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EP0674334
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EP About this file: EP0674334
| EP0674334 - Plasma processing method and apparatus [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 15.11.1996 Database last updated on 12.07.2024 | Most recent event Tooltip | 11.07.2008 | Change - representative | published on 13.08.2008 [2008/33] | Applicant(s) | For all designated states Hitachi, Ltd. 6, Kanda Surugadai 4-chome Chiyoda-ku Tokyo 101 / JP | [N/P] |
| Former [1995/39] | For all designated states HITACHI, LTD. 6, Kanda Surugadai 4-chome Chiyoda-ku, Tokyo 101 / JP | Inventor(s) | 01 /
Watanabe, Seiichi 428-1, Higashitoyoi, Kudamatsu-Shi Yamaguchi-Ken / JP | 02 /
Furuse, Muneo 3-2, 2-chome, Toyo, Kudamatsu-Shi Yamaguchi-Ken / JP | 03 /
Shirayone, Shigeru 2-7-8, Itsutsubashi, Aoba-ku, Sendai-Shi Miyagi-Ken / JP | 04 /
Kaji, Tetsunori 324-73, Hibarigaoka, kume, Tokuyama-Shi Yamaguchi-Ken / JP | [1995/39] | Representative(s) | Altenburg, Udo, et al Bardehle Pagenberg Partnerschaft mbB Patentanwälte, Rechtsanwälte Prinzregentenplatz 7 81675 München / DE | [N/P] |
| Former [2008/33] | Altenburg, Udo, et al Patent- und Rechtsanwälte Bardehle . Pagenberg . Dost . Altenburg . Geissler Galileiplatz 1 81679 München / DE | ||
| Former [1995/39] | Altenburg, Udo, Dipl.-Phys., et al Patent- und Rechtsanwälte Bardehle . Pagenberg . Dost . Altenburg . Frohwitter . Geissler & Partner, Postfach 86 06 20 D-81633 München / DE | Application number, filing date | 95103754.8 | 15.03.1995 | [1995/39] | Priority number, date | JP19940048287 | 18.03.1994 Original published format: JP 4828794 | [1995/39] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP0674334 | Date: | 27.09.1995 | Language: | EN | [1995/39] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 03.08.1995 | Classification | IPC: | H01J37/32 | [1995/39] | CPC: |
H01J37/32192 (EP);
H01J37/3222 (EP);
H01J37/32293 (EP);
H01J37/32678 (EP);
H01L21/3065 (KR)
| Designated contracting states | DE, GB, IT [1995/39] | Title | German: | Verfahren und Gerät zur Plasmabearbeitung | [1995/39] | English: | Plasma processing method and apparatus | [1995/39] | French: | Méthode et appareil de traitement par plasma | [1995/39] | File destroyed: | 20.04.2002 | Examination procedure | 31.01.1996 | Examination requested [1996/13] | 23.07.1996 | Despatch of a communication from the examining division (Time limit: M04) | 05.11.1996 | Application withdrawn by applicant [1997/01] |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]EP0578580 (VALEO VISION [FR]) [X] 1,19,27-29 * column 3, line 13 - column 4, line 26; figure - *; | [DA]US5134965 (TOKUDA MITSUO [JP], et al) [DA] 1,10,19,27-29 * column 9, line 1 - line 14 * * column 13, line 17 - column 14, line 45; figures 2B,7,13-16 *; | [E]EP0653775 (HITACHI LTD [JP]) [E] 1,27,28 * column 11, line 55 - column 12, line 25; figures 2,3 * |