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Extract from the Register of European Patents

EP About this file: EP0529982

EP0529982 - Exhaust apparatus for epitaxial growth system. [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  30.08.1996
Database last updated on 16.09.2024
Most recent event   Tooltip30.08.1996No opposition filed within time limitpublished on 16.10.1996 [1996/42]
Applicant(s)For all designated states
NEC Corporation
7-1, Shiba 5-chome Minato-ku
Tokyo 108-8001 / JP
[N/P]
Former [1993/09]For all designated states
NEC CORPORATION
7-1, Shiba 5-chome Minato-ku
Tokyo / JP
Inventor(s)01 / Nakano, Tomoiku, c/o NEC Corporation
7-1, Shiba 5-chome
Minato-ku, Tokyo / JP
[1993/09]
Representative(s)Moir, Michael Christopher
Mathys & Squire LLP
120 Holborn
London
EC1N 2SQ / GB
[N/P]
Former [1993/09]Moir, Michael Christopher
Mathys & Squire 100 Grays Inn Road
London WC1X 8AL / GB
Application number, filing date92307682.221.08.1992
[1993/09]
Priority number, dateJP1991006664422.08.1991         Original published format: JP 6664491
[1993/09]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0529982
Date:03.03.1993
Language:EN
[1993/09]
Type: B1 Patent specification 
No.:EP0529982
Date:25.10.1995
Language:EN
[1995/43]
Search report(s)(Supplementary) European search report - dispatched on:EP11.12.1992
ClassificationIPC:C30B25/14, C23C16/44
[1993/09]
CPC:
C30B25/14 (EP,US); C23C16/4412 (EP,US); Y10S55/46 (EP,US)
Designated contracting statesDE,   FR,   GB [1993/09]
TitleGerman:Abgasvorrichtung für Epitaxie-Anlage[1993/09]
English:Exhaust apparatus for epitaxial growth system.[1993/09]
French:Appareillage pour les gaz d'échappement sortant d'une installation d'épitaxie[1993/09]
Examination procedure16.01.1993Examination requested  [1993/11]
01.07.1994Despatch of a communication from the examining division (Time limit: M04)
05.11.1994Reply to a communication from the examining division
16.01.1995Despatch of communication of intention to grant (Approval: Yes)
18.04.1995Communication of intention to grant the patent
02.06.1995Fee for grant paid
02.06.1995Fee for publishing/printing paid
Opposition(s)26.07.1996No opposition filed within time limit [1996/42]
Fees paidRenewal fee
24.08.1994Renewal fee patent year 03
23.08.1995Renewal fee patent year 04
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Documents cited:Search[Y]JP58182817  ;
 [X]JP6013071  ;
 [A]JP1139125  ;
 [A]JP63297296  ;
 [A]JP63224214  ;
 [Y]CH663549  (ANTOINE DUBAS);
 [Y]EP0196170  (TOSHIBA KK [JP]);
 [Y]EP0068738  (ITT [US], et al);
 [Y]US4608063  (KUROKAWA TAKASHI [JP])
 [X]  - SOLID STATE TECHNOLOGY vol. 29, no. 9, September 1986, WASHINGTON US pages 143 - 149 SARKOZY ET AL 'Semiconductor vacuum processing:protection of the mechanical pumping system'
 [Y]  - PATENT ABSTRACTS OF JAPAN vol. 8, no. 21 (E-224)(1458) 28 January 1984 & JP-A-58 182 817 ( HITACHI SEISAKUSHO K.K. ) 25 October 1983, & JP58182817 A 19831025
 [X]  - PATENT ABSTRACTS OF JAPAN vol. 9, no. 125 (C-283)(1848) 30 May 1985 & JP-A-60 13 071 ( CANON K.K. ) 23 January 1985, & JP6013071 A 19850123
 [Y]  - PATENT ABSTRACTS OF JAPAN vol. 8, no. 21 (E-224)21 April 1982 & JP-A-58 182 817 ( HITACHI SEISAKUSHO ) 25 October 1983, & JP58182817 A 19831025
 [A]  - PATENT ABSTRACTS OF JAPAN vol. 13, no. 394 (C-631)(3742) 31 August 1989 & JP-A-11 39 125 ( TOSHIBA CORP. ), & JP1139125 A 19890831
 [A]  - PATENT ABSTRACTS OF JAPAN vol. 13, no. 134 (C-581)(3482) 4 April 1989 & JP-A-63 297 296 ( FURUKAWA ELECTRIC CO. ) 5 December 1988, & JP63297296 A 19881205
 [A]  - PATENT ABSTRACTS OF JAPAN vol. 13, no. 18 (E-704)17 January 1989 & JP-A-63 224 214 ( HITACHI LTD ) 19 September 1988, & JP63224214 A 19880919
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.