Deutsch English Français

Contact

EP0822268

European procedure

Quick help

Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability
Register Forum

2022.02.11

More...

News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...

Extract from the Register of European Patents

EP About this file: EP0822268

EP0822268 - Process for depositing adherent diamond thin films [Right-click to bookmark this link]
Status	No opposition filed within time limit Status updated on 23.02.2001 Database last updated on 22.08.2024
Most recent event Tooltip	23.02.2001	No opposition filed within time limit	published on 11.04.2001 [2001/15]
Applicant(s)	For all designated states Michigan State University 238 Administration Building East Lansing, Michigan 48824 / US
	[N/P]
Former [1998/06]	For all designated states MICHIGAN STATE UNIVERSITY 238 Administration Building East Lansing, Michigan 48824 / US
Inventor(s)	01 / Ulczynski, Michael J. 1491 Bay Meadows Okemos, Michigan 48864 / US
	02 / Asmussen, Jes 3811 Viceroy Okemos, Michigan 48864 / US
	03 / Reinhard, Donnie K. 526 Mashall Street East Lansing, Michigan 48823 / US
	[1998/06]
Representative(s)	Grünecker Patent- und Rechtsanwälte PartG mbB Leopoldstrasse 4 80802 München / DE
	[N/P]
Former [1998/06]	Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät Maximilianstrasse 58 80538 München / DE
Application number, filing date	96112277.7	30.07.1996
	[1998/06]
Filing language	EN
Procedural language	EN
Publication	Type:	A1 Application with search report
	No.:	EP0822268
	Date:	04.02.1998
	Language:	EN
	[1998/06]
	Type:	B1 Patent specification
	No.:	EP0822268
	Date:	26.04.2000
	Language:	EN
	[2000/17]
Search report(s)	(Supplementary) European search report - dispatched on:	EP	17.01.1997
Classification	IPC:	C23C16/26, C23C16/44	[1998/06]
	CPC:	C23C16/274 (EP); C23C16/277 (EP); C23C16/452 (EP)
Designated contracting states	DE, FR, GB [1998/06]
Title	German:	Verfahren zur Erzeugung einer haftenden Diamantbeschichtung	[1998/06]
	English:	Process for depositing adherent diamond thin films	[1998/06]
	French:	Procédé de production d'un revêtement de diamant adhérent	[1998/06]
Examination procedure	30.07.1996	Examination requested [1998/06]
	01.02.1999	Despatch of a communication from the examining division (Time limit: M04)
	13.04.1999	Reply to a communication from the examining division
	28.06.1999	Despatch of communication of intention to grant (Approval: Yes)
	22.10.1999	Communication of intention to grant the patent
	22.12.1999	Fee for grant paid
	22.12.1999	Fee for publishing/printing paid
Opposition(s)	27.01.2001	No opposition filed within time limit [2001/15]
Fees paid	Renewal fee
	29.06.1998	Renewal fee patent year 03
	02.07.1999	Renewal fee patent year 04
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:	Search	[A]EP0457076 (HITACHI LTD) [A] 1-10 * column 3, line 29 - line 30; example 1 *;
		[Y] - GONON P ET AL, "RAMAN STUDY OF DIAMOND FILMS DEPOSITED BY MPCVD: EFFECT OF THE SUBSTRATE POSITION", THIN SOLID FILMS, (19950201), vol. 256, no. 1/02, pages 13 - 22, XP000495251 [Y] 1,2 EXPERIMENTAL TECHNIQUES DOI: http://dx.doi.org/10.1016/0040-6090(94)06306-0
		[Y] - HIRAMATSU M ET AL, "Hydrogen-radical-assisted radio-frequency plasma-enhanced chemical vapor deposition system for diamond formation", REVIEW OF SCIENTIFIC INSTRUMENTS, JUNE 1996, AIP, USA, ISSN 0034-6748, vol. 67, no. 6, pages 2360 - 2365, XP000615708 [Y] 1,2 EXPERIMENT DOI: http://dx.doi.org/10.1063/1.1146946
		[Y] - KIM H ET AL, "Effect of the substrate state on the formation of diamond film in a low temperature microwave-plasma-enhanced chemical vapor deposition system", 41ST NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY, DENVER, CO, USA, 24-29 OCT. 1994, ISSN 0734-2101, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (VACUUM, SURFACES, AND FILMS), MAY-JUNE 1995, USA, vol. 13, no. 3, pt.2, pages 1619 - 1623, XP000615711 [Y] 1,2 EXPERIMENT DOI: http://dx.doi.org/10.1116/1.579740
		[AD] - MASOOD A ET AL, "Techniques for patterning of CVD diamond films on non-diamond substrates", JOURNAL OF THE ELECTROCHEMICAL SOCIETY, NOV. 1991, USA, ISSN 0013-4651, vol. 138, no. 11, pages L67 - L68, XP000615408 [AD] 8 * page L67, column L, line 26 - column R, line 17 *
		[A] - NARIMAN K E ET AL, "GROWTH OF FREE-STANDING DIAMOND FILMS ON GLASS", CHEMISTRY OF MATERIALS, (19910501), vol. 3, no. 3, pages 391 - 394, XP000321249 [A] 9 * page 392, column L, line 43 - line 50 * DOI: http://dx.doi.org/10.1021/cm00015a008
		[A] - REIHARD D K ET AL, "Diamond coatings on integrated circuits", INSPEC, INSTITUTE OF ELECTRICAL ENGINEERS, STEVENAGE, GB, XP002021717 [A] 10 * abstract *
		[ ] - PROCEEDINGS OF THE APPLIED DIAMOND CONFERENCE 1995. APPLICATIONS OF DIAMOND FILMS AND RELATED MATERIALS: THIRD INTERNATIONAL CONFERENCE (NIST SP 885), PROCEEDINGS OF 3RD INTERNATIONAL CONFERENCE ON THE APPLICATIONS OF DIAMOND FILMS AND RELATED MATERI, 1995, GAITHERSBURG, MD, USA, NIST, USA, pages 643 - 646 vol.1
		[A] - ULCZYNSKI M ET AL, "Thin film diamond coatings on glass", INSPEC, INSTITUTE OF ELECTRICAL ENGINEERS, STEVENAGE, GB, XP002021718 [A] 1-10 * abstract *
		[ ] - PROCEEDINGS OF THE APPLIED DIAMOND CONFERENCE 1995. APPLICATIONS OF DIAMOND FILMS AND RELATED MATERIALS: THIRD INTERNATIONAL CONFERENCE (NIST SP 885), PROCEEDINGS OF 3RD INTERNATIONAL CONFERENCE ON THE APPLICATIONS OF DIAMOND FILMS AND RELATED MATERI, 1995, GAITHERSBURG, MD, USA, NIST, USA, pages 573 - 576 vol.1

The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.

Legal notice
Terms of use
24.2.25; 34p