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Extract from the Register of European Patents

EP About this file: EP0671630

EP0671630 - Jig for measuring the characteristics of a semiconductor, manufacturing method therefor and use thereof [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  18.07.2003
Database last updated on 02.11.2024
Most recent event   Tooltip18.07.2003Application deemed to be withdrawnpublished on 03.09.2003  [2003/36]
Applicant(s)For all designated states
Hitachi Chemical Co., Ltd.
2-1-1, Nishishinjuku
Shinjuku-ku
Tokyo / JP
For all designated states
YAMADA DEN-ON CO., LTD.
2-12-20, Nagara-nishi, Kita-ku
Osaka 531 / JP
[N/P]
Former [1995/37]For all designated states
HITACHI CHEMICAL CO., LTD.
2-1-1, Nishishinjuku
Shinjuku-ku, Tokyo / JP
For all designated states
YAMADA DEN-ON CO., LTD.
2-12-20, Nagara-nishi, Kita-ku
Osaka 531 / JP
Inventor(s)01 / Yokoya, Yasuhiko
1278-387, Tamado
Shimodate-shi / JP
02 / Yamazaki, Noboru
6-1, Hyakurakuso-3-chome
Minoo-shi / JP
03 / Nakamura, Mitsuo
3-30-803, Yuhigaokacho, Tennoji-ku
Osaka-shi / JP
04 / Hasuda, Syuuichi
164, Ozakata
Shimodate-shi / JP
05 / Namai, Eisaku
91, Noda
Shimodate-shi / JP
06 / Yamada, Syuuzou
2-12-20, Nagara-Nishi, Kita-ku
Osaka-shi / JP
[1995/37]
Representative(s)Senior, Alan Murray, et al
J A Kemp
14 South Square
Gray's Inn
London WC1R 5JJ / GB
[N/P]
Former [1995/37]Senior, Alan Murray, et al
J.A. KEMP & CO., 14 South Square, Gray's Inn
London WC1R 5LX / GB
Application number, filing date95301426.306.03.1995
[1995/37]
Priority number, dateJP1994003570807.03.1994         Original published format: JP 3570894
[1995/37]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0671630
Date:13.09.1995
Language:EN
[1995/37]
Search report(s)(Supplementary) European search report - dispatched on:EP03.07.1995
ClassificationIPC:G01R1/073
[1995/37]
CPC:
G01R1/07378 (EP,US); G01R31/2886 (EP,US)
Designated contracting statesDE,   FR,   GB [1995/37]
TitleGerman:Haltevorrichtung zur Messung der Eigenschaften eines Halbleiters, Herstellungsverfahren und Verwendung derselben[1995/37]
English:Jig for measuring the characteristics of a semiconductor, manufacturing method therefor and use thereof[1995/37]
French:Guide-gabarit pour la mesure des propriétés d'un semi-conducteur, sa méthode de production et son utilisation[1995/37]
Examination procedure26.01.1996Examination requested  [1996/13]
17.10.2002Despatch of a communication from the examining division (Time limit: M04)
28.02.2003Application deemed to be withdrawn, date of legal effect  [2003/36]
04.04.2003Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2003/36]
Fees paidRenewal fee
12.03.1997Renewal fee patent year 03
10.03.1998Renewal fee patent year 04
11.03.1999Renewal fee patent year 05
13.03.2000Renewal fee patent year 06
16.03.2001Renewal fee patent year 07
13.03.2002Renewal fee patent year 08
Penalty fee
Additional fee for renewal fee
31.03.200309   M06   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[Y]JPH04118985  ;
 [A]JPH05232141  ;
 [A]JPH01284778  ;
 [A]JPH01209379  ;
 [A]EP0142119  (MANIA GMBH [DE], et al) [A] 1,4,11,16 * figures 1-3; claims 1,2 *;
 [A]EP0180013  (IBM [US]) [A] 1,10,11,16 * column 5, line 35 - column 6, line 1; figure -; claims 4,5 *;
 [A]EP0227002  (KOLLMORGEN TECH CORP [US]) [A] 12;
 [Y]FR2621131  (THOMSON CSF [FR]) [Y] 1,11,12,16 * page 2, line 34 - page 3, line 30; figure - *;
 [A]EP0462706  (ITT [US]) [A] 1,2,11,16 * column 1, line 35 - column 2, line 2; figure 2 *;
 [Y]EP0468767  (HITACHI CHEMICAL CO LTD [JP]) [Y] 1,11,16 * page 4, line 24 - line 33; figure 7 *
 [Y]  - PATENT ABSTRACTS OF JAPAN, (19920811), vol. 16, no. 372, Database accession no. (E - 1246), & JP04118985 A 19920420 (HITACHI CHEM CO LTD) [Y] 12 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19931215), vol. 17, no. 684, Database accession no. (P - 1661), & JP05232141 A 19930907 (HITACHI CHEM CO LTD) [A] 1,11,16 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19900205), vol. 14, no. 61, Database accession no. (P - 1001), & JP01284778 A 19891116 (MITSUBISHI ELECTRIC CORP) [A] 1,11,16 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19891120), vol. 13, no. 517, Database accession no. (P - 962), & JP01209379 A 19890823 (HITACHI LTD) [A] 10 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.