blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability
Register Forum

2022.02.11

More...
blank News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...
blank Related links

Extract from the Register of European Patents

EP About this file: EP0578011

EP0578011 - Multi-electrode plasma processing apparatus [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  30.01.1998
Database last updated on 21.08.2024
Most recent event   Tooltip28.12.2002Lapse of the patent in a contracting statepublished on 12.02.2003  [2003/07]
Applicant(s)For all designated states
Texas Instruments Incorporated
13500 North Central Expressway
Dallas, Texas 75265 / US
[N/P]
Former [1994/02]For all designated states
TEXAS INSTRUMENTS INCORPORATED
13500 North Central Expressway
Dallas Texas 75265 / US
Inventor(s)01 / Moslehi, Mehrdad M.
15350-B Segouia Drive
Dallas, TXC 75248 / US
02 / Jones, John
7700 Jerome Drive
Plano, TX 70525 / US
03 / Davis, Cecil J.
Route 4, Box 113C
Greenville, TX 75401 / US
04 / Matthews, Robert t.
2417 Parkhaven Drive
Plano, Texas 75075 / US
[1994/02]
Representative(s)Schwepfinger, Karl-Heinz, et al
Prinz & Partner GbR Manzingerweg 7
81241 München / DE
[N/P]
Former [1994/02]Schwepfinger, Karl-Heinz, Dipl.-Ing., et al
Prinz & Partner, Manzingerweg 7
D-81241 München / DE
Application number, filing date93109535.015.06.1993
[1994/02]
Priority number, dateUS1992090363724.06.1992         Original published format: US 903637
[1994/02]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0578011
Date:12.01.1994
Language:EN
[1994/02]
Type: B1 Patent specification 
No.:EP0578011
Date:26.03.1997
Language:EN
[1997/13]
Search report(s)(Supplementary) European search report - dispatched on:EP26.10.1993
ClassificationIPC:H01J37/32
[1994/02]
CPC:
H01J37/32862 (EP,US); C23C16/4405 (EP,US); C23C16/509 (EP,US);
C23C16/517 (EP,US); H01J37/32165 (EP,US); H01J37/32192 (EP,US);
H01J37/32541 (EP,US); H01J37/32587 (EP,US); H01J37/32688 (EP,US);
Y10S438/905 (EP) (-)
Designated contracting statesDE,   FR,   GB,   IT,   NL [1994/02]
TitleGerman:Mehrelektrischen Plasma Behandlungsgerät[1994/02]
English:Multi-electrode plasma processing apparatus[1994/02]
French:Appareil le traitement par plasma multi-électrodes[1994/02]
Examination procedure10.06.1994Examination requested  [1994/32]
23.05.1995Despatch of a communication from the examining division (Time limit: M06)
01.12.1995Reply to a communication from the examining division
29.03.1996Despatch of communication of intention to grant (Approval: Yes)
27.08.1996Communication of intention to grant the patent
06.12.1996Fee for grant paid
06.12.1996Fee for publishing/printing paid
Opposition(s)30.12.1997No opposition filed within time limit [1998/12]
Fees paidRenewal fee
27.06.1995Renewal fee patent year 03
26.06.1996Renewal fee patent year 04
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipNL26.03.1997
[2003/07]
Documents cited:Search[Y]US4464223  (GORIN GEORGES J [US]);
 [Y]US4960488  (LAW KAM S [US], et al);
 [A]US5006192  (DEGUCHI MIKIO [JP]);
 [A]US5084125  (AOI NOBUO [JP])
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.