of ITO thin films using a CH4/H2 gas mixture", pages L1932-L1935 [XP] |