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Extract from the Register of European Patents

EP About this file: EP0770201

EP0770201 - PROCESS FOR MEASURING THE DEPTH OF A MICROSTRUCTURE [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  03.12.1999
Database last updated on 19.10.2024
Most recent event   Tooltip06.08.2004Lapse of the patent in a contracting state
New state(s): LU		published on 22.09.2004  [2004/39]
Applicant(s)For all designated states
Leonhard Kurz GmbH & Co.
Schwabacher Strasse 482
90763 Fürth / DE
[N/P]
Former [1997/18]For all designated states
LEONHARD KURZ GMBH & CO.
Schwabacher Strasse 482
90763 Fürth / DE
Inventor(s)01 / WILD, Heinrich
Geranienweg 8
D-90768 Fürth / DE
[1997/18]
Representative(s)Louis Pöhlau Lohrentz
Patentanwälte
Postfach 30 55
90014 Nürnberg / DE
[N/P]
Former [1997/18]LOUIS, PÖHLAU, LOHRENTZ & SEGETH
Postfach 3055
90014 Nürnberg / DE
Application number, filing date95921698.710.06.1995
[1997/18]
WO1995DE00783
Priority number, dateDE1994442456513.07.1994         Original published format: DE 4424565
[1997/18]
Filing languageDE
Procedural languageDE
PublicationType: A1 Application with search report
No.:WO9602807
Date:01.02.1996
Language:DE
[1996/06]
Type: A1 Application with search report 
No.:EP0770201
Date:02.05.1997
Language:DE
The application published by WIPO in one of the EPO official languages on 01.02.1996 takes the place of the publication of the European patent application.
[1997/18]
Type: B1 Patent specification 
No.:EP0770201
Date:03.02.1999
Language:DE
[1999/05]
Search report(s)International search report - published on:EP01.02.1996
ClassificationIPC:G01B11/22
[1997/18]
CPC:
G01B11/22 (EP)
Designated contracting statesAT,   BE,   CH,   DE,   DK,   ES,   FR,   GB,   IT,   LI,   LU,   NL,   PT,   SE [1997/18]
TitleGerman:VERFAHREN ZUR MESSUNG DER TIEFE EINER MIKROSTRUKTUR[1997/18]
English:PROCESS FOR MEASURING THE DEPTH OF A MICROSTRUCTURE[1997/18]
French:PROCEDE PERMETTANT DE MESURER LA PROFONDEUR D'UNE MICROSTRUCTURE[1997/18]
Entry into regional phase21.01.1997National basic fee paid 
21.01.1997Designation fee(s) paid 
21.01.1997Examination fee paid 
Examination procedure27.10.1995Request for preliminary examination filed
International Preliminary Examining Authority: EP
21.01.1997Examination requested  [1997/18]
19.02.1997Amendment by applicant (claims and/or description)
07.05.1998Despatch of communication of intention to grant (Approval: Yes)
06.08.1998Communication of intention to grant the patent
15.10.1998Fee for grant paid
15.10.1998Fee for publishing/printing paid
Opposition(s)04.11.1999No opposition filed within time limit [2000/03]
Fees paidRenewal fee
11.06.1997Renewal fee patent year 03
08.06.1998Renewal fee patent year 04
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipDK03.05.1999
PT03.05.1999
LU10.06.1999
[2004/39]
Former [2003/45]DK03.05.1999
PT03.05.1999
Former [2000/23]PT03.05.1999
Cited inInternational search[A]US4988198  (KONDO NORIYUKI [JP]) [A] 1-5 * column 6, line 68 - column 8, line 4 *;
 [YA]US5023188  (TANAKA HIROSHI [JP]) [Y] 1,2,7 * column 2, line 10 - line 17 * * column 4, line 31 - column 6, line 35 * [A] 4;
 [Y]EP0468897  (FRANCE TELECOM [FR]) [Y] 1,2,7 * the whole document *;
 [A]EP0585839  (TEXAS INSTRUMENTS INC [US]) [A] 1,7* page 3, line 28 - line 57 *
 [A]  - L.V. BELYAKOV E.A., "CONTROL OF THE PHOTOCHEMICAL ETCHING OP A SEMICONDUCTOR IN HOLOGRAM RECORDING", SOV.PHYS.-TECH.PHYS., USA, vol. 24, no. 4, pages 511 - 512 [A] 1 * the whole document *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.