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Extract from the Register of European Patents

EP About this file: EP0544648

EP0544648 - Method for forming a planarized Al thin film [Right-click to bookmark this link]
Former [1993/22]Method for forming a planarized D1 thin film
[1993/46]
StatusNo opposition filed within time limit
Status updated on  13.02.1998
Database last updated on 06.07.2024
Most recent event   Tooltip13.02.1998No opposition filed within time limitpublished on 01.04.1998 [1998/14]
Applicant(s)For all designated states
NIPPON TELEGRAPH AND TELEPHONE CORPORATION
19-2 Nishi-Shinjuku 3-chome Shinjuku-ku
Tokyo 163-19 / JP
[N/P]
Former [1996/20]For all designated states
NIPPON TELEGRAPH AND TELEPHONE CORPORATION
19-2 Nishi-Shinjuku 3-chome
Shinjuku-ku, Tokyo 163-19 / JP
Former [1993/22]For all designated states
Nippon Telegraph and Telephone Corporation
1-6 Uchisaiwai-cho 1-chome Chiyoda-ku
Tokyo 100 / JP
Inventor(s)01 / Kamoshida, Kazuyoshi
1182-1, Hase, Atsugi-shi
Kanagawa / JP
02 / Nakamura, Hiroaki
4-16-5 Matsugaoka, Kugenuma
Fujisawa-shi, Kanagawa / JP
03 / Amazawa, Takao
3004-1, Ochiai, Tama-shi
Tokyo / JP
[1993/32]
Former [1993/22]01 / Kamoshida, Kazuyoshi
3-402-861-1 Ishida
Isehara-shi, Kanagawa / JP
02 / Nakamura, Hiroaki
4-16-5 Matsugaoka, Kugenuma
Fujisawa-shi, Kanagawa / JP
03 / Amazawa, Takao
1-28-1-201 Morinosato
Atsugi-shi, Kanagawa / JP
Representative(s)Tiedtke, Harro
Patentanwaltsbüro
Tiedtke-Bühling-Kinne & Partner
Bavariaring 4
80336 München / DE
[N/P]
Former [1993/22]Tiedtke, Harro, Dipl.-Ing.
Patentanwaltsbüro Tiedtke-Bühling-Kinne & Partner Bavariaring 4
D-80336 München / DE
Application number, filing date93102886.412.05.1986
[1993/22]
Priority number, dateJP1985009950513.05.1985         Original published format: JP 9950585
JP1985020974120.09.1985         Original published format: JP 20974185
[1993/22]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0544648
Date:02.06.1993
Language:EN
[1993/22]
Type: A3 Search report 
No.:EP0544648
Date:16.02.1994
Language:EN
[1994/07]
Type: B1 Patent specification 
No.:EP0544648
Date:09.04.1997
Language:EN
[1997/15]
Search report(s)(Supplementary) European search report - dispatched on:EP30.12.1993
ClassificationIPC:H01L21/768
[1997/15]
CPC:
H01L21/2636 (EP,US); H01L21/32115 (EP,US); H01L21/34 (KR);
H01L21/7684 (EP,US)
Former IPC [1994/07]H01L21/31, H01L21/90
Former IPC [1993/22]H01L21/321, H01L21/90
Designated contracting statesDE,   FR,   GB,   NL [1993/22]
TitleGerman:Verfahren zur Planarisierung einer dünnen Al-Schicht[1993/46]
English:Method for forming a planarized Al thin film[1993/46]
French:Méthode pour planariser une couche mince en Al[1993/46]
Former [1993/22]Verfahren zur Planarisierung einer dünnen Dl-Schicht
Former [1993/22]Method for forming a planarized D1 thin film
Former [1993/22]Méthode pour planariser une couche mince en Dl
Examination procedure13.05.1994Examination requested  [1994/28]
31.08.1994Despatch of a communication from the examining division (Time limit: M04)
09.01.1995Reply to a communication from the examining division
24.01.1995Despatch of a communication from the examining division (Time limit: M04)
16.05.1995Reply to a communication from the examining division
18.06.1996Despatch of communication of intention to grant (Approval: Yes)
09.10.1996Communication of intention to grant the patent
10.01.1997Fee for grant paid
10.01.1997Fee for publishing/printing paid
Parent application(s)   TooltipEP86106432.7  / EP0202572
Opposition(s)10.01.1998No opposition filed within time limit [1998/14]
Fees paidRenewal fee
03.03.1993Renewal fee patent year 03
03.03.1993Renewal fee patent year 04
03.03.1993Renewal fee patent year 05
03.03.1993Renewal fee patent year 06
03.03.1993Renewal fee patent year 07
25.05.1993Renewal fee patent year 08
26.05.1994Renewal fee patent year 09
24.05.1995Renewal fee patent year 10
29.05.1996Renewal fee patent year 11
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Documents cited:Search[A]GB2080620  (HUGHES AIRCRAFT CO) [A] 1 * page 1, line 51 - line 69; figure 1; claims 3,6,7 *;
 [A]  - G HUGHES ET AL., "NEW SPUTTERING TECHNIQUES FOR SEMICONDUCTOR METALLIZATION", VACUUM, NEW YORK, (1984), vol. 34, no. 3 4, doi:doi:10.1016/0042-207X(84)90068-X, pages 365 - 369, XP025722175 [A] 1,2 * page 365, column L, paragraph 5 - page 367, column R, paragraph 3; figures 1-6,9,10 *

DOI:   http://dx.doi.org/10.1016/0042-207X(84)90068-X
Examination   - VSLI Electronics Microstructure Science, vol. 21, "beam processing technologies", ed. N.G. Einspruch, academic Press, 1989, pages 159 & 203
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.