EP0505903 - A photosensitive composition for offset lithography plates [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 18.06.1999 Database last updated on 02.11.2024 | Most recent event Tooltip | 18.06.1999 | Application deemed to be withdrawn | published on 04.08.1999 [1999/31] | Applicant(s) | For all designated states PLURIMETAL S.R.L. Via Salieri, 4 37050 Vallese di Oppeano (Verona) / IT | [N/P] |
Former [1992/40] | For all designated states PLURIMETAL S.R.L. Via Salieri, 4 I-37050 Vallese di Oppeano (Verona) / IT | Inventor(s) | 01 /
Rinaldi, Rinaldo Via Salieri, 4 I-37050 Vallese di Oppeano, (Verona) / IT | [1992/40] | Representative(s) | Minoja, Fabrizio Bianchetti & Minoja S.r.l. Via Plinio, 63 20129 Milano / IT | [N/P] |
Former [1992/40] | Minoja, Fabrizio Studio Consulenza Brevettuale, Via Rossini, 8 I-20122 Milano / IT | Application number, filing date | 92104646.2 | 18.03.1992 | [1992/40] | Priority number, date | IT1991MI00844 | 28.03.1991 Original published format: IT MI910844 | [1992/40] | Filing language | IT | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP0505903 | Date: | 30.09.1992 | Language: | EN | [1992/40] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 14.07.1992 | Classification | IPC: | G03F7/105 | [1992/40] | CPC: |
G03F7/105 (EP)
| Designated contracting states | AT, BE, CH, DE, DK, ES, FR, GB, GR, IT, LI, LU, MC, NL, PT, SE [1992/40] | Title | German: | Lichtempfindliche Zusammensetzung für lithographische Offsetdruckplatten | [1992/40] | English: | A photosensitive composition for offset lithography plates | [1992/40] | French: | Composition photosensible pour plaques d'impression offset lithographiques | [1992/40] | Examination procedure | 19.03.1993 | Examination requested [1993/20] | 24.02.1997 | Despatch of a communication from the examining division (Time limit: M04) | 05.06.1997 | Reply to a communication from the examining division | 19.11.1997 | Despatch of a communication from the examining division (Time limit: M04) | 13.03.1998 | Reply to a communication from the examining division | 26.06.1998 | Observations by third parties | 02.10.1998 | Despatch of a communication from the examining division (Time limit: M04) | 13.02.1999 | Application deemed to be withdrawn, date of legal effect [1999/31] | 11.03.1999 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [1999/31] | Fees paid | Renewal fee | 23.03.1994 | Renewal fee patent year 03 | 28.03.1995 | Renewal fee patent year 04 | 26.03.1996 | Renewal fee patent year 05 | 21.03.1997 | Renewal fee patent year 06 | 26.03.1998 | Renewal fee patent year 07 | Penalty fee | Additional fee for renewal fee | 31.03.1999 | 08   M06   Not yet paid |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [Y]EP0078980 (HOECHST AG [DE]); | [Y]EP0137452 (HOECHST AG [DE]); | [Y]DE3601264 (FUJI PHOTO FILM CO LTD [JP]) |