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EP0737898
European procedure
Extract from the Register of European Patents
EP About this file: EP0737898
| EP0737898 - Projection exposure apparatus and microdevice manufacturing method using the same [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 12.05.2000 Database last updated on 02.11.2024 | Most recent event Tooltip | 12.05.2000 | No opposition filed within time limit | published on 28.06.2000 [2000/26] | Applicant(s) | For all designated states CANON KABUSHIKI KAISHA 30-2, 3-chome, Shimomaruko, Ohta-ku Tokyo / JP | [N/P] |
| Former [1996/42] | For all designated states CANON KABUSHIKI KAISHA 30-2, 3-chome, Shimomaruko, Ohta-ku Tokyo / JP | Inventor(s) | 01 /
Mori, Tetsuya, c/o Canon K.K. 30-2, 3-chome, Shimomaruko Ohta-ku, Tokyo / JP | 02 /
Kosugi, Masao, c/o Canon K.K. 30-2, 3-chome, Shimomaruko Ohta-ku, Tokyo / JP | [1996/42] | Representative(s) | Beresford, Keith Denis Lewis Beresford Crump LLP 16 High Holborn London WC1V 6BX / GB | [N/P] |
| Former [1996/42] | Beresford, Keith Denis Lewis BERESFORD & Co. 2-5 Warwick Court High Holborn London WC1R 5DJ / GB | Application number, filing date | 96302526.7 | 10.04.1996 | [1996/42] | Priority number, date | JP19950088215 | 13.04.1995 Original published format: JP 8821595 | [1996/42] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP0737898 | Date: | 16.10.1996 | Language: | EN | [1996/42] | Type: | B1 Patent specification | No.: | EP0737898 | Date: | 14.07.1999 | Language: | EN | [1999/28] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 07.08.1996 | Classification | IPC: | G03F9/00, G03F7/20 | [1996/42] | CPC: |
G03F7/70358 (EP,US);
H01L21/027 (KR);
G03F7/70716 (EP,US);
G03F7/70741 (EP,US);
G03F9/70 (EP,US)
| Designated contracting states | DE, GB, NL [1996/42] | Title | German: | Apparat zur Projektionsbelichtung und Verfahren zur Herstellung einer Mikrovorrichtung unter Verwendung desselben | [1996/42] | English: | Projection exposure apparatus and microdevice manufacturing method using the same | [1996/42] | French: | Appareil d'exposition par projection et méthode de fabrication d'un microdispositif utilisant celui-ci | [1996/42] | Examination procedure | 26.02.1997 | Examination requested [1997/17] | 30.07.1998 | Despatch of communication of intention to grant (Approval: No) | 21.12.1998 | Despatch of communication of intention to grant (Approval: later approval) | 14.01.1999 | Communication of intention to grant the patent | 19.03.1999 | Fee for grant paid | 19.03.1999 | Fee for publishing/printing paid | Opposition(s) | 15.04.2000 | No opposition filed within time limit [2000/26] | Fees paid | Renewal fee | 23.04.1998 | Renewal fee patent year 03 | 21.04.1999 | Renewal fee patent year 04 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [YA]US4668089 (OSHIDA YOSHITADA [JP], et al) [Y] 1,2 * column 17, line 32 - line 68 * * figures 20A,32 * [A] 7,10; | [YA]US4676637 (UTO SACHIO [JP], et al) [Y] 1,2 * column 3, line 42 - column 4, line 17 * * column 7, line 46 - line 53 * * figures 1,2 * [A] 7,10; | [A]EP0509797 (CANON KK [JP]) [A] 1,7,10 * column 7, line 31 - column 10, line 54 ** figure 1 * |