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EP0725440
European procedure
Extract from the Register of European Patents
EP About this file: EP0725440
| EP0725440 - Silicon carbide metal diffusion barrier layer [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 24.06.2005 Database last updated on 10.05.2025 | Most recent event Tooltip | 05.10.2005 | Change: Appeal number | Applicant(s) | For all designated states Dow Corning Corporation 3901 S. Saginaw Road Midland, Michigan 48686-0994 / US | [N/P] |
| Former [1996/32] | For all designated states DOW CORNING CORPORATION 3901 S. Saginaw Road Midland Michigan 48686-0994 / US | Inventor(s) | 01 /
Loboda, Mark Jon 1902 Vine Street Midland, Michigan / US | 02 /
Michael, Keith Winton 2715 Siebert Midland, Michigan / US | [1996/32] | Representative(s) | Kyle, Diana, et al Elkington and Fife LLP Prospect House 8 Pembroke Road Sevenoaks, Kent TN13 1XR / GB | [N/P] |
| Former [2001/50] | Kyle, Diana, et al Elkington and Fife Prospect House 8 Pembroke Road Sevenoaks, Kent TN13 1XR / GB | ||
| Former [1996/38] | Lewin, John Harvey, et al Elkington and Fife, Prospect House, 8 Pembroke Road Sevenoaks, Kent TN13 1XR / GB | ||
| Former [1996/32] | Lewin, John Harvey, et al ELKINGTON AND FIFE Prospect House, 8 Pembroke Road Sevenoaks, Kent, TN13 1XR / GB | Application number, filing date | 96300522.8 | 25.01.1996 | [1996/32] | Priority number, date | US19950382701 | 02.02.1995 Original published format: US 382701 | [1996/32] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0725440 | Date: | 07.08.1996 | Language: | EN | [1996/32] | Type: | A3 Search report | No.: | EP0725440 | Date: | 29.01.1997 | [1997/05] | Type: | B1 Patent specification | No.: | EP0725440 | Date: | 18.08.2004 | Language: | EN | [2004/34] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 13.12.1996 | Classification | IPC: | H01L23/532 | [1996/32] | CPC: |
H01L23/5329 (EP,US);
H01L21/31 (KR);
H01L2924/0002 (EP,US);
H01L2924/3011 (EP,US)
| C-Set: |
H01L2924/0002, H01L2924/00 (EP,US)
| Designated contracting states | DE, FR, GB, IT, NL [1996/32] | Title | German: | Siliziumcarbid-Metall-Diffusionsbarriere-Schicht | [1996/32] | English: | Silicon carbide metal diffusion barrier layer | [1996/32] | French: | Couche barrière contre la diffusion de métaux de carbure de silicium | [1996/32] | Examination procedure | 21.02.1997 | Examination requested [1997/17] | 19.12.1997 | Despatch of a communication from the examining division (Time limit: M06) | 20.06.1998 | Reply to a communication from the examining division | 05.02.1999 | Despatch of a communication from the examining division (Time limit: M06) | 05.08.1999 | Reply to a communication from the examining division | 18.05.2000 | Despatch of communication that the application is refused, reason: substantive examination {1} | 18.05.2000 | Date of oral proceedings | 14.06.2000 | Minutes of oral proceedings despatched | 04.12.2003 | Communication of intention to grant the patent | 03.03.2004 | Fee for grant paid | 03.03.2004 | Fee for publishing/printing paid | Appeal following examination | 24.07.2000 | Appeal received No. T1117/00 | 09.10.2000 | Statement of grounds filed | 23.09.2003 | Result of appeal procedure: remittal for grant | Opposition(s) | 19.05.2005 | No opposition filed within time limit [2005/32] | Fees paid | Renewal fee | 03.12.1997 | Renewal fee patent year 03 | 22.12.1998 | Renewal fee patent year 04 | 20.12.1999 | Renewal fee patent year 05 | 11.12.2000 | Renewal fee patent year 06 | 10.12.2001 | Renewal fee patent year 07 | 09.12.2002 | Renewal fee patent year 08 | 14.01.2004 | Renewal fee patent year 09 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]JPS63150963 ; | [A]EP0285445 (SEMICONDUCTOR ENERGY LAB [JP]) [A] 1-5,7-10 * column 3, line 14 - column 5, line 42; figures 1A-1D,2 *; | [DA]US5103285 (FURUMURA YUJI [JP], et al); | [A]EP0613178 (DOW CORNING [US]) [A] 1-10 * column 2, line 14 - line 31 * * column 9, line 49 - column 10, line 21; figure 2 * | [A] - PATENT ABSTRACTS OF JAPAN, (19881031), vol. 012, no. 412, Database accession no. (E - 676), & JP63150963 A 19880623 (FUJITSU LTD) [A] 1,10 * abstract * | Examination | - VMIC Conference, June 7-8, 1994, pages 414-420 | - Chang C.Y. et al: J. Electochemical Soc., Vol. 132, No. 2 (1985) pages 418-422 | - Anderson D.A.; Spear W.E.: Philosophical Magazine, vol. 35, (1976) pages 1-16 | - Nishino S. et al: J. Applied Physics vol 45(1974) pages 1075-1084 | - Mogab C.J.; Leamy H.L.: J Applied Physics vol. 45 (1974) pp. 1075-1084 with C2H2". | - Ceramic Materials for Electronics, ed. Relva C. Buchanan, published by Marcel Dekker Inc. New York (1986) pp. 426-427 | - Hawley's Condensed Chemical Dictionary, Eleventh Edition, Van Nostrand Reinhold Company, New York, (1987) pp. 685 and 1039 | - Encyclopaedia of Chemical technology, fourth ed. J Wiley & Sons , New York (1982) pp. 891-911 |