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EP0508359
European procedure
Extract from the Register of European Patents
EP About this file: EP0508359
| EP0508359 - Process and apparatus for coating at least one object [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 15.08.1997 Database last updated on 31.08.2024 | Most recent event Tooltip | 23.12.1999 | Lapse of the patent in a contracting state New state(s): LU | published on 09.02.2000 [2000/06] | Applicant(s) | For all designated states BALZERS AKTIENGESELLSCHAFT 9496 Balzers / LI | [N/P] |
| Former [1992/42] | For all designated states BALZERS AKTIENGESELLSCHAFT FL-9496 Balzers / LI | Inventor(s) | 01 /
Kuegler, Eduard, Dr. Dipl.-Ing. Rappenwaldstrasse 19 A-6807 Feldkirch-Tisis / AT | [1994/03] |
| Former [1993/48] | 01 /
Kuegler, Eduard, Dr. Dipl.-Ing. Rappenwaldstrasse 19 A-6807 Feldkirch-Tisis / AT | ||
| 02 /
ellerdieck, Klaus Dr. Dipl.-El.-Ing. Turnhallenstrasse 9 CH-9470 Buchs / CH | |||
| 03 /
Stock, Jakob Maschinenschlosser Tobel 35 CH-7303 Mastrils / CH | |||
| 04 /
Grünenfelder, Pius, Laborant. Buelweg CH-7323 Wangs / CH | |||
| Former [1992/42] | 01 /
Kuegler, Eduard, Dr. Dipl.-Ing. Rappenwaldstrasse 19 A-6807 Feldkirch-Tisis / AT | Representative(s) | Troesch Scheidegger Werner AG Patentanwälte Postfach 8032 Zürich / CH | [N/P] |
| Former [1992/42] | Troesch Scheidegger Werner AG Patentanwälte, Siewerdtstrasse 95, Postfach CH-8050 Zürich / CH | Application number, filing date | 92105963.0 | 07.04.1992 | [1992/42] | Priority number, date | CH19910001095 | 12.04.1991 Original published format: CH 109591 | [1992/42] | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | EP0508359 | Date: | 14.10.1992 | Language: | DE | [1992/42] | Type: | B1 Patent specification | No.: | EP0508359 | Date: | 09.10.1996 | Language: | DE | [1996/41] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 28.07.1992 | Classification | IPC: | C23C14/34, C23C14/54, H01J37/34 | [1992/42] | CPC: |
C23C14/0094 (EP,US);
C23C14/0042 (EP,US);
C23C14/34 (EP,US);
H01J37/3405 (EP,US)
| Designated contracting states | AT, BE, CH, DE, DK, ES, FR, GB, IT, LI, LU, NL, SE [1992/42] | Title | German: | Verfahren und Anlage zur Beschichtung mindestens eines Gegenstandes | [1992/42] | English: | Process and apparatus for coating at least one object | [1992/42] | French: | Procédé et dispositif pour le revêtement d'au moins un objet | [1992/42] | Examination procedure | 26.09.1992 | Examination requested [1992/48] | 24.02.1994 | Despatch of a communication from the examining division (Time limit: M04) | 11.01.1995 | Despatch of a communication from the examining division (Time limit: M04) | 19.05.1995 | Reply to a communication from the examining division | 16.02.1996 | Despatch of communication of intention to grant (Approval: Yes) | 11.04.1996 | Communication of intention to grant the patent | 01.07.1996 | Fee for grant paid | 01.07.1996 | Fee for publishing/printing paid | Opposition(s) | 10.07.1997 | No opposition filed within time limit [1997/40] | Fees paid | Renewal fee | 09.03.1994 | Renewal fee patent year 03 | 27.02.1995 | Renewal fee patent year 04 | 28.02.1996 | Renewal fee patent year 05 |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | DK | 09.10.1996 | LU | 30.04.1997 | [2000/06] |
| Former [1998/15] | DK | 09.10.1996 | Documents cited: | Search | [XD]JP63111173 ; | [AD]EP0328257 (OPTICAL COATING LABORATORY INC [US]); | [XD]EP0416241 (LEYBOLD AG [DE]) | [XD] - PATENT ABSTRACTS OF JAPAN vol. 12, no. 353 (C-530)(3200) 21. September 1988 & JP-A-63 111 173 ( ANELVA CORP ) 16. Mai 1988, & JP63111173 A 00000000 | [AD] - SURFACE AND COATINGS TECHNOLOGY Bd. 33, 1987, AMSTERDAM Seiten 405 - 423; SCHILLER ET AL.: 'Reactive DC high-rate sputtering as production technology' | [A] - JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART A. Bd. 6, Nr. 3, Juni 1988, NEW YORK US Seiten 1845 - 1848; ESTE ET AL.: 'A quasi-direct-current sputtering technique for the deposition of dielectrics at enhanced rates' | Examination | - SCHILLER ET AL.: 'Reactive DC high-rate sputtering as production technology' | - Thin Solid Films, Vol. 101 (1983) March, No.1, Elsevier Sequoia, Lausanne, Switzerland; pages 1-5: "Effect of N2-Ar Mixing on the Reactive Sputtering Characteristics of Silicon", T. Serikawa et al. |