EP0678571 - pH Adjusted nonionic surfactant containing alkaline cleaner composition for cleaning microelectronics substrates [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 30.11.2001 Database last updated on 02.11.2024 | Most recent event Tooltip | 25.07.2008 | Change - representative | published on 27.08.2008 [2008/35] | Applicant(s) | For all designated states Mallinckrodt Baker, Inc. 222 Red School Lane Phillipsburg, New Jersey 08865 / US | [N/P] |
Former [1995/50] | For all designated states MALLINCKRODT BAKER, Inc. 222 Red School Lane Phillipsburg, New Jersey 08865 / US | ||
Former [1995/43] | For all designated states J.T. BAKER INC. 222 Red School Lane Phillipsburg New Jersey 08865 / US | Inventor(s) | 01 /
Ilardi, Joseph M. 111 Skyline Drive Sparta, NJ 07871 / US | 02 /
Schwartzkopf, George Bickel Road Franklin Township, NJ 07882 / US | 03 /
Dailey, Gary G. 804 Hunter Road Easton, PA 18042 / US | [1995/43] | Representative(s) | Vossius & Partner Patentanwälte Rechtsanwälte mbB Siebertstrasse 3 81675 München / DE | [N/P] |
Former [2008/35] | Vossius & Partner Siebertstrasse 3 81675 München / DE | ||
Former [1995/43] | VOSSIUS & PARTNER Siebertstrasse 4 D-81675 München / DE | Application number, filing date | 95105743.9 | 18.04.1995 | [1995/43] | Priority number, date | US19940230132 | 20.04.1994 Original published format: US 230132 | [1995/43] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0678571 | Date: | 25.10.1995 | Language: | EN | [1995/43] | Type: | A3 Search report | No.: | EP0678571 | Date: | 15.01.1997 | [1997/03] | Type: | B1 Patent specification | No.: | EP0678571 | Date: | 24.01.2001 | Language: | EN | [2001/04] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 02.12.1996 | Classification | IPC: | C11D3/30, C11D3/20, C11D1/74, C11D1/72, C11D1/66 | [1995/43] | CPC: |
C11D3/30 (EP,US);
C11D7/06 (KR);
C11D1/66 (EP,US);
C11D3/0047 (EP,US);
C11D3/042 (EP,US);
C11D3/044 (EP,US);
| Designated contracting states | AT, BE, CH, DE, ES, FR, GB, IE, IT, LI, LU, NL, SE [1995/43] | Title | German: | PH-regulierter alkalischer Reiniger mit nicht ionischem Tensid zur Reinigung mikroelektronischer Substrate | [1995/43] | English: | pH Adjusted nonionic surfactant containing alkaline cleaner composition for cleaning microelectronics substrates | [1995/43] | French: | Composition de nettoyage ayant un pH determiné contenant un agent tensioactif nonionique pour nettoyer les substrats microélectronics | [1995/43] | Examination procedure | 21.02.1997 | Examination requested [1997/17] | 10.12.1997 | Despatch of a communication from the examining division (Time limit: M06) | 18.06.1998 | Reply to a communication from the examining division | 22.10.1998 | Despatch of a communication from the examining division (Time limit: M04) | 24.11.1998 | Reply to a communication from the examining division | 12.10.1999 | Despatch of communication of intention to grant (Approval: No) | 09.05.2000 | Despatch of communication of intention to grant (Approval: later approval) | 26.07.2000 | Communication of intention to grant the patent | 02.11.2000 | Fee for grant paid | 02.11.2000 | Fee for publishing/printing paid | Opposition(s) | 25.10.2001 | No opposition filed within time limit [2002/03] | Request for further processing for: | 09.05.2000 | Request for further processing filed | 09.05.2000 | Full payment received (date of receipt of payment) Request granted | 08.06.2000 | Decision despatched | Fees paid | Renewal fee | 07.04.1997 | Renewal fee patent year 03 | 29.04.1998 | Renewal fee patent year 04 | 30.04.1999 | Renewal fee patent year 05 | 28.04.2000 | Renewal fee patent year 06 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | AT | 24.01.2001 | SE | 24.01.2001 | LU | 18.04.2001 | [2004/39] |
Former [2002/23] | AT | 24.01.2001 | |
SE | 24.01.2001 | ||
Former [2002/10] | AT | 24.01.2001 | Documents cited: | Search | [A]US3886099 (HALL ROBERT M) [A] 1-16 * whole document *; | [A]GB1573208 (TOKYO SHIBAURA ELECTRIC LTD) [A] 3,4,8,9,15,16 * whole document *; | [AD]US4239661 (ASANO MASAFUMI [JP], et al) [AD] 3,4,8-11,15,16 * column 6, line 38 - column 10, line 45; claims 1-32 *; | [AD]US4339340 (MURAOKA HISASHI, et al) [AD] 3,4,8-11,15,16 * column 6, line 38 - column 10, line 48; claims 1-34 *; | [X]US4612058 (GEKE JUERGEN [DE], et al) [X] 1,2,5,6 * column 2, line 6 - column 3, line 28; examples 6-9; claims 1-7 *; | [A]US4833067 (TANAKA HATSUYUKI [JP], et al) [A] 6,7,15,16* column 3, line 51 - column 4, line 59; claim 1 *; | [A]WO9314884 (SACHEM INC [US]) [A] 3,4,8,9,15,16 * page 5, line 12 - page 12, line 10; claims 1-19 *; | [A]EP0578507 (EKC TECHNOLOGY INC [US]) [A] 5,8,9,15,16 * page 6, line 29 - page 8, line 14; claims 1-19 * |