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EP0834896
European procedure
Extract from the Register of European Patents
EP About this file: EP0834896
| EP0834896 - Apparatus for generating an electron beam [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 18.04.2003 Database last updated on 24.08.2024 | Most recent event Tooltip | 18.04.2003 | No opposition filed within time limit | published on 04.06.2003 [2003/23] | Applicant(s) | For all designated states ADVANTEST CORPORATION Shinjuku Bldg. 4-1, 2-chome, Shinjuku-ku Tokyo 163-08 / JP | [N/P] |
| Former [2002/33] | For all designated states Advantest Corporation Shinjuku Bldg. 4-1, 2-chome, Shinjuku-ku Tokyo 163-08 / JP | ||
| Former [1998/15] | For all designated states ACT Advanced Circuit Testing Gesellschaft für Testsystementwicklung mbH Süskindstrasse 4 81929 München / DE | Inventor(s) | 01 /
Spehr, Rainer, Dr. Erfurter Str. 19 64372 Ober-Ramstadt / DE | 02 /
Schmitt, Michael, Dipl.-Phys. Rosenaustr. 6 63069 Offenbach / DE | 03 /
Frosien, Jürgen, Dr. Kufsteiner Str. 16A 85521 Riemerling / DE | [1998/15] | Representative(s) | Tetzner, Volkmar, et al Anwaltskanzlei Dr. Tetzner Van-Gogh-Strasse 3 81479 München / DE | [N/P] |
| Former [1998/15] | Tetzner, Volkmar, Dr.-Ing. Dr. jur., et al Van-Gogh-Strasse 3 81479 München / DE | Application number, filing date | 96115830.0 | 02.10.1996 | [1998/15] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP0834896 | Date: | 08.04.1998 | Language: | EN | [1998/15] | Type: | B1 Patent specification | No.: | EP0834896 | Date: | 12.06.2002 | Language: | EN | [2002/24] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 07.03.1997 | Classification | IPC: | H01J1/34, H01J37/073 | [1998/15] | CPC: |
H01J37/073 (EP,US);
H01J1/34 (EP,US)
| Designated contracting states | DE, FR, GB, NL [1998/15] | Title | German: | Elektronenstrahlerzeugende Vorrichtung | [1998/15] | English: | Apparatus for generating an electron beam | [1998/15] | French: | Dispositif générateur de faisceau d'électrons | [1998/15] | Examination procedure | 10.09.1997 | Examination requested [1998/15] | 20.10.1997 | Despatch of a communication from the examining division (Time limit: M06) | 13.03.1998 | Reply to a communication from the examining division | 15.03.1999 | Despatch of a communication from the examining division (Time limit: M04) | 16.07.1999 | Reply to a communication from the examining division | 02.10.2001 | Despatch of communication of intention to grant (Approval: Yes) | 15.11.2001 | Communication of intention to grant the patent | 11.12.2001 | Fee for grant paid | 11.12.2001 | Fee for publishing/printing paid | Opposition(s) | 13.03.2003 | No opposition filed within time limit [2003/23] | Fees paid | Renewal fee | 28.10.1998 | Renewal fee patent year 03 | 29.10.1999 | Renewal fee patent year 04 | 26.10.2000 | Renewal fee patent year 05 | 26.10.2001 | Renewal fee patent year 06 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [Y]EP0348611 (IBM [US]) [Y] 1-8,11 * column 5, line 15 - line 38 * * column 5, line 53 - line 58 * * column 6, line 25 - line 27 * * column 6, line 57 - column 7, line 4 * * column 7, line 15 - line 18 * * figure 4 *; | [DY]EP0445787 (EBARA RES CO LTD [JP]) [DY] 1-8,11 * page 3, line 10 - line 14 * * page 3, line 19 - line 29 * * page 3, line 39 - line 43 * * page 3, line 47 - line 57 * * page 4, line 31 - line 32 *; | [DA]US4868380 (BOOMAN RICHARD A [US], et al) [DA] 1 * the whole document *; | [A] - ANONYMOUS, "Optically Addressed High Resolution Lithography. April 1977.", IBM TECHNICAL DISCLOSURE BULLETIN, NEW YORK, US, (197704), vol. 19, no. 11, page 4385, XP002026208 [A] 1,11 * the whole document * | [A] - MERGL E ET AL, "GAASP SPIN-POLARIZED ELECTRON SOURCE FOR A 300 KEV ACCELERATOR", REVIEW OF SCIENTIFIC INSTRUMENTS, (19911001), vol. 62, no. 10, pages 2318 - 2321, XP000264399 [A] 9,10 * page 2318, column R, paragraph 2 * DOI: http://dx.doi.org/10.1063/1.1142292 | Examination | DE3200496 |