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Extract from the Register of European Patents

EP About this file: EP0595233

EP0595233 - Method for constructing semiconductor-on-insulator [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  22.05.1998
Database last updated on 31.08.2024
Most recent event   Tooltip22.05.1998Application deemed to be withdrawnpublished on 08.07.1998 [1998/28]
Applicant(s)For all designated states
Texas Instruments Incorporated
13500 North Central Expressway
Dallas, Texas 75265 / US
[N/P]
Former [1994/18]For all designated states
TEXAS INSTRUMENTS INCORPORATED
13500 North Central Expressway
Dallas Texas 75265 / US
Inventor(s)01 / Joyner, Keith A.
1631 University Drive
Richardson, TX 75081 / US
02 / El-Ghor, Mohamed K.
1221 Canoe Lane
Plano, TX 75023 / US
03 / Hosack, Harold H.
6911 Vista Willow Drive
Dallas, TX 75248 / US
[1994/18]
Representative(s)Schwepfinger, Karl-Heinz, et al
Prinz & Partner GbR Manzingerweg 7
81241 München / DE
[N/P]
Former [1994/18]Schwepfinger, Karl-Heinz, Dipl.-Ing., et al
Prinz & Partner, Manzingerweg 7
D-81241 München / DE
Application number, filing date93117259.725.10.1993
[1994/18]
Priority number, dateUS1992096623626.10.1992         Original published format: US 966236
[1994/18]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0595233
Date:04.05.1994
Language:EN
[1994/18]
Type: A3 Search report 
No.:EP0595233
Date:12.04.1995
Language:EN
[1995/15]
Search report(s)(Supplementary) European search report - dispatched on:EP22.02.1995
ClassificationIPC:H01L21/76, H01L21/265
[1994/18]
CPC:
H01L21/26533 (EP,US); H01L21/76243 (EP,US)
Designated contracting statesDE,   FR,   GB,   IT,   NL [1994/18]
TitleGerman:Verfahren zur Herstellung eines Halbleiters auf Isolator[1994/18]
English:Method for constructing semiconductor-on-insulator[1994/18]
French:Procédé de fabrication d'un semiconducteur sur isolant[1994/18]
Examination procedure09.10.1995Examination requested  [1995/49]
04.01.1996Despatch of a communication from the examining division (Time limit: M06)
12.07.1996Reply to a communication from the examining division
30.06.1997Despatch of a communication from the examining division (Time limit: M06)
12.01.1998Application deemed to be withdrawn, date of legal effect  [1998/28]
13.02.1998Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [1998/28]
Fees paidRenewal fee
12.10.1995Renewal fee patent year 03
28.10.1996Renewal fee patent year 04
23.10.1997Renewal fee patent year 05
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Documents cited:Search[XA]FR2581795  (GOLANSKI ANDRZEJ [FR]) [X] 1-4,6-8,10,12,14 * page 4, line 17 - page 5, line 22; figures 1-4; claims 1-10 * [A] 5,7,11,13;
 [AX]FR2616590  (COMMISSARIAT ENERGIE ATOMIQUE [FR]) [A] 1-3,10,11,14 * page 9, line 10 - page 10, line 33 * * figures 1-4; claims 1-7 * [X] 12,13;
 [A]  - J.K.Y. WONG ET AL., "STUDY OF SILICON-ON-INSULATOR STRUCTURES FORMED BY LOW DOSE OXYGEN AND NITROGEN IMPLANTATION.", MATERIALS SCIENCE AND ENGINEERING B, LAUSANNE CH, (19920120), vol. B12, no. 1/2, doi:doi:10.1016/0921-5107(92)90261-7, pages 67 - 71, XP000360325 [A] 1-3,8-11 * page 68, column L, paragraph 3 *

DOI:   http://dx.doi.org/10.1016/0921-5107(92)90261-7
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.