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Extract from the Register of European Patents

EP About this file: EP0573707

EP0573707 - Apparatus for gas source molecular beam epitaxy [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  11.06.1999
Database last updated on 03.09.2024
Most recent event   Tooltip11.06.1999No opposition filed within time limitpublished on 28.07.1999 [1999/30]
Applicant(s)For all designated states
DAIDO HOXAN INC.
2, Kita 3-Jo Nishi 1-chome Chuo-ku
Sapporo-city / JP
[1995/51]
Former [1993/50]For all designated states
DAIDOUSANSO CO., LTD.
20-16, Higashishinsaibashi 1-chome, Chuo-ku
Osaka-shi, Osaka 542 / JP
Inventor(s)01 / Kiyama, Hiromi
3-1-102, Oichihara-cho
Izumiotsu-shi, Osaka 595 / JP
02 / Okumura, Kenji
2-134-2, Aho
Matsubara-shi, Osaka 580 / JP
03 / Oku, Hidehiko
5-743, Uenoshibamukougaoka-cho
Sakai-shi, Osaka 593 / JP
[1993/50]
Representative(s)Marlow, Nicholas Simon, et al
Reddie & Grose LLP The White Chapel Building
10 Whitechapel High Street
London E1 8QS / GB
[N/P]
Former [1995/51]Marlow, Nicholas Simon, et al
Reddie & Grose 16, Theobalds Road
London WC1X 8PL / GB
Former [1993/50]Marlow, Nicholas Simon
Reddie & Grose 16, Theobalds Road
London WC1X 8PL / GB
Application number, filing date92304762.527.05.1992
[1993/50]
Priority number, dateJP1992007824327.02.1992         Original published format: JP 7824392
[1993/50]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0573707
Date:15.12.1993
Language:EN
[1993/50]
Type: A3 Search report 
No.:EP0573707
Date:18.01.1995
Language:EN
[1995/03]
Type: B1 Patent specification 
No.:EP0573707
Date:05.08.1998
Language:EN
[1998/32]
Search report(s)(Supplementary) European search report - dispatched on:EP01.12.1994
ClassificationIPC:C30B25/02, C30B25/08, C30B25/10
[1993/50]
CPC:
C30B25/14 (EP); H01L21/20 (KR); C23C16/44 (EP);
C23C16/481 (EP); C30B25/02 (EP); C30B25/10 (EP);
C30B29/04 (EP) (-)
Designated contracting statesDE,   FR,   GB,   IT,   NL [1993/50]
TitleGerman:Anlage zur Gasquellen-Molekularstrahlepitaxie[1993/50]
English:Apparatus for gas source molecular beam epitaxy[1993/50]
French:Appareillage pour l'épitaxie par des faisceaux moléculaires avec sources à gaz[1993/50]
Examination procedure14.07.1995Examination requested  [1995/36]
25.10.1996Despatch of a communication from the examining division (Time limit: M04)
04.03.1997Reply to a communication from the examining division
04.08.1997Despatch of communication of intention to grant (Approval: No)
10.12.1997Despatch of communication of intention to grant (Approval: later approval)
15.12.1997Communication of intention to grant the patent
16.02.1998Fee for grant paid
16.02.1998Fee for publishing/printing paid
Opposition(s)07.05.1999No opposition filed within time limit [1999/30]
Fees paidRenewal fee
25.05.1994Renewal fee patent year 03
02.05.1995Renewal fee patent year 04
25.05.1996Renewal fee patent year 05
28.05.1997Renewal fee patent year 06
29.05.1998Renewal fee patent year 07
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Documents cited:Search[PX]JPH0489392  ;
 [Y]JPH01278715  ;
 [A]GB2134932  (WESTERN ELECTRIC CO) [A] 1-7* page 1, line 107 - page 2, line 74; figure 1 *;
 [A]US4751372  (FRAAS LEWIS M [US]) [A] 1-7 * column 3, line 15 - line 35; figure *;
 [YA]EP0396239  (DAIDO OXYGEN [JP]) [Y] 1 * page 6, line 14 - line 19; figure 1A; claims 1,5 * [A] 2-18
 [PX]  - DATABASE WPI, 0, Derwent World Patents Index, vol. 92, no. 18, Database accession no. 92-147517, & JPH0489392 A 19920323 (DAIDO SANSO KK) [PX] 1 * abstract *
 [Y]  - PATENT ABSTRACTS OF JAPAN, (19900131), vol. 14, no. 55, Database accession no. (E - 0882), & JP01278715 A 19891109 (NIPPON TELEGRAPH AND TELEPHONE CORP.) [Y] 1 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.