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Extract from the Register of European Patents

EP About this file: EP0497148

EP0497148 - Process for producing metal or semiconductor wafers [Right-click to bookmark this link]
Former [1992/32]Process for producing metal wafers and use of silicon wafers
[1998/34]
StatusThe application has been withdrawn
Status updated on  12.03.1999
Database last updated on 13.11.2024
Most recent event   Tooltip12.03.1999Withdrawal of applicationpublished on 28.04.1999 [1999/17]
Applicant(s)For all designated states
BAYER AG
51368 Leverkusen / DE
[N/P]
Former [1992/32]For all designated states
BAYER AG
D-51368 Leverkusen / DE
Inventor(s)01 / Knauth, Philippe, Dr., Faculte des Sciences de St.
Jerome, case 511, Av Escadrille Normandie-Niemen
F-13397 Marseille Cedex 13 / FR
02 / Schwirtlich, Ingo, Dr.
Hausweberstrasse 26
W-4150 Krefeld / DE
[1992/32]
Application number, filing date92100627.616.01.1992
[1992/32]
Priority number, dateDE1991410248429.01.1991         Original published format: DE 4102484
[1992/32]
Filing languageDE
Procedural languageDE
PublicationType: A1 Application with search report 
No.:EP0497148
Date:05.08.1992
Language:DE
[1992/32]
Search report(s)(Supplementary) European search report - dispatched on:EP15.04.1992
ClassificationIPC:C30B15/06
[1992/32]
CPC:
H01L31/182 (EP,US); C30B15/007 (EP,US); Y02E10/546 (EP,US);
Y02P70/50 (EP,US); Y10S117/90 (EP,US); Y10S117/914 (EP,US)
Designated contracting statesDE,   FR,   IT [1992/32]
TitleGerman:Verfahren zur Herstellung von Halbleiter- oder Metallscheiben[1998/34]
English:Process for producing metal or semiconductor wafers[1998/34]
French:Procédé de fabrication de plaquettes en métal ou en matérian sémiconducteur[1998/34]
Former [1992/32]Verfahren zur Herstellung von Metallscheiben sowie die Verwendung von Siliciumscheiben
Former [1992/32]Process for producing metal wafers and use of silicon wafers
Former [1992/32]Procédé de fabrication de plaquettes en métal et utilisation de plaquettes de silicium
Examination procedure18.08.1992Examination requested  [1992/42]
27.01.1995Despatch of a communication from the examining division (Time limit: M08)
28.09.1995Reply to a communication from the examining division
07.05.1997Despatch of a communication from the examining division (Time limit: M04)
08.09.1997Reply to a communication from the examining division
20.02.1998Despatch of a communication from the examining division (Time limit: M02)
15.04.1998Reply to a communication from the examining division
21.07.1998Despatch of communication of intention to grant (Approval: Yes)
14.10.1998Communication of intention to grant the patent
25.01.1999Fee for grant paid
25.01.1999Fee for publishing/printing paid
26.02.1999Application withdrawn by applicant  [1999/17]
Fees paidRenewal fee
14.12.1993Renewal fee patent year 03
12.12.1994Renewal fee patent year 04
13.12.1995Renewal fee patent year 05
12.12.1996Renewal fee patent year 06
02.02.1998Renewal fee patent year 07
01.02.1999Renewal fee patent year 08
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Documents cited:Search[Y]JP62212042  ;
 [YD]EP0165449  (BAYER AG [DE]);
 [A]EP0381051  (HELIOTRONIC GMBH [DE]);
 [A]EP0016905  (ALLIED CORP [US])
    [ ] - PATENT ABSTRACTS OF JAPAN, Band 12, Nr. 67 (M-673), 02. März 1988
 [Y]  - PATENT ABSTRACTS OF JAPAN vol. 12, no. 67 (M-673)2. März 1988 & JP-A-62 212 042 ( KAWASAKI STEEL CORP. ) 18. September 1987, & JP62212042 A 00000000
    [ ] - JOURNAL OF CRYSTAL GROWTH, Band 50, Nr. 1, September 1980, Amsterdam (NL); J.D. ZOOK et al., Seiten 260-278
 [A]  - JOURNAL OF CRYSTAL GROWTH. Bd. 50, Nr. 1, September 1980, AMSTERDAM NL Seiten 260 - 278; J.D. ZOOK ET AL: 'SUPPORTED GROWTH OF SHEET SILICON FROM THE MELT'
    [ ] - JOURNAL OF CRYSTAL GROWTH, Band 104, Nr. 1, 01. Juli 1990, Amsterdam (NL); H. LANGE et al., Seiten 108-112
 [A]  - JOURNAL OF CRYSTAL GROWTH. Bd. 104, Nr. 1, 1. Juli 1990, AMSTERDAM NL Seiten 108 - 112; H. LANGE ET AL: 'RIBBON GROWTH ON SUBSTRATES (RGS) - A NEW APPROACH TO HIGH SPEED GROWTH OF SILICON RIBBONS FOR PHOTOVOLTAICS'
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.