EP0573707 - Apparatus for gas source molecular beam epitaxy [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 11.06.1999 Database last updated on 03.09.2024 | Most recent event Tooltip | 11.06.1999 | No opposition filed within time limit | published on 28.07.1999 [1999/30] | Applicant(s) | For all designated states DAIDO HOXAN INC. 2, Kita 3-Jo Nishi 1-chome Chuo-ku Sapporo-city / JP | [1995/51] |
Former [1993/50] | For all designated states DAIDOUSANSO CO., LTD. 20-16, Higashishinsaibashi 1-chome, Chuo-ku Osaka-shi, Osaka 542 / JP | Inventor(s) | 01 /
Kiyama, Hiromi 3-1-102, Oichihara-cho Izumiotsu-shi, Osaka 595 / JP | 02 /
Okumura, Kenji 2-134-2, Aho Matsubara-shi, Osaka 580 / JP | 03 /
Oku, Hidehiko 5-743, Uenoshibamukougaoka-cho Sakai-shi, Osaka 593 / JP | [1993/50] | Representative(s) | Marlow, Nicholas Simon, et al Reddie & Grose LLP The White Chapel Building 10 Whitechapel High Street London E1 8QS / GB | [N/P] |
Former [1995/51] | Marlow, Nicholas Simon, et al Reddie & Grose 16, Theobalds Road London WC1X 8PL / GB | ||
Former [1993/50] | Marlow, Nicholas Simon Reddie & Grose 16, Theobalds Road London WC1X 8PL / GB | Application number, filing date | 92304762.5 | 27.05.1992 | [1993/50] | Priority number, date | JP19920078243 | 27.02.1992 Original published format: JP 7824392 | [1993/50] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0573707 | Date: | 15.12.1993 | Language: | EN | [1993/50] | Type: | A3 Search report | No.: | EP0573707 | Date: | 18.01.1995 | Language: | EN | [1995/03] | Type: | B1 Patent specification | No.: | EP0573707 | Date: | 05.08.1998 | Language: | EN | [1998/32] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 01.12.1994 | Classification | IPC: | C30B25/02, C30B25/08, C30B25/10 | [1993/50] | CPC: |
C30B25/14 (EP);
H01L21/20 (KR);
C23C16/44 (EP);
C23C16/481 (EP);
C30B25/02 (EP);
C30B25/10 (EP);
C30B29/04 (EP)
(-)
| Designated contracting states | DE, FR, GB, IT, NL [1993/50] | Title | German: | Anlage zur Gasquellen-Molekularstrahlepitaxie | [1993/50] | English: | Apparatus for gas source molecular beam epitaxy | [1993/50] | French: | Appareillage pour l'épitaxie par des faisceaux moléculaires avec sources à gaz | [1993/50] | Examination procedure | 14.07.1995 | Examination requested [1995/36] | 25.10.1996 | Despatch of a communication from the examining division (Time limit: M04) | 04.03.1997 | Reply to a communication from the examining division | 04.08.1997 | Despatch of communication of intention to grant (Approval: No) | 10.12.1997 | Despatch of communication of intention to grant (Approval: later approval) | 15.12.1997 | Communication of intention to grant the patent | 16.02.1998 | Fee for grant paid | 16.02.1998 | Fee for publishing/printing paid | Opposition(s) | 07.05.1999 | No opposition filed within time limit [1999/30] | Fees paid | Renewal fee | 25.05.1994 | Renewal fee patent year 03 | 02.05.1995 | Renewal fee patent year 04 | 25.05.1996 | Renewal fee patent year 05 | 28.05.1997 | Renewal fee patent year 06 | 29.05.1998 | Renewal fee patent year 07 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [PX]JPH0489392 ; | [Y]JPH01278715 ; | [A]GB2134932 (WESTERN ELECTRIC CO) [A] 1-7* page 1, line 107 - page 2, line 74; figure 1 *; | [A]US4751372 (FRAAS LEWIS M [US]) [A] 1-7 * column 3, line 15 - line 35; figure *; | [YA]EP0396239 (DAIDO OXYGEN [JP]) [Y] 1 * page 6, line 14 - line 19; figure 1A; claims 1,5 * [A] 2-18 | [PX] - DATABASE WPI, 0, Derwent World Patents Index, vol. 92, no. 18, Database accession no. 92-147517, & JPH0489392 A 19920323 (DAIDO SANSO KK) [PX] 1 * abstract * | [Y] - PATENT ABSTRACTS OF JAPAN, (19900131), vol. 14, no. 55, Database accession no. (E - 0882), & JP01278715 A 19891109 (NIPPON TELEGRAPH AND TELEPHONE CORP.) [Y] 1 * abstract * |