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Extract from the Register of European Patents

EP About this file: EP0496614

EP0496614 - Method for forming contact hole in process of manufacturing semiconductor device [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  04.05.1995
Database last updated on 03.09.2024
Most recent event   Tooltip04.05.1995Application deemed to be withdrawnpublished on 28.06.1995 [1995/26]
Applicant(s)For all designated states
NEC Corporation
7-1, Shiba 5-chome Minato-ku
Tokyo 108-8001 / JP
[N/P]
Former [1992/31]For all designated states
NEC CORPORATION
7-1, Shiba 5-chome Minato-ku
Tokyo / JP
Inventor(s)01 / Nakano, Eiichi, c/o NEC Corporation
7-1, Shiba 5-chome, Minato-ku
Tokyo / JP
[1992/31]
Representative(s)Moir, Michael Christopher, et al
Mathys & Squire LLP
120 Holborn
London
EC1N 2SQ / GB
[N/P]
Former [1992/31]Moir, Michael Christopher, et al
Mathys & Squire 100 Grays Inn Road
London WC1X 8AL / GB
Application number, filing date92300574.823.01.1992
[1992/31]
Priority number, dateJP1991000614623.01.1991         Original published format: JP 614691
[1992/31]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0496614
Date:29.07.1992
Language:EN
[1992/31]
Search report(s)(Supplementary) European search report - dispatched on:EP07.05.1992
ClassificationIPC:H01L21/3105, H01L21/60, H01L21/90
[1992/31]
CPC:
H01L21/31116 (EP); H01L21/76802 (EP); H01L23/485 (EP);
H01L2924/0002 (EP)
C-Set:
H01L2924/0002, H01L2924/00 (EP)
Designated contracting statesDE,   FR,   GB [1992/31]
TitleGerman:Verfahren zur Erzeugung von Kontaktöffnungen während der Herstellung von Halbleiterbauelementen[1992/31]
English:Method for forming contact hole in process of manufacturing semiconductor device[1992/31]
French:Procéde pour la formation d'ouvertures de contact lors de la fabrication de dispositif à semiconducteur[1992/31]
File destroyed:03.03.2001
Examination procedure10.02.1992Examination requested  [1992/31]
01.08.1994Despatch of a communication from the examining division (Time limit: M04)
12.12.1994Application deemed to be withdrawn, date of legal effect  [1995/26]
18.01.1995Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [1995/26]
Fees paidRenewal fee
22.01.1994Renewal fee patent year 03
Penalty fee
Additional fee for renewal fee
31.01.199504   M06   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[A]GB2023342  ;
 [A]EP0280276  ;
 [A]EP0376479
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.