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Extract from the Register of European Patents

EP About this file: EP0769726

EP0769726 - Process for projection exposure of a workpiece with alignment marks on the rear side and device for executing the process [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  09.05.2003
Database last updated on 14.09.2024
Most recent event   Tooltip04.01.2008Lapse of the patent in a contracting statepublished on 06.02.2008  [2008/06]
Applicant(s)For all designated states
USHIODENKI KABUSHIKI KAISHA
6-1, Otemachi 2-chome Chiyoda-ku
Tokyo / JP
[N/P]
Former [1997/17]For all designated states
USHIODENKI KABUSHIKI KAISHA
6-1, Otemachi 2-chome
Chiyoda-ku, Tokyo / JP
Inventor(s)01 / Tanaka, Yoneta
2-23-4, Nishi, Utsukushigaoka, Aoba-ku
Yokohama-shi, Kanagawa-ken / JP
[1997/17]
Representative(s)Tomerius, Isabel, et al
Lang & Tomerius
Patentanwaltspartnerschaft mbB
Rosa-Bavarese-Strasse 5
80639 München / DE
[N/P]
Former [2002/33]Tomerius, Isabel, Dr., et al
Weber & Heim Patentanwälte Postfach 151324
80048 München / DE
Former [2000/30]Tomerius, Isabel, et al
Patentanwälte Weber & Heim Bavariaring 29
80336 München / DE
Former [1999/33]Tomerius, Isabel, Dr. Dipl.-Chem., et al
Patentanwälte Weber & Heim, Irmgardstrasse 3
81479 München / DE
Former [1997/17]Weber, Otto-Ernst, Dipl.-Phys., et al
Patentanwälte Weber & Heim, Irmgardstrasse 3
81479 München / DE
Application number, filing date96116765.718.10.1996
[1997/17]
Priority number, dateJP1995027237420.10.1995         Original published format: JP 27237495
[1997/17]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0769726
Date:23.04.1997
Language:EN
[1997/17]
Type: A3 Search report 
No.:EP0769726
Date:26.11.1997
[1997/48]
Type: B1 Patent specification 
No.:EP0769726
Date:03.07.2002
Language:EN
[2002/27]
Search report(s)(Supplementary) European search report - dispatched on:EP09.10.1997
ClassificationIPC:G03F9/00
[1997/17]
CPC:
G03F9/70 (EP,US); G03F9/7084 (KR); G03F9/00 (EP,US);
G03F9/7046 (KR); G03F9/7088 (KR); H01L23/544 (KR);
H01L2223/54426 (KR); H05K3/0082 (EP,US) (-)
Designated contracting statesDE,   FR,   GB,   IT,   NL [1997/17]
TitleGerman:Verfahren zur Projektionsbelichtung eines mit rückseitigen Ausrichtmarken versehenen Werkstücks und Vorrichtung zur Durchführung des Verfahrens[1997/17]
English:Process for projection exposure of a workpiece with alignment marks on the rear side and device for executing the process[1997/17]
French:Procédé d'exposition par projection d'une pièce à traiter avec repères d'alignement sur la face arrière et dispositif de mise en oeuvre de ce procédé[1997/17]
Examination procedure16.12.1997Examination requested  [1998/09]
17.06.1999Despatch of a communication from the examining division (Time limit: M04)
23.08.1999Reply to a communication from the examining division
12.11.1999Despatch of a communication from the examining division (Time limit: M04)
03.03.2000Reply to a communication from the examining division
06.06.2000Despatch of a communication from the examining division (Time limit: M04)
31.08.2000Reply to a communication from the examining division
30.11.2001Despatch of communication of intention to grant (Approval: Yes)
11.01.2002Communication of intention to grant the patent
14.02.2002Fee for grant paid
14.02.2002Fee for publishing/printing paid
Opposition(s)04.04.2003No opposition filed within time limit [2003/26]
Fees paidRenewal fee
29.10.1998Renewal fee patent year 03
29.10.1999Renewal fee patent year 04
29.10.2000Renewal fee patent year 05
30.10.2001Renewal fee patent year 06
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipIT03.07.2002
[2008/06]
Documents cited:Search[Y]JPH05144702  ;
 [A]JPH01164032  ;
 [A]JPH03246923  ;
 [A]JPS6083329  ;
 [Y]US3709579  (MAKOSCH G) [Y] 11 * abstract *;
 [Y]US3950094  (KANO ICHIRO, et al) [Y] 8 * abstract * * column 1, paragraph L *;
 [X]US4798470  (MORIYAMA SHIGEO [JP], et al) [X] 1,14,15 * column 2, line 53 - column 3, line 53 * * column 4, line 56 - column 6, line 34 * * figures 2,3,8 *;
 [XY]US4952060  (INA HIDEKI [JP], et al) [X] 1,14,15 * column 3, line 11 - column 6, line 26 * * figure - * [Y] 2,5,8,11;
 [Y]EP0556669  (SUESS KG KARL [DE]) [Y] 2,5,8,11 * abstract *
 [Y]  - PATENT ABSTRACTS OF JAPAN, (19930921), vol. 017, no. 525, Database accession no. (E - 1436), & JP05144702 A 19930611 (HITACHI LTD) [Y] 2 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19890928), vol. 013, no. 435, Database accession no. (E - 825), & JP01164032 A 19890628 (OLYMPUS OPTICAL CO LTD) [A] 1,2,5,8,11,14,15 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19920130), vol. 016, no. 038, Database accession no. (E - 1161), & JP03246923 A 19911105 (HITACHI LTD) [A] 1,2,5,8,11,14,15 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19850911), vol. 009, no. 225, Database accession no. (E - 342), & JP60083329 A 19850511 (FUJITSU KK) [A] 11 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.