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EP0599779
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EP About this file: EP0599779
| EP0599779 - High-resolution negative photoresist having extended processing latitude [Right-click to bookmark this link] | Status | The application has been refused Status updated on 01.02.2002 Database last updated on 02.11.2024 | Most recent event Tooltip | 01.02.2002 | Refusal of application | published on 20.03.2002 [2002/12] | Applicant(s) | For all designated states Olin Microelectronic Materials AG c/o KPMG Fides Peat. Innere Margarethenstrasse 5 4002 Basel / CH | [1998/36] |
| Former [1994/22] | For all designated states OCG Microelectronic Materials AG Klybeckstrasse 141 CH-4002 Basel / CH | Inventor(s) | 01 /
Münzel, Norbert, Dr. Im Clausenfeld 3 D-79423 Heitersheim / DE | 02 /
Schulz, Reinhard, Dr. Am Pfarrgarten 5a D-79219 Staufen-Wettelbrunn / DE | 03 /
Holzwarth, Heinz St. Blasierweg 2 D-79189 Bad Krozingen / DE | [1994/22] | Representative(s) | Klunker . Schmitt-Nilson . Hirsch Patentanwälte Destouchesstrasse 68 80796 München / DE | [N/P] |
| Former [1998/10] | Klunker . Schmitt-Nilson . Hirsch Winzererstrasse 106 80797 München / DE | ||
| Former [1996/18] | (deleted) | ||
| Former [1994/22] | Roueche, Armand, et al c/o CIBA-GEIGY AG, Patentabteilung, Postfach CH-4002 Basel / CH | Application number, filing date | 93810737.2 | 20.10.1993 | [1994/22] | Priority number, date | CH19920003369 | 29.10.1992 Original published format: CH 336992 | [1994/22] | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | EP0599779 | Date: | 01.06.1994 | Language: | DE | [1994/22] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 07.04.1994 | Classification | IPC: | G03F7/004 | [1994/22] | CPC: |
G03F7/038 (EP,US);
G03F7/00 (KR);
G03F7/0045 (EP,US);
G03F7/0382 (EP,US);
Y10S430/106 (EP,US);
Y10S430/122 (EP,US)
| Designated contracting states | BE, CH, DE, FR, GB, IT, LI, NL [1994/22] | Title | German: | Hochauflösender negativ arbeitender Photoresist mit grossem Prozessspielraum | [1994/22] | English: | High-resolution negative photoresist having extended processing latitude | [1994/22] | French: | Photoréserve négative à haute résolution ayant une latitude de traitement étendue | [1994/22] | Examination procedure | 01.10.1994 | Examination requested [1994/48] | 23.12.1997 | Despatch of a communication from the examining division (Time limit: M04) | 14.08.1998 | Reply to a communication from the examining division | 22.03.1999 | Despatch of a communication from the examining division (Time limit: M04) | 19.07.1999 | Reply to a communication from the examining division | 27.12.1999 | Despatch of a communication from the examining division (Time limit: M09) | 29.09.2000 | Reply to a communication from the examining division | 23.04.2001 | Despatch of communication of intention to grant (Approval: ) | 12.10.2001 | Despatch of communication that the application is refused, reason: formalities examination [2002/12] | 22.10.2001 | Application refused, date of legal effect [2002/12] | Request for further processing for: | 14.08.1998 | Request for further processing filed | 14.08.1998 | Full payment received (date of receipt of payment) Request granted | 27.08.1998 | Decision despatched | Fees paid | Renewal fee | 02.09.1995 | Renewal fee patent year 03 | 20.11.1996 | Renewal fee patent year 04 | 07.10.1997 | Renewal fee patent year 05 | 22.10.1998 | Renewal fee patent year 06 | 04.10.1999 | Renewal fee patent year 07 | 04.10.2000 | Renewal fee patent year 08 | Penalty fee | Additional fee for renewal fee | 31.10.1996 | 04 M06 Fee paid on 20.11.1996 | 31.10.2001 | 09 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]EP0050802 (HOECHST AG [DE]); | [X]EP0295465 (HOECHST AG [DE]); | [A]EP0435437 (NIPPON ZEON CO [JP]); | JPH03158854 [ ] (TOKYO OHKA KOGYO CO LTD); | JPH03200254 [ ] (NIPPON ZEON CO); | JPH0412357 [ ] (TORAY INDUSTRIES); | JPH04251849 [ ] (FUJI PHOTO FILM CO LTD); | JPH04274242 [ ] (JAPAN SYNTHETIC RUBBER CO LTD); | JPH04301851 [ ] (NIPPON ZEON CO); | [PX]EP0530148 (CIBA GEIGY AG [CH], et al) | Examination | EP0542572 |