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EP0558925
European procedure
Extract from the Register of European Patents
EP About this file: EP0558925
| EP0558925 - Method for controlling roughness on surface of monocrystal [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 28.05.1999 Database last updated on 09.04.2026 | Most recent event Tooltip | 28.05.1999 | No opposition filed within time limit | published on 14.07.1999 [1999/28] | Applicant(s) | For all designated states CANON KABUSHIKI KAISHA 30-2, 3-chome, Shimomaruko, Ohta-ku Tokyo / JP | [N/P] |
| Former [1993/36] | For all designated states CANON KABUSHIKI KAISHA 30-2, 3-chome, Shimomaruko, Ohta-ku Tokyo / JP | Inventor(s) | 01 /
Ichikawa, Takeshi, c/o Canon Kabushiki Kaisha 30-2, 3-chome, Shimomaruko Ohta-ku, Tokyo 146 / JP | [1993/36] | Representative(s) | Bühling, Gerhard Patentanwaltsbüro Tiedtke-Bühling-Kinne & Partner Bavariaring 4 80336 München / DE | [N/P] |
| Former [1993/36] | Bühling, Gerhard, Dipl.-Chem. Patentanwaltsbüro Tiedtke-Bühling-Kinne & Partner Bavariaring 4 D-80336 München / DE | Application number, filing date | 93101424.5 | 29.01.1993 | [1993/36] | Priority number, date | JP19920016525 | 31.01.1992 Original published format: JP 1652592 | JP19920041945 | 31.01.1992 Original published format: JP 4194592 | JP19920046163 | 31.01.1992 Original published format: JP 4616392 | [1993/36] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP0558925 | Date: | 08.09.1993 | Language: | EN | [1993/36] | Type: | B1 Patent specification | No.: | EP0558925 | Date: | 22.07.1998 | Language: | EN | [1998/30] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 18.06.1993 | Classification | IPC: | H01L21/203, C23C14/54, H01L21/76 | [1993/36] | CPC: |
H10P14/2905 (EP,US);
C23C14/54 (EP,US);
C30B29/06 (EP,US);
C30B33/00 (EP,US);
H10P14/22 (EP,US);
H10P14/2922 (EP,US);
H10P14/3411 (EP,US);
H10P14/3452 (EP,US);
H10P14/36 (EP,US);
| Designated contracting states | DE, FR, GB [1993/36] | Title | German: | Verfahren, um die Rauhigkeit von Einkristallen zu steuern | [1993/36] | English: | Method for controlling roughness on surface of monocrystal | [1993/36] | French: | Procédé pour contrôler la rugosité de la surface de monocristaux | [1993/36] | Examination procedure | 25.01.1994 | Examination requested [1994/13] | 08.03.1996 | Despatch of a communication from the examining division (Time limit: M04) | 18.07.1996 | Reply to a communication from the examining division | 24.01.1997 | Despatch of a communication from the examining division (Time limit: M06) | 28.07.1997 | Reply to a communication from the examining division | 30.09.1997 | Despatch of communication of intention to grant (Approval: Yes) | 29.01.1998 | Communication of intention to grant the patent | 30.04.1998 | Fee for grant paid | 30.04.1998 | Fee for publishing/printing paid | Opposition(s) | 23.04.1999 | No opposition filed within time limit [1999/28] | Fees paid | Renewal fee | 30.01.1995 | Renewal fee patent year 03 | 25.01.1996 | Renewal fee patent year 04 | 29.01.1997 | Renewal fee patent year 05 | 28.01.1998 | Renewal fee patent year 06 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X] JP3208887 | [X] NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH vol. B39, 1989, AMSTERDAM NL pages 72 - 80 J. Y. TSAO ET AL | [X] PATENT ABSTRACTS OF JAPAN vol. 015, no. 484 (C-0892)9 December 1991 & JP-A-32 08 887 ( MATSUSHITA ELECTRIC INDUSTRIAL CO. ) 12 September 1991 [X] | [X] JOURNAL OF ELECTRONIC MATERIALS vol. 12, no. 6, 1983, NEW YORK pages 973 - 982 H. TAKAI ET AL [X] | [YD] THIN SOLID FILMS vol. 106, no. 1/2, August 1983, LAUSANNE CH pages 3 - 136 Y. OTA [YD] | [Y] JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B. vol. 3, no. 2, March 1985, NEW YORK US pages 732 - 735 M. I. J. BEALE ET AL [Y] | [A] APPLIED PHYSICS LETTERS. vol. 48, no. 26, 30 June 1986, NEW YORK US pages 1793 - 1795 T. L. LIN ET AL [A] | Examination | Handbook of Sputter Deposition Technology, K. Wasa and S. Hayakawa, Noyes Publications, N.J. USA, 1992. |