blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability

2022.02.11

More...
blank News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...
blank Related links

Extract from the Register of European Patents

EP About this file: EP0757117

EP0757117 - Method and apparatus for deposition of material on a semiconductor wafer [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  12.05.2000
Database last updated on 17.09.2024
Most recent event   Tooltip12.05.2000No opposition filed within time limitpublished on 28.06.2000 [2000/26]
Applicant(s)For all designated states
MEMC Electronic Materials, Inc.
501 Pearl Drive, P.O. Box 8 St. Peters
Missouri 63376 / US
[N/P]
Former [1997/06]For all designated states
MEMC Electronic Materials, Inc.
501 Pearl Drive P.O. Box 8
St. Peters, Missouri 63376 / US
Inventor(s)01 / Glaenzer, Richard H.
501 Pearl Drive, P.O. Box 8
St. Peters, Missouri 63376 / US
[1997/06]
Representative(s)Eyles, Christopher Thomas
W.P. Thompson & Co.
55 Drury Lane
London WC2B 5SQ / GB
[N/P]
Former [1997/06]Eyles, Christopher Thomas
W.P. THOMPSON & CO. Celcon House 289-293 High Holborn
London WC1V 7HU / GB
Application number, filing date95305392.301.08.1995
[1997/06]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0757117
Date:05.02.1997
Language:EN
[1997/06]
Type: B1 Patent specification 
No.:EP0757117
Date:07.07.1999
Language:EN
[1999/27]
Search report(s)(Supplementary) European search report - dispatched on:EP08.01.1996
ClassificationIPC:C23C16/44, C30B25/14
[1997/06]
CPC:
C30B25/14 (EP); C23C16/455 (EP)
Designated contracting statesDE,   FR,   GB,   IT [1997/06]
TitleGerman:Verfahren und Vorrichtung zur Materialabscheidung auf einer Halbleiterscheibe[1997/06]
English:Method and apparatus for deposition of material on a semiconductor wafer[1997/06]
French:Procédé et dispositif pour le dépôt de matière sur une plaquette semi-conductrice[1997/06]
Examination procedure14.08.1996Examination requested  [1997/06]
22.01.1998Despatch of communication of intention to grant (Approval: No)
29.05.1998Despatch of communication of intention to grant (Approval: later approval)
16.12.1998Communication of intention to grant the patent
16.01.1999Fee for grant paid
16.01.1999Fee for publishing/printing paid
Opposition(s)08.04.2000No opposition filed within time limit [2000/26]
Fees paidRenewal fee
08.08.1997Renewal fee patent year 03
26.08.1998Renewal fee patent year 04
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[XA]US4928626  (CARLSON DAVID K [US], et al) [X] 7 * column 3, line 15 - column 4, line 36 * [A] 1-6,8-10;
 [A]EP0305195  (TEXAS INSTRUMENTS INC [US]) [A] 1-10 * claims 1-4 *;
 [A]DE1913676  (SIEMENS AG) [A] 1-10 * claim 1 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.