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EP0654813

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EP About this file: EP0654813

EP0654813 - Electron beam drawing apparatus and method of drawing with such an apparatus [Right-click to bookmark this link]
Former [1995/21]	Electron beam drawing apparatus and method of drawing with such apparatus
	[1998/20]
Status	No opposition filed within time limit Status updated on 14.01.2000 Database last updated on 11.09.2024
Most recent event Tooltip	17.02.2006	Change - lapse in a contracting state Updated state(s): FR	published on 05.04.2006 [2006/14]
Applicant(s)	For all designated states MITSUBISHI DENKI KABUSHIKI KAISHA 2-3, Marunouchi 2-chome Chiyoda-ku Tokyo 100 / JP
	[N/P]
Former [1995/21]	For all designated states MITSUBISHI DENKI KABUSHIKI KAISHA 2-3, Marunouchi 2-chome Chiyoda-ku Tokyo 100 / JP
Inventor(s)	01 / Moriizumi, Koichi, c/o Mitsubishi Denki K.K. Ultra LSI Kaihatsu, Kenkyusho, 1 Mizuhara 4-chome Itami-shi, Hyogo 664 / JP
	02 / Kamiyama, Kinya, c/o Mitsubishi Denki K.K. Ultra LSI Kaihatsu, Kenkyusho, 1 Mizuhara 4-chome Itami-shi, Hyogo 664 / JP
	03 / Taoka, Hironobu, c/o Mitsubishi Denki K.K. Ultra LSI Kaihatsu, Kenkyusho, 1 Mizuhara 4-chome Itami-shi, Hyogo 664 / JP
	[1995/21]
Representative(s)	Prüfer, Lutz H., et al Harthauser Strasse 25d 81545 München / DE
	[N/P]
Former [1995/21]	Prüfer, Lutz H., Dipl.-Phys., et al Harthauser Strasse 25d D-81545 München / DE
Application number, filing date	94114545.0	15.09.1994
	[1995/21]
Priority number, date	JP19930270992	28.10.1993 Original published format: JP 27099293
	[1995/21]
Filing language	EN
Procedural language	EN
Publication	Type:	A1 Application with search report
	No.:	EP0654813
	Date:	24.05.1995
	Language:	EN
	[1995/21]
	Type:	B1 Patent specification
	No.:	EP0654813
	Date:	10.03.1999
	Language:	EN
	[1999/10]
Search report(s)	(Supplementary) European search report - dispatched on:	EP	06.04.1995
Classification	IPC:	H01J37/20, H01J37/317	[1995/21]
	CPC:	B82Y10/00 (EP); B82Y40/00 (EP); H01J37/20 (EP); H01J37/3174 (EP); H01L21/027 (KR); H01J2237/20214 (EP)
Designated contracting states	DE, FR, GB [1995/21]
Title	German:	Gerät zur Musteraufzeichnung mittels Elektronenstrahl und Mustersaufzeichnungsverfahren unter Verwendung eines solchen Geräts	[1995/21]
	English:	Electron beam drawing apparatus and method of drawing with such an apparatus	[1998/20]
	French:	Appareil de traçage de motifs par faisceau d'électrons et méthode de traçage de motifs utilisant un tel appareil	[1998/20]
	Former [1995/21]	Electron beam drawing apparatus and method of drawing with such apparatus
	Former [1995/21]	Appareil de traçage de motifs par faisceau d'électrons et méthode de traçage de motifs utilisant un tèl appareil
Examination procedure	12.05.1995	Examination requested [1995/28]
	18.03.1996	Despatch of a communication from the examining division (Time limit: M04)
	28.06.1996	Reply to a communication from the examining division
	30.04.1998	Despatch of communication of intention to grant (Approval: Yes)
	20.08.1998	Fee for grant paid
	20.08.1998	Fee for publishing/printing paid
	28.08.1998	Communication of intention to grant the patent
Opposition(s)	11.12.1999	No opposition filed within time limit [2000/09]
Fees paid	Renewal fee
	26.09.1996	Renewal fee patent year 03
	30.09.1997	Renewal fee patent year 04
	29.09.1998	Renewal fee patent year 05
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition Tooltip	FR	10.03.1999
	[2006/14]
Former [2000/24]	FR	06.08.1999
Documents cited:	Search	[XY]JPS6167914 ;
		[Y]US4516029 (TUCKER THEODORE W [US]) [Y] 2,3,5 * column 1, line 50 - column 2, line 17 * * figure 8 *;
		[YA]US5175435 (SAKAMOTO KIICHI [JP], et al) [Y] 5 * column 4, line 19 - line 58 * * column 6, line 24 - line 39 * * figures 1,3 * [A] 1,8;
		[A]JPS63209127 ;
		[A]JPS6167912 ;
		[A]US4627009 (HOLMES DUANE C [US], et al) [A] 1-4 * column 1, line 58 - column 2, line 12 * * column 2, line 49 - column 3, line 51 * * column 4, line 26 - line 42 * * column 5, line 31 - line 41 * * figure 1 *;
		[A]EP0422655 (HITACHI LTD [JP]) [A] 1-3 * column 4, line 33 - column 5, line 25 * * column 8, line 31 - line 39 * * figures 3A,5 *
		[XY] - PATENT ABSTRACTS OF JAPAN, (19860815), vol. 10, no. 236, Database accession no. (E - 428), & JP61067914 A 19860408 (SONY) [X] 1,6 * abstract * [Y] 2,3,5
		[A] - PATENT ABSTRACTS OF JAPAN, (19881224), vol. 12, no. 498, Database accession no. (E - 698), & JP63209127 A 19880830 (NEC CO.) [A] 4 * abstract *
		[A] - PATENT ABSTRACTS OF JAPAN, (19860815), vol. 10, no. 236, Database accession no. (E - 428), & JP61067912 A 19860408 (SONY) [A] 5 * abstract *
	Examination	- Y. SAKITANI ET AL., "Electron-beam cell-projection lithography system", J. VAC. SCI. TECHNOL., vol. B10, no. 6, doi:doi:10.1116/1.585997, pages 2759 - 2763, XP000332480 DOI: http://dx.doi.org/10.1116/1.585997
		- "Microwave Engineering", A.N. BROERS AND T.H.P. CHANG, HIGH RESOLUTION LITHOGRAPHY, Fig. 18, Cambridge University Press, 1979, edited by H. Armed and T.H.P. Chang.
		- R. YOSHIKAWA ET AL., "A high dose and high accuracy variable shaped electron beam exposure system for quartermicron device fabrication", J. VAC. SCI. TECHNOL., vol. B5, no. 1, pages 70 - 74

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