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EP0749044
European procedure
Extract from the Register of European Patents
EP About this file: EP0749044
| EP0749044 - Positive-working photoresist composition [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 06.07.2001 Database last updated on 02.09.2024 | Most recent event Tooltip | 06.07.2001 | No opposition filed within time limit | published on 22.08.2001 [2001/34] | Applicant(s) | For all designated states TOKYO OHKA KOGYO CO., LTD. 150, Nakamaruko Nakahara-ku Kawasaki-shi, Kanagawa-ken / JP | [N/P] |
| Former [1996/51] | For all designated states TOKYO OHKA KOGYO CO., LTD. 150, Nakamaruko Nakahara-ku Kawasaki-shi Kanagawa-ken / JP | Inventor(s) | 01 /
Sato, Kazufumi 2382-10, Kamimizo Sagamihara-shi, Kanagawa-ken / JP | 02 /
Nitta, Kazuyuki 8-21, Ichinomiya 7-chome, Samukawa-machi Koza-gun, Kanagawa-ken / JP | 03 /
Yamazaki, Akiyoshi 13-14, Sasage 7-chome, Konan-ku Yokohama-shi, Kanagawa-ken / JP | 04 /
Sakai, Yoshika 1983-11, Nurumizu Atsugi-shi, Kanagawa-ken / JP | 05 /
Nakayama, Toshimasa 9-12, Takada 4-chome Chigasaki-shi, Kanagawa-ken / JP | [1996/51] | Representative(s) | Baverstock, Michael George Douglas, et al BOULT WADE TENNANT, Verulam Gardens 70 Gray's Inn Road London WC1X 8BT / GB | [N/P] |
| Former [1996/51] | Baverstock, Michael George Douglas, et al BOULT WADE TENNANT 27 Furnival Street London, EC4A 1PQ / GB | Application number, filing date | 96304002.7 | 03.06.1996 | [1996/51] | Priority number, date | JP19950149285 | 15.06.1995 Original published format: JP 14928595 | [1996/51] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0749044 | Date: | 18.12.1996 | Language: | EN | [1996/51] | Type: | A3 Search report | No.: | EP0749044 | Date: | 16.04.1997 | [1997/16] | Type: | B1 Patent specification | No.: | EP0749044 | Date: | 06.09.2000 | Language: | EN | [2000/36] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 28.02.1997 | Classification | IPC: | G03F7/004, G03F7/039 | [1997/15] | CPC: |
G03F7/039 (EP,US);
G03F7/004 (KR);
G03F7/0045 (EP,US);
Y10S430/106 (EP,US)
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| Former IPC [1996/51] | G03F7/004 | Designated contracting states | DE, FR, GB, IT [1996/51] | Title | German: | Positiv arbeitende Fotoresistzusammensetzung | [1996/51] | English: | Positive-working photoresist composition | [1996/51] | French: | Composition pour photoréserve de type positif | [1996/51] | Examination procedure | 09.07.1997 | Examination requested [1997/37] | 06.08.1998 | Despatch of a communication from the examining division (Time limit: M04) | 31.08.1998 | Reply to a communication from the examining division | 10.11.1999 | Despatch of communication of intention to grant (Approval: No) | 07.01.2000 | Despatch of communication of intention to grant (Approval: later approval) | 21.01.2000 | Communication of intention to grant the patent | 05.04.2000 | Fee for grant paid | 05.04.2000 | Fee for publishing/printing paid | Opposition(s) | 07.06.2001 | No opposition filed within time limit [2001/34] | Fees paid | Renewal fee | 27.05.1998 | Renewal fee patent year 03 | 25.05.1999 | Renewal fee patent year 04 | 08.06.2000 | Renewal fee patent year 05 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [Y]EP0611998 (HOECHST JAPAN [JP]) [Y] 1-11 * page 7, line 55 - line 56 * * page 11; example A11 * * claims 1,15 *; | [Y]EP0537524 (SHIPLEY CO [US]) [Y] 1-11 * page 4, column 6, line 11 - line 14 * * page 8, column 14, line 56 - line 58 * * page 9, column 15, line 1 - line 5 * * page 10; example 2 * * claim 2 *; | [A]WO9401805 (HOECHST AG [DE], et al) [A] 1-11 * page 6, line 27 - line 28 *; | [PA]EP0660187 (JAPAN SYNTHETIC RUBBER CO LTD [JP]) [PA] 1-11 * page 8, line 23 - line 56 *; | [A]EP0628876 (IBM [US]) [A] 1-11 * claim 16 * |