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Extract from the Register of European Patents

EP About this file: EP0740794

EP0740794 - PROCESS FOR PRODUCING AN ACCELERATION SENSOR [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  28.01.2000
Database last updated on 24.08.2024
Most recent event   Tooltip28.01.2000No opposition filed within time limitpublished on 15.03.2000 [2000/11]
Applicant(s)For all designated states
SIEMENS AKTIENGESELLSCHAFT
Werner-von-Siemens-Str. 1
DE-80333 München / DE
[N/P]
Former [1996/45]For all designated states
SIEMENS AKTIENGESELLSCHAFT
Wittelsbacherplatz 2
80333 München / DE
Inventor(s)01 / KLOSE, Helmut
Stefan-George-Ring 9
D-81929 München / DE
02 / BIEBL, Markus
Oberländerstrasse 24c
D-86163 Augsburg / DE
03 / SCHEITER, Thomas
Ehrengutstrasse 15
D-80469 München / DE
04 / HIEROLD, Christopher
Dornröschenstrasse 48
D-81739 München / DE
[1996/45]
Application number, filing date95905530.210.01.1995
[1996/45]
WO1995DE00022
Priority number, dateDE1994440130418.01.1994         Original published format: DE 4401304
[1996/45]
Filing languageDE
Procedural languageDE
PublicationType: A1 Application with search report
No.:WO9519572
Date:20.07.1995
Language:DE
[1995/31]
Type: A1 Application with search report 
No.:EP0740794
Date:06.11.1996
Language:DE
The application published by WIPO in one of the EPO official languages on 20.07.1995 takes the place of the publication of the European patent application.
[1996/45]
Type: B1 Patent specification 
No.:EP0740794
Date:24.03.1999
Language:DE
[1999/12]
Search report(s)International search report - published on:EP20.07.1995
ClassificationIPC:G01P15/08
[1996/45]
CPC:
G01P15/0802 (EP,US); H01L21/265 (US); G01P15/125 (EP,US);
G01P2015/0828 (EP,US); Y10S148/159 (EP,US)
Designated contracting statesAT,   DE,   FR,   GB,   IT,   NL [1996/45]
TitleGerman:VERFAHREN ZUR HERSTELLUNG EINES BESCHLEUNIGUNGSSENSORS[1996/45]
English:PROCESS FOR PRODUCING AN ACCELERATION SENSOR[1996/45]
French:PROCEDE POUR LA FABRICATION D'UN DETECTEUR D'ACCELERATION[1996/45]
Entry into regional phase06.07.1996National basic fee paid 
06.07.1996Designation fee(s) paid 
06.07.1996Examination fee paid 
Examination procedure22.05.1995Request for preliminary examination filed
International Preliminary Examining Authority: EP
06.07.1996Examination requested  [1996/45]
11.09.1998Despatch of communication of intention to grant (Approval: Yes)
25.09.1998Communication of intention to grant the patent
17.12.1998Fee for grant paid
17.12.1998Fee for publishing/printing paid
Opposition(s)28.12.1999No opposition filed within time limit [2000/11]
Fees paidRenewal fee
21.01.1997Renewal fee patent year 03
21.01.1998Renewal fee patent year 04
20.01.1999Renewal fee patent year 05
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Cited inInternational search[A]US4918032  (JAIN KAILASH C [US], et al) [A] 1,2,4,7 * column 4, line 29 - line 36 * * column 5, line 7 - line 20 * * column 5, line 33 - line 37; figures 1-7 *;
 [A]US5241864  (ADDIE DAVID L [US], et al) [A] 7* column 3, line 40 - line 47; figure 7 *;
 [A]  - RISTIC ET AL, "PROPERTIES OF POLYSILICON FILMS ANNEALED BY A RAPID THERMAL ANNEALING PROCESS.", THIN SOLID FILMS, LAUSANNE, vol. 220, no. 1/2, pages 106 - 110, XP000354480 [A] 1,3,4,6 * page 106, column 2, line 8 - line 31; figure 1 *

DOI:   http://dx.doi.org/10.1016/0040-6090(92)90556-Q
 [A]  - PETERSEN ET AL, "MICROMECHANICAL ACCELEROMETER INTEGRATED WITH MOS DETECTION CIRCUITRY.", IEEE TRANSACTIONS ON ELECTRON DEVICES, NEW YORK, (19920101), vol. ED-29, no. 1, pages 23 - 27 [A] 1,4,6,8 * page 23, column 2, line 24 - line 46; figure 1 *
 [A]  - POLLA ET AL, "INTEGRATED GAAS MICROSENSORS; 90 CH2868-8", 1990 IEEE INTERNATIONAL SYMPOSIUM ON CIRCUITS AND SYSTEMS, SHERATON HOTEL NEW ORLEANS, (19900501), vol. 4, pages 3085 - 3088, XP000163491 [A] 1,7 * page 3085, column 1, line 20 - line 35; figure 1 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.