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EP0753795
European procedure
Extract from the Register of European Patents
EP About this file: EP0753795
| EP0753795 - Positive working photoresist composition [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 11.08.2000 Database last updated on 02.09.2024 | Most recent event Tooltip | 11.08.2000 | No opposition filed within time limit | published on 27.09.2000 [2000/39] | Applicant(s) | For all designated states FUJI PHOTO FILM CO., LTD. 210 Nakanuma Minami-Ashigara-shi, Kanagawa-ken / JP | [N/P] |
| Former [1999/41] | For all designated states FUJI PHOTO FILM CO., LTD. 210 Nakanuma Minami-Ashigara-shi Kanagawa-ken / JP | ||
| Former [1997/03] | For all designated states FUJI PHOTO FILM CO., LTD. 210 Nakanuma Minami-Ashigara-shi Kanagawa / JP | Inventor(s) | 01 /
Tan, Shiro, c/o Fuji Photo Film Co., Ltd. 4000, Kawashiri, Yoshida-cho Haibara-gun, Shizuoka / JP | 02 /
Kawabe, Yasumasa, c/o Fuji Photo Film Co., Ltd. 4000, Kawashiri, Yoshida-cho Haibara-gun, Shizuoka / JP | [1997/03] | Representative(s) | Barz, Peter Meissner Bolte & Partner GbR Postfach 86 06 24 81633 München / DE | [N/P] |
| Former [1997/03] | Barz, Peter, Dr. Patentanwalt Kaiserplatz 2 80803 München / DE | Application number, filing date | 96111286.9 | 12.07.1996 | [1997/03] | Priority number, date | JP19950177655 | 13.07.1995 Original published format: JP 17765595 | [1997/03] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP0753795 | Date: | 15.01.1997 | Language: | EN | [1997/03] | Type: | B1 Patent specification | No.: | EP0753795 | Date: | 13.10.1999 | Language: | EN | [1999/41] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 31.10.1996 | Classification | IPC: | G03F7/023 | [1997/03] | CPC: |
G03F7/0236 (EP,US)
| Designated contracting states | BE, DE, FR, GB [1997/03] | Title | German: | Positiv arbeitende Photoresistzusammensetzung | [1997/03] | English: | Positive working photoresist composition | [1997/03] | French: | Composition pour photoréserve de type positif | [1997/03] | Examination procedure | 03.04.1997 | Examination requested [1997/23] | 16.02.1999 | Despatch of communication of intention to grant (Approval: Yes) | 20.04.1999 | Communication of intention to grant the patent | 18.06.1999 | Fee for grant paid | 18.06.1999 | Fee for publishing/printing paid | Opposition(s) | 14.07.2000 | No opposition filed within time limit [2000/39] | Fees paid | Renewal fee | 29.07.1998 | Renewal fee patent year 03 | 29.07.1999 | Renewal fee patent year 04 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [DY]JPH02300751 ; | [DY]US5266440 (ZAMPINI ANTHONY [US]) [DY] 1 * the whole document *; | [DY]EP0336604 (THIOKOL MORTON INC [US]) [DY] 1 * the whole document *; | [X]JPS61223735 ; | [A]EP0676668 (SUMITOMO CHEMICAL CO [JP]) [A] 1 * the whole document *; | [X]US5302490 (FEDYNYSHYN THEODORE H [US], et al) [X] 1 * the whole document * | [DY] - DATABASE WPI, 1, Derwent World Patents Index, vol. 91, no. 08, Database accession no. 91-053474, XP002016256 & JPH02300751 A 00000000 (MITSUBISHI PETROCH KK) [DY] 1 * abstract * | [X] - DATABASE WPI, 1, Derwent World Patents Index, vol. 86, no. 46, Database accession no. 86-301835, XP002016257 & JPS61223735 A 00000000 (JAPAN SYNTHETIC RUBBER) [X] 1 * abstract * |