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EP0773477
European procedure
Extract from the Register of European Patents
EP About this file: EP0773477
| EP0773477 - Process for producing a phase shift photomask [Right-click to bookmark this link] | |||
| Former [1997/20] | Phase shift layer - containing photomask, and its production and correction | ||
| [2000/31] | Status | No opposition filed within time limit Status updated on 05.04.2002 Database last updated on 05.07.2024 | Most recent event Tooltip | 05.04.2002 | No opposition filed within time limit | published on 22.05.2002 [2002/21] | Applicant(s) | For all designated states DAI NIPPON PRINTING CO., LTD. 1-1, Ichigayakaga-cho 1-chome, Shinjuku-ku Tokyo 162 / JP | [N/P] |
| Former [1997/20] | For all designated states DAI NIPPON PRINTING CO., LTD. 1-1, Ichigayakaga-cho 1-chome, Shinjuku-ku Tokyo 162 / JP | Inventor(s) | 01 /
Mikami, Koichi, c/o Dai Nippon Printing Co., Ltd. 1-1, Ichigaya-Kagacho 1-chome Shinjuku-ku, Tokyo 162 / JP | 02 /
Miyashita, Hiroyuki, Dai Nippon Printing Co. Ltd. 1-1, Ichigaya-Kagacho 1-chome Shinjuku-ku, Tokyo 162 / JP | 03 /
Takahashi, Yoichi, Dai Nippon Printing Co. Ltd. 1-1, Ichigaya-Kagacho 1-chome Shinjuku-ku, Tokyo 162 / JP | 04 /
Fujita, Hiroshi, c/o Dai Nippon Printing Co. Ltd. 1-1, Ichigaya-Kagacho 1-chome Shinjuku-ku, Tokyo 162 / JP | 05 /
Kurihara, Masa-aki, Dai Nippon Printing Co. Ltd. 1-1, Ichigaya-Kagacho 1-chome Shinjuku-ku, Tokyo 162 / JP | [2001/22] |
| Former [1997/20] | 01 /
Mikami, Koichi, c/o Dai Nippon Printing Co., Ltd. 1-1, Ichigaya-Kagacho 1-chome Shinjuku-ku, Tokyo 162 / JP | ||
| 02 /
Miyashita, Hiroyuki, Dai Nippon Printing Co. Ltd. 1-1, Ichigaya-Kagacho 1-chome Shinjuku-ku, Tokyo 162 / JP | |||
| 03 /
Takahashi, Yoichiki, Dai Nippon Printing Co. Ltd. 1-1, Ichigaya-Kagacho 1-chome Shinjuku-ku, Tokyo 162 / JP | |||
| 04 /
Fujita, Hiroshi, c/o Dai Nippon Printing Co. Ltd. 1-1, Ichigaya-Kagacho 1-chome Shinjuku-ku, Tokyo 162 / JP | |||
| 05 /
Kurihara, Masa-aki, Dai Nippon Printing Co. Ltd. 1-1, Ichigaya-Kagacho 1-chome Shinjuku-ku, Tokyo 162 / JP | Representative(s) | Bubb, Antony John Allen, et al Wilson Gunn Chancery House, Chancery Lane London WC2A 1QU / GB | [N/P] |
| Former [1997/20] | Bubb, Antony John Allen, et al GEE & CO. Chancery House Chancery Lane London WC2A 1QU / GB | Application number, filing date | 96121014.3 | 23.09.1991 | [1997/20] | Priority number, date | JP19900253717 | 21.09.1990 Original published format: JP 25371790 | JP19900253718 | 21.09.1990 Original published format: JP 25371890 | JP19900407929 | 27.12.1990 Original published format: JP 40792990 | JP19910033891 | 28.02.1991 Original published format: JP 3389191 | JP19910047850 | 13.03.1991 Original published format: JP 4785091 | [1997/20] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP0773477 | Date: | 14.05.1997 | Language: | EN | [1997/20] | Type: | B1 Patent specification | No.: | EP0773477 | Date: | 30.05.2001 | Language: | EN | [2001/22] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 12.03.1997 | Classification | IPC: | G03F1/00 | [1997/20] | CPC: |
G03F1/72 (EP,US);
H01L21/027 (KR);
G03F1/26 (EP,US);
G03F1/29 (EP,US);
G03F1/30 (EP,US)
| Designated contracting states | DE, FR, GB [1997/20] | Title | German: | Verfahren zur Herstellung einer Phasenschieber-Fotomaske | [2000/31] | English: | Process for producing a phase shift photomask | [2000/31] | French: | Procédé pour produir un Masque à décalage de phase | [2000/31] |
| Former [1997/20] | Fotomaske mit Phasenschieber; Herstellung und Korrektur | ||
| Former [1997/20] | Phase shift layer - containing photomask, and its production and correction | ||
| Former [1997/20] | Masque à décalage de phase, sa production et sa correction | Examination procedure | 27.10.1997 | Examination requested [1997/52] | 29.12.1998 | Despatch of a communication from the examining division (Time limit: M06) | 28.06.1999 | Reply to a communication from the examining division | 05.09.2000 | Despatch of communication of intention to grant (Approval: Yes) | 27.11.2000 | Communication of intention to grant the patent | 31.01.2001 | Fee for grant paid | 31.01.2001 | Fee for publishing/printing paid | Parent application(s) Tooltip | EP91308640.1 / EP0477035 | Opposition(s) | 01.03.2002 | No opposition filed within time limit [2002/21] | Fees paid | Renewal fee | 12.01.1997 | Renewal fee patent year 03 | 12.01.1997 | Renewal fee patent year 04 | 12.01.1997 | Renewal fee patent year 05 | 12.01.1997 | Renewal fee patent year 06 | 29.09.1997 | Renewal fee patent year 07 | 29.09.1998 | Renewal fee patent year 08 | 29.09.1999 | Renewal fee patent year 09 | 25.09.2000 | Renewal fee patent year 10 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]EP0082977 (IBM [US]) [X] 1 * the whole document *; | [X]JPS5487478 ; | [A]EP0090924 (IBM [US]) [A] 2; | [X] - PATENT ABSTRACTS OF JAPAN, (19790914), vol. 003, no. 110, Database accession no. (E - 137), & JP54087478 A 19790711 (NEC CORP) [X] 1 * abstract * | [A] - IMAI A ET AL, "Novel process for direct delineation of spin on Glass (SOG)", JAPANESE JOURNAL OF APPLIED PHYSICS, PART 1 (REGULAR PAPERS & SHORT NOTES), NOV. 1990, JAPAN, ISSN 0021-4922, vol. 29, no. 11, pages 2653 - 2656, XP000605000 [A] 2,7,8 DOI: http://dx.doi.org/10.1143/JJAP.29.2653 | by applicant | JPS58173744 | JPS6259296 | EP0090924 | - NIKKEI MICRODEVICES, (1990), no. 1, pages 78 - 79 |