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Extract from the Register of European Patents

EP About this file: EP0735578

EP0735578 - Ablation patterning of multi-layered structures [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  27.05.2005
Database last updated on 12.11.2024
Most recent event   Tooltip20.06.2008Change - representativepublished on 23.07.2008  [2008/30]
Applicant(s)For all designated states
Infineon Technologies AG
St.-Martin-Strasse 53
81669 München / DE
For all designated states
International Business Machines Corporation
Armonk, NY 10504 / US
[N/P]
Former [2004/10]For all designated states
Infineon Technologies AG
St.-Martin-Strasse 53
81669 München / DE
For all designated states
INTERNATIONAL BUSINESS MACHINES CORPORATION
Armonk, NY 10504 / US
Former [1996/40]For all designated states
SIEMENS AKTIENGESELLSCHAFT
Wittelsbacherplatz 2
80333 München / DE
For all designated states
INTERNATIONAL BUSINESS MACHINES CORPORATION
Armonk, NY 10504 / US
Inventor(s)01 / Mitwalsky, Alexander
13 Pleasant Lane
Poughkeepsie, NY 12533 / US
02 / Wassich, Thomas Anthony
73 Fieldstone Blvd.
Wappinger Falls, NY 12590 / US
03 / Ryan, James Gardner
100 Boggs Hill Road
Newtown, CT 06470 / US
[1996/40]
Representative(s)Epping - Hermann - Fischer
Patentanwaltsgesellschaft mbH
Postfach 20 07 34
80007 München / DE
[N/P]
Former [2008/30]Epping - Hermann - Fischer
Patentanwaltsgesellschaft mbH Postfach 20 07 34
80007 München / DE
Former [2004/01]Epping - Hermann - Fischer
Patentanwaltsgesellschaft mbH P.O. Box 12 10 26
80334 München / DE
Former [2000/14]Zedlitz, Peter, et al
Patentanwalt, Postfach 22 13 17
80503 München / DE
Former [1998/28]Epping, Wilhelm, Dr.-Ing.
Patentanwalt Postfach 22 13 17
80503 München / DE
Former [1996/40]Fuchs, Franz-Josef, Dr.-Ing.
Postfach 22 13 17
80503 München / DE
Application number, filing date96104068.014.03.1996
[1996/40]
Priority number, dateUS1995041424131.03.1995         Original published format: US 414241
[1996/40]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0735578
Date:02.10.1996
Language:EN
[1996/40]
Search report(s)(Supplementary) European search report - dispatched on:EP19.08.1996
ClassificationIPC:H01L21/311, B23K26/00, H01L21/268
[1996/40]
CPC:
B23K26/0661 (EP,US); B23K26/18 (EP,US); B23K26/40 (EP,US);
H01L21/31 (KR); H01L21/311 (EP,US); H01L21/31105 (EP,US);
B23K2101/40 (EP,US); B23K2103/172 (EP,US); B23K2103/50 (EP,US);
H05K3/0017 (EP,US) (-)
Designated contracting statesAT,   DE,   FR,   GB,   IE,   IT,   NL [1996/40]
TitleGerman:Herstellung von Mustern durch Ablation einer Mehrschichtstruktur[1996/40]
English:Ablation patterning of multi-layered structures[1996/40]
French:Formation d'un motif par ablation de structures multicouches[1996/40]
Examination procedure18.03.1997Examination requested  [1997/20]
10.05.2005Application withdrawn by applicant  [2005/28]
Fees paidRenewal fee
20.03.1998Renewal fee patent year 03
19.03.1999Renewal fee patent year 04
13.03.2000Renewal fee patent year 05
19.03.2001Renewal fee patent year 06
18.03.2002Renewal fee patent year 07
18.03.2003Renewal fee patent year 08
22.03.2004Renewal fee patent year 09
22.03.2005Renewal fee patent year 10
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[XY]WO9312905  (MAXWELL LAB [US]) [X] 1,4,5 * page 1, line 5 - line 12; claim 10 * * page 5, line 1 - line 26 * * page 6, line 6 - line 27 * * page 7, line 23 - line 31 * * page 8, line 25 - page 9, line 21 * * page 10, line 4 - line 8 * * page 13, line 13 - page 15, line 16; figure 1 * [Y] 2,3;
 [YA]JPS62219525  ;
 [YA]DE4000561  (LASER LAB GOETTINGEN EV [DE]) [Y] 3 * column 1, line 1 - line 17 * * column 1, line 32 - line 39 * * column 1, line 51 - column 2, line 3 * * column 3, line 2 - line 13 * [A] 1;
 [A]US4975141  (GRECO NANCY A [US], et al) [A] 1,2,4,5 * column 1, line 5 - line 9 * * column 1, line 38 - line 51 * * column 2, line 62 - column 3, line 4 * * column 3, line 37 - column 4, line 7; figure 1A * * column 4, line 18 - column 5, line 45 *;
 [A]EP0352004  (APPLIED MATERIALS INC [US]) [A] 1,2,4,5 * page 2, line 1 - line 15 * * page 4, line 33 - line 58; figures 2A-3B * * page 5, line 15 - line 29 * * page 6, line 50 - page 7, line 1 *;
 [A]US4877481  (FUKUDA TAKESHI [JP], et al) [A] 1 * column 2, line 19 - line 45; figures 3A-3C * * column 3, line 6 - line 16 * * column 3, line 34 - column 4, line 10; figures 7A,,7B *
 [YA]  - PATENT ABSTRACTS OF JAPAN, (19880312), vol. 012, no. 080, Database accession no. (E - 590), & JP62219525 A 19870926 (FUJITSU LTD) [Y] 2 * abstract * [A] 1
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.