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Extract from the Register of European Patents

EP About this file: EP0504925

EP0504925 - Multilayer base heterojunction device [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  29.08.2003
Database last updated on 31.08.2024
Most recent event   Tooltip26.06.2009Change - representativepublished on 29.07.2009  [2009/31]
Applicant(s)For all designated states
Texas Instruments Incorporated
13500 North Central Expressway
Dallas, Texas 75265 / US
[N/P]
Former [1992/39]For all designated states
TEXAS INSTRUMENTS INCORPORATED
13500 North Central Expressway
Dallas Texas 75265 / US
Inventor(s)01 / Bayraktaroglu, Burhan
1100 Edgefield Drive
Plano, Texas 75075 / US
[1992/39]
Representative(s)Degwert, Hartmut, et al
Prinz & Partner
Rundfunkplatz 2
80335 München / DE
[N/P]
Former [2009/31]Degwert, Hartmut, et al
Prinz & Partner GbR Rundfunkplatz 2
80335 München / DE
Former [2003/12]Degwert, Hartmut, Dipl.-Phys., et al
Prinz & Partner GbR, Manzingerweg 7
81241 München / DE
Former [1992/39]Schwepfinger, Karl-Heinz, Dipl.-Ing., et al
Prinz & Partner, Manzingerweg 7
D-81241 München / DE
Application number, filing date92104891.420.03.1992
[1992/39]
Priority number, dateUS1991067280921.03.1991         Original published format: US 672809
[1992/39]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0504925
Date:23.09.1992
Language:EN
[1992/39]
Type: A3 Search report 
No.:EP0504925
Date:16.06.1993
Language:EN
[1993/24]
Type: B1 Patent specification 
No.:EP0504925
Date:23.10.2002
Language:EN
[2002/43]
Search report(s)(Supplementary) European search report - dispatched on:EP29.04.1993
ClassificationIPC:H01L29/737, H01L29/10, H01L21/331
[2001/18]
CPC:
H01L29/7371 (EP,US); H01L29/68 (KR); H01L29/1004 (EP,US);
H01L29/73 (KR); Y10S148/072 (EP,US)
Former IPC [1992/39]H01L29/73, H01L29/10, H01L21/331
Designated contracting statesDE,   FR,   GB,   IT,   NL [1992/39]
TitleGerman:Heteroübergangsbauelement mit einer mehrschichtigen Basis[1992/39]
English:Multilayer base heterojunction device[1992/39]
French:Dispositif à hétérojonction à base multicouche[1992/39]
Examination procedure25.11.1993Examination requested  [1994/03]
05.04.1995Despatch of a communication from the examining division (Time limit: M06)
28.08.1995Reply to a communication from the examining division
13.05.1996Despatch of a communication from the examining division (Time limit: M06)
02.10.1996Reply to a communication from the examining division
28.10.1997Despatch of a communication from the examining division (Time limit: M06)
23.04.1998Reply to a communication from the examining division
23.06.1999Despatch of a communication from the examining division (Time limit: M06)
03.02.2000Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
12.04.2000Reply to a communication from the examining division
23.10.2001Despatch of communication of intention to grant (Approval: Yes)
13.05.2002Communication of intention to grant the patent
21.08.2002Fee for grant paid
21.08.2002Fee for publishing/printing paid
Opposition(s)24.07.2003No opposition filed within time limit [2003/42]
Request for further processing for:12.04.2000Request for further processing filed
12.04.2000Full payment received (date of receipt of payment)
Request granted
04.05.2000Decision despatched
Fees paidRenewal fee
22.03.1994Renewal fee patent year 03
27.03.1995Renewal fee patent year 04
26.03.1996Renewal fee patent year 05
25.03.1997Renewal fee patent year 06
25.03.1998Renewal fee patent year 07
29.03.1999Renewal fee patent year 08
30.03.2000Renewal fee patent year 09
27.03.2001Renewal fee patent year 10
25.03.2002Renewal fee patent year 11
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Lapses during opposition  TooltipIT23.10.2002
NL23.10.2002
[2008/02]
Former [2003/30]NL23.10.2002
Documents cited:Search[A]JP02199873  ;
 [Y]US4873558  (ANTREASYAN ARSAM [US], et al);
 [A]EP0343563  (SIEMENS AG [DE])
 [Y]  - ITO H., "MOCVD GROWN CARBON-DOPED GRADED-BASE ALGAAS/GAAS HBTS.", ELECTRONICS LETTERS, IEE STEVENAGE., GB, GB, (19901108), vol. 26., no. 23., ISSN 0013-5194, pages 1977 - 1978., XP000174287
 [A]  - HOBSON W. S., ET AL., "CARBON-DOPED BASE GAAS-A1GAAS HBT'S GROWN BY MOMBE AND MOCVD REGROWTH.", IEEE ELECTRON DEVICE LETTERS., IEEE SERVICE CENTER, NEW YORK, NY., US, US, (19900601), vol. 11., no. 06., doi:10.1109/55.55267, ISSN 0741-3106, pages 241 - 243., XP000134208

DOI:   http://dx.doi.org/10.1109/55.55267
 [A]  - BARKER D., YASUO ASHIZAWA, TASKER P., ET AL., "EXTREMELY HIGH PEAK SPECIFIC TRANSCONDUCTANCE ALGAAS/GAAS HETEROJUNCTION BIPOLAR TRANSISTORS.", IEEE ELECTRON DEVICE LETTERS., IEEE SERVICE CENTER, NEW YORK, NY., US, US, (19890701), vol. 10., no. 7., doi:10.1109/55.29663, ISSN 0741-3106, pages 313 - 315., XP000035237

DOI:   http://dx.doi.org/10.1109/55.29663
 [A]  - YIN L. W., ET AL., "IMPROVED BREAKDOWN VOLTAGE IN GAAS MESFET'S UTILIZING SURFACE LAYERS OF GAAS GROWN AT A LOW TEMPERATURE BY MBE.", IEEE ELECTRON DEVICE LETTERS., IEEE SERVICE CENTER, NEW YORK, NY., US, US, (19901201), vol. 11., no. 12., doi:10.1109/55.63040, ISSN 0741-3106, pages 561 - 563., XP000160779

DOI:   http://dx.doi.org/10.1109/55.63040
 [A]  - PATENT ABSTRACTS OF JAPAN vol. 014, no. 483 (E-993)22 October 1990 & JP-A-02 199 873 ( HITACHI ) 8 August 1990, & JP02199873 A 19900808
 [A]  - IEEE ELECTRON DEVICE LETTERS vol. 5, no. 11, November 1984, NEW YORK US pages 456 - 457 R. FISCHER ET AL. 'GAAS/ALGAAS MODFET'S GROWN ON (100) GE'
Examination   - "Very high speed integrated circuits: Heterostructure", SEMICONDUCTORS AMD SEMIMETALS, ACADEMIC PRESS, BOSTON, US, vol. 30, pages 208 - 210
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.