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Extract from the Register of European Patents

EP About this file: EP0516334

EP0516334 - Method of etching a window in a dielectric layer on an integrated circuit and planarization thereof [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  18.05.2001
Database last updated on 29.10.2024
Most recent event   Tooltip05.10.2005Change: Appeal number 
Applicant(s)For all designated states
AT&T Corp.
32 Avenue of the Americas
New York, NY 10013-2412 / US
[1992/49]
Inventor(s)01 / Lee, Kuo-Hua
1308, Country Club Road
Wescosville, Pennsylvania 18106 / US
02 / Yu, Chen-Hua Douglas
1019 Hillview Drive
Allentown, Pennsylvania 18103 / US
[1992/49]
Representative(s)Watts, Christopher Malcolm Kelway, et al
Lucent Technologies (UK) Ltd, 5 Mornington Road Woodford Green
Essex IG8 OTU / GB
[N/P]
Former [1992/49]Watts, Christopher Malcolm Kelway, Dr., et al
AT&T (UK) LTD. AT&T Intellectual Property Division 5 Mornington Road
Woodford Green Essex IG8 OTU / GB
Application number, filing date92304590.020.05.1992
[1992/49]
Priority number, dateUS1991070772130.05.1991         Original published format: US 707721
[1992/49]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0516334
Date:02.12.1992
Language:EN
[1992/49]
Type: A3 Search report 
No.:EP0516334
Date:09.12.1992
Language:EN
[1992/50]
Search report(s)(Supplementary) European search report - dispatched on:EP23.10.1992
ClassificationIPC:H01L21/90, H01L21/311, H01L21/3105
[1992/50]
CPC:
H01L21/3105 (EP,US); H01L21/76804 (EP,US)
Former IPC [1992/49]H01L21/3105, H01L21/90, H01L21/311
Designated contracting statesDE,   ES,   FR,   GB,   IT [1992/49]
TitleGerman:Verfahren zum Ätzen einer Öffnung in einer dielektrischen Schicht über einer integrierten Schaltung und ihre Planarisierung[1992/49]
English:Method of etching a window in a dielectric layer on an integrated circuit and planarization thereof[1992/49]
French:Méthode d'attaque d'une fenêtre dans une couche diélectrique sur un circuit intégré et sa planarisation[1992/49]
Examination procedure26.05.1993Examination requested  [1993/30]
31.03.1995Despatch of a communication from the examining division (Time limit: M06)
03.10.1995Reply to a communication from the examining division
15.04.1996Despatch of communication that the application is refused, reason: substantive examination {1}
01.12.2000Application deemed to be withdrawn, date of legal effect  [2001/27]
10.01.2001Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2001/27]
Appeal following examination12.06.1996Appeal received No.  T1104/96
15.08.1996Statement of grounds filed
08.03.2001Invitation to file observations in an appeal (Time limit: M02) [2001/10]
18.12.2001Result of appeal procedure: the application was deemed to be withdrawn
Fees paidRenewal fee
12.05.1994Renewal fee patent year 03
12.05.1995Renewal fee patent year 04
20.05.1996Renewal fee patent year 05
20.05.1997Renewal fee patent year 06
18.05.1998Renewal fee patent year 07
14.05.1999Renewal fee patent year 08
Penalty fee
Additional fee for renewal fee
31.05.200009   M06   Not yet paid
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Documents cited:Search[X]US4948743  (OZAKI HIDETO [JP]);
 [A]DE2723499  (LICENTIA GMBH);
 [A]US4916091  (FREEMAN DEAN W [US], et al)
 [X]  - IBM TECHNICAL DISCLOSURE BULLETIN. vol. 28, no. 11, April 1986, NEW YORK US pages 4921 - 4922 'TECHNIQUE FOR TAPERING CONTACT WINDOWS'
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.