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Extract from the Register of European Patents

EP About this file: EP0501896

EP0501896 - Improved collector for a bipolar transistor compatible with MOS technology [Right-click to bookmark this link]
StatusThe application has been refused
Status updated on  23.11.2007
Database last updated on 12.07.2024
Most recent event   Tooltip23.11.2007Refusal of applicationpublished on 26.12.2007  [2007/52]
Applicant(s)For all designated states
Fahrenheit Thermoscope LLC
2215- B Renaissance Drive, Suite 5
Las Vegas, NV 89119 / US
[2007/04]
Former [1992/36]For all designated states
FRANCE TELECOM
Etablissement autonome de droit public, 6, Place d'Alleray
F-75015 Paris / FR
Inventor(s)01 / Nouailhat, Alain
26 Rue du Pré d'Elle
F-38240 Meylan / FR
02 / Bois, Daniel
140 Allée Chantoiseau
F-38330 Saint-Ismier / FR
[1992/36]
Representative(s)Harris, Ian Richard, et al
D Young & Co LLP
120 Holborn
London EC1N 2DY / GB
[N/P]
Former [2005/51]Harris, Ian Richard, et al
D Young & Co 120 Holborn
London EC1N 2DY / GB
Former [2005/35](deleted)
Former [1992/36]Thibault, Jean-Marc
Cabinet Beau de Loménie 51, Avenue Jean Jaurès B.P. 7073
F-69301 Lyon Cédex 07 / FR
Application number, filing date92420047.012.02.1992
[1992/36]
Priority number, dateFR1991000198413.02.1991         Original published format: FR 9101984
[1992/36]
Filing languageFR
Procedural languageFR
PublicationType: A2 Application without search report 
No.:EP0501896
Date:02.09.1992
Language:FR
[1992/36]
Type: A3 Search report 
No.:EP0501896
Date:12.05.1993
Language:FR
[1993/19]
Search report(s)(Supplementary) European search report - dispatched on:EP22.03.1993
ClassificationIPC:H01L29/08, H01L29/52, H01L29/73
[1993/19]
CPC:
H01L29/7322 (EP,US); H01L29/0821 (EP,US); H01L29/41708 (EP,US);
H01L29/7325 (EP,US)
Former IPC [1992/36]H01L29/08, H01L29/73, H01L27/06
Designated contracting statesAT,   CH,   DE,   ES,   FR,   GB,   IT,   LI,   NL [1992/36]
TitleGerman:Verbesserter Kollektor für einen Bipolartransistor kompatibel mit der MOS-Technologie[1992/36]
English:Improved collector for a bipolar transistor compatible with MOS technology[1992/36]
French:Perfectionnement au collecteur d'un transistor bipolaire compatible avec la technologie MOS[1992/36]
Examination procedure26.10.1993Examination requested  [1993/51]
02.04.1996Despatch of a communication from the examining division (Time limit: M06)
14.10.1996Reply to a communication from the examining division
15.07.1997Despatch of a communication from the examining division (Time limit: M06)
23.04.1998Reply to a communication from the examining division
03.02.2000Despatch of a communication from the examining division (Time limit: M06)
03.08.2000Reply to a communication from the examining division
21.05.2004Despatch of a communication from the examining division (Time limit: M06)
05.01.2005Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
14.03.2005Reply to a communication from the examining division
08.08.2007Despatch of communication that the application is refused, reason: substantive examination [2007/52]
18.08.2007Application refused, date of legal effect [2007/52]
Request for further processing for:14.03.2005Request for further processing filed
14.03.2005Full payment received (date of receipt of payment)
Request granted
30.03.2005Decision despatched
23.04.1998Request for further processing filed
23.04.1998Full payment received (date of receipt of payment)
Request granted
11.05.1998Decision despatched
Fees paidRenewal fee
18.02.1994Renewal fee patent year 03
21.02.1995Renewal fee patent year 04
20.02.1996Renewal fee patent year 05
19.02.1997Renewal fee patent year 06
19.02.1998Renewal fee patent year 07
19.02.1999Renewal fee patent year 08
24.02.2000Renewal fee patent year 09
23.02.2001Renewal fee patent year 10
27.02.2002Renewal fee patent year 11
25.02.2003Renewal fee patent year 12
24.02.2004Renewal fee patent year 13
01.08.2005Renewal fee patent year 14
24.02.2006Renewal fee patent year 15
05.02.2007Renewal fee patent year 16
Penalty fee
Additional fee for renewal fee
28.02.200514   M06   Fee paid on   01.08.2005
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Documents cited:Search[A]EP0201867  (NIPPON TELEGRAPH & TELEPHONE [JP]);
 [Y]EP0303435  (SONY CORP [JP]);
 [YD]FR2626406  (FRANCE ETAT [FR]);
 [Y]EP0337720  (SYNERGY SEMICONDUCTOR CORP [US])
 [A]  - IEEE TRANSACTIONS ON ELECTRON DEVICES. vol. 33, no. 3, Mars 1986, NEW YORK US pages 345 - 353 FANG-SHI J. LAI 'Design and Characteristics of a Lightly Doped Drain (LDD) Device Fabricated with Self-Aligned Titanium Silicide'
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.